Abstract: Full-contact exposure device that allows high adherence of a photo mask with a board. Upon completion of prescribed processing, a controller controls a moving mechanism to move a platen upward, thereby moving the photo mask and a board closer, and to stop at a position where a sealed space is formed between the two. At the same time a controller starts vacuuming by controlling a vacuum pump. By this vacuum pressure in the space between the photo mask and the board becomes negative, and the photo mask bends downward with its center area sagging and contacting the board. The controller controls a cam drive mechanism to rotate cams while vacuuming, allowing the photo mask to gradually make contact with the board from the center area to its periphery while pushing out the air gradually from the center to the periphery, thereby completing full contact with the board.

Abstract: The invention provides a full-contact type exposure device that allows high adherence of a photo mask with a board.