Patents by Inventor Tsung-Hui Cheng

Tsung-Hui Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110171426
    Abstract: A hard water-repellent structure and a method for fabricating the same are provided. The method adopts an atmospheric pressure plasma deposition (APPD) technique to form a hard coating having a rough surface on a substrate, and form a water-repellent coating on the rough surface. Because the hard water-repellent structure includes the hard coating and the water-repellent coating, hardness, abrasion-resistance, transparency and hydrophobicity of the hard water-repellent structure are improved. The hard water-repellent structure protects the substrate from friction. Moreover, because the disclosure adopts the APPD technique to form the hard water-repellent structure, the cost of production is reduced dramatically. Thus, the disclosure can solve drawbacks of prior art.
    Type: Application
    Filed: February 22, 2011
    Publication date: July 14, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Wei Chen, Chun-Hung Lin, Tsung-Hui Cheng, Chih-Yuan Chen, Te-Hui Yang, Chen-Der Tsai, Chin-Jyi Wu, Yun-Chuan Tu, Chia-Chiang Chang
  • Publication number: 20080063811
    Abstract: A method of adjusting a surface characteristic of a substrate is provided, which includes the following steps. A substrate is provided. An atmosphere pressure plasma process is performed on the surface of the substrate to form a film layer on the surface of the substrate, so as to adjust the surface energy of the substrate, wherein a process gas of the atmosphere pressure plasma process includes a surface modifying precursor, a carrier gas and a plasma ignition gas. In particular, the surface modifying precursor is selected from fluorosilane, polysiloxane and a combination thereof, and the ratio of fluorosilane to polysiloxane is between 0 and 1.
    Type: Application
    Filed: January 15, 2007
    Publication date: March 13, 2008
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chau-Hui Wang, Tsung-Hui Cheng, Hsun-Yu Li, Hsin-Ching Kao
  • Publication number: 20070148407
    Abstract: A water-repellent structure and a method for fabricating the same are provided. The method adopts an atmospheric pressure plasma deposition (APPD) technique to form a hardened coating having a rough surface on a substrate, and form a water-repellent coating on the rough surface. Because the water-repellent structure includes the hardened coating and the water-repellent coating, hardness, abrasion-resistance, transparency and hydrophobicity of the water-repellent structure are improved. The hard water-repellent structure protects the substrate from friction. Moreover, because the present invention adopts the APPD technique to form the water-repellent structure, the cost of production is reduced dramatically. Thus, the present invention can solve drawbacks of prior art.
    Type: Application
    Filed: December 26, 2006
    Publication date: June 28, 2007
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chih-Wei Chen, Chun-Hung Lin, Tsung-Hui Cheng, Chih-Yuan Chen, Te-Hui Yang, Chen-Der Tsai, Chin-Jyi Wu, Yun-Chuan Tu, Chia-Chiang Chang