Patents by Inventor Tsung-Hung Chu

Tsung-Hung Chu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Curing photo resist for improving etching selectivity
    Patent number: 11018021
    Abstract: A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.
    Type: Grant
    Filed: July 8, 2019
    Date of Patent: May 25, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Kuo Hsieh, Tsung-Hung Chu, Ming-Chung Liang
  • Curing Photo Resist for Improving Etching Selectivity
    Publication number: 20190333777
    Abstract: A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.
    Type: Application
    Filed: July 8, 2019
    Publication date: October 31, 2019
    Inventors: Wen-Kuo Hsieh, Tsung-Hung Chu, Ming-Chung Liang
  • Curing photo resist for improving etching selectivity
    Patent number: 10347505
    Abstract: A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.
    Type: Grant
    Filed: April 4, 2016
    Date of Patent: July 9, 2019
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Kuo Hsieh, Tsung-Hung Chu, Ming-Chung Liang
  • Curing Photo Resist for Improving Etching Selectivity
    Publication number: 20160218016
    Abstract: A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.
    Type: Application
    Filed: April 4, 2016
    Publication date: July 28, 2016
    Inventors: Wen-Kuo Hsieh, Tsung-Hung Chu, Ming-Chung Liang
  • Curing photo resist for improving etching selectivity
    Patent number: 9305839
    Abstract: A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: April 5, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Kuo Hsieh, Tsung-Hung Chu, Ming-Chung Liang
  • Curing Photo Resist for Improving Etching Selectivity
    Publication number: 20150179511
    Abstract: A method includes exposing and developing a negative photo resist, and performing a treatment on the negative photo resist using an electron beam. After the treatment, a layer underlying the photo resist is etched using the negative photo resist as an etching mask.
    Type: Application
    Filed: December 19, 2013
    Publication date: June 25, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Wen-Kuo Hsieh, Tsung-Hung Chu, Ming-Chung Liang