Patents by Inventor Tsung-Pao Chen

Tsung-Pao Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210282375
    Abstract: The present disclosure provides an animal guiding device adapted to be disposed on an animal. The animal guiding device comprises a substrate, an odor module, and a control module. The substrate is adapted to be disposed on the animal. The odor module is disposed on the substrate. The odor module comprises an odor source, an atomizer, and a guide tube. The atomizer atomizes the odor source into an odor gas. The guide tube receives the odor gas from the atomizer. The control module is disposed on the substrate. The control module controls the guide tube to spray the odor gas towards a specified direction.
    Type: Application
    Filed: July 8, 2020
    Publication date: September 16, 2021
    Applicant: LUXSHARE-ICT CO., LTD.
    Inventors: Hsin-Nan CHEN, Tsung-Pao HSU, Jung-Pin CHIEN, Yao-Chun TSAI
  • Patent number: 9698014
    Abstract: A photoresist composition and a method for forming a patterned photoresist, and a method for forming an integrated circuit pattern are provided. A photoresist composition is provided. The photoresist composition includes a first polymer, a second polymer; and a solvent. The first polymer is more soluble than the second polymer in an aqueous solution, and the first polymer has a higher etching resistance than the second polymer.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: July 4, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Tsung-Pao Chen, Sheng-Min Chuang, Teng-Kuei Chuang
  • Patent number: 9651870
    Abstract: A tool and a method of lithography are provided. In various embodiments, the method of lithography includes forming a photoresist layer on a substrate. The method further includes exposing the photoresist layer to form an exposed photoresist layer. The method further includes rinsing the exposed photoresist layer. The method further includes treating the exposed photoresist layer with a chemical modifier to form a modified photoresist layer. The method further includes baking the modified photoresist layer. The method further includes developing the modified photoresist layer.
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 16, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Tsung-Pao Chen, Sheng-Min Chuang, Teng-Kuei Chuang
  • Publication number: 20160033863
    Abstract: A photoresist composition and a method for forming a patterned photoresist, and a method for forming an integrated circuit pattern are provided. A photoresist composition is provided. The photoresist composition includes a first polymer, a second polymer; and a solvent. The first polymer is more soluble than the second polymer in an aqueous solution, and the first polymer has a higher etching resistance than the second polymer.
    Type: Application
    Filed: July 30, 2014
    Publication date: February 4, 2016
    Inventors: Tsung-Pao CHEN, Sheng-Min CHUANG, Teng-Kuei CHUANG
  • Publication number: 20150309414
    Abstract: A tool and a method of lithography are provided. In various embodiments, the method of lithography includes forming a photoresist layer on a substrate. The method further includes exposing the photoresist layer to form an exposed photoresist layer. The method further includes rinsing the exposed photoresist layer. The method further includes treating the exposed photoresist layer with a chemical modifier to form a modified photoresist layer. The method further includes baking the modified photoresist layer. The method further includes developing the modified photoresist layer.
    Type: Application
    Filed: April 28, 2014
    Publication date: October 29, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Tsung-Pao CHEN, Sheng-Min CHUANG, Teng-Kuei CHUANG
  • Publication number: 20140295612
    Abstract: A solar cell and a manufacturing method thereof are provided. A laser doping process is adopted to form positive and negative doping regions for an accurate control of the doping regions. No metal contact coverage issue arises since a contact opening is formed by later firing process. The solar cell is provided with a comb-like first electrode, a sheet-like second electrode corresponding to the doping regions to obtain high photoelectric conversion efficiency by fully utilizing the space in the semiconductor substrate. Furthermore, the sheet-like second electrode can be formed by a material having high reflectivity to improve the light utilization rate of the solar cell. The manufacturing process of the solar cell is simplified and the processing yield is improved.
    Type: Application
    Filed: June 13, 2014
    Publication date: October 2, 2014
    Inventors: Cheng-Chang Kuo, Yen-Cheng Hu, Hsin-Feng Lee, Tsung-Pao Chen, Jen-Chieh Chen, Zhen-Cheng Wu
  • Patent number: 8779281
    Abstract: A solar cell includes a semi-conductive substrate, a doping layer, an anti-reflection layer, an electrode, a passivation stacked layer and a contact layer. The semi-conductive substrate has a front and a back surface. The doping layer is disposed on the front surface. The anti-reflection layer is disposed on the doping layer. The electrode is disposed on the anti-reflection layer and electrically connected to the doping layer. The passivation stacked layer is disposed on the back surface and has a first dielectric layer, a second dielectric layer and a middle dielectric layer sandwiched between the first and the second dielectric layer. The dielectric constant of the middle dielectric layer is substantially lower than the dielectric constant of the first dielectric layer and the dielectric constant of the second dielectric layer. The contact layer covers the passivation stacked layer and electrically contacts with the back surface of the semi-conductive substrate.
    Type: Grant
    Filed: May 4, 2011
    Date of Patent: July 15, 2014
    Assignee: Au Optronics Corporation
    Inventors: Yen-Cheng Hu, Peng Chen, Tsung-Pao Chen, Shuo-Wei Liang, Zhen-Cheng Wu, Chien-Jen Chen
  • Publication number: 20140048129
    Abstract: A solar cell includes a substrate. The substrate has a light-receiving surface and a back surface opposite to the light-receiving surface. The substrate includes plural trenches formed on the back surface. The solar cell includes plural n-type diffusion areas and plural p-type diffusion areas alternately disposed on the back surface and the surface of the trenches. The possibility of recombination of the electron-hole pair while moving can be reduced because of the trenches, which are formed in the substrate.
    Type: Application
    Filed: March 11, 2013
    Publication date: February 20, 2014
    Applicant: AU OPTRONICS CORPORATION
    Inventors: Tsung-Pao CHEN, Shih-Hsien YANG, Yu-Chun CHEN, Ming-Hui CHIU, Yi-Hsuan LIN, Yen-Cheng HU, Jen-Chieh CHEN, Zhen-Cheng WU
  • Publication number: 20120264253
    Abstract: A method of fabricating a solar cell is provided. A first type substrate having a first surface and a second surface is provided. A first doping process is performed on the first surface of the first type substrate by using a first dopant, so as to form a first type lightly doped layer. A second doping process is performed on a portion of the first type lightly doped layer by using a second dopant, so as to form a second type heavily doped region. A molecular weight of the second dopant is larger than a molecular weight of the first dopant, and a temperature of the first doping process is higher than a temperature of the second doping process. A first electrode is formed on the second type heavily doped region. A second electrode is formed on the second surface of the first type substrate.
    Type: Application
    Filed: July 26, 2011
    Publication date: October 18, 2012
    Applicant: AU OPTRONICS CORPORATION
    Inventors: Ming-Hui Chiu, Shih-Hsien Yang, Yen-Cheng Hu, Yu-Chun Chen, Tsung-Pao Chen, Kuan-Chen Wang, Jen-Chieh Chen, Zhen-Cheng Wu
  • Publication number: 20120138127
    Abstract: A solar cell and a manufacturing method thereof are provided. A laser doping process is adopted to form positive and negative doping regions for an accurate control of the doping regions. No metal contact coverage issue arises since a contact opening is formed by later firing process. The solar cell is provided with a comb-like first electrode, a sheet-like second electrode corresponding to the doping regions to obtain high photoelectric conversion efficiency by fully utilizing the space in the semiconductor substrate. Furthermore, the sheet-like second electrode can be formed by a material having high reflectivity to improve the light utilization rate of the solar cell. The manufacturing process of the solar cell is simplified and the processing yield is improved.
    Type: Application
    Filed: March 2, 2011
    Publication date: June 7, 2012
    Applicant: AU OPTRONICS CORPORATION
    Inventors: Cheng-Chang Kuo, Yen-Cheng Hu, Hsin-Feng Li, Tsung-Pao Chen, Jen-Chieh Chen, Zhen-Cheng Wu
  • Publication number: 20120097236
    Abstract: A solar cell includes a semi-conductive substrate, a doping layer, an anti-reflection layer, an electrode, a passivation stacked layer and a contact layer. The semi-conductive substrate has a front and a back surface. The doping layer is disposed on the front surface. The anti-reflection layer is disposed on the doping layer. The electrode is disposed on the anti-reflection layer and electrically connected to the doping layer. The passivation stacked layer is disposed on the back surface and has a first dielectric layer, a second dielectric layer and a middle dielectric layer sandwiched between the first and the second dielectric layer. The dielectric constant of the middle dielectric layer is substantially lower than the dielectric constant of the first dielectric layer and the dielectric constant of the second dielectric layer. The contact layer covers the passivation stacked layer and electrically contacts with the back surface of the semi-conductive substrate.
    Type: Application
    Filed: May 4, 2011
    Publication date: April 26, 2012
    Applicant: AU OPTRONICS CORPORATION
    Inventors: Yen-Cheng Hu, Peng Chen, Tsung-Pao Chen, Shuo-Wei Liang, Zhen-Cheng Wu, Chien-Jen Chen
  • Publication number: 20120097246
    Abstract: A solar cell includes a crystalline semiconductor substrate; a first crystalline semiconductor layer; an amorphous semiconductor layer; a first metal electrode layer and a second metal electrode layer. The crystalline semiconductor substrate has a first surface and a second surface, and the crystalline semiconductor substrate has a first doped type. The first crystalline semiconductor layer is disposed on the first surface of the crystalline semiconductor substrate, where the first crystalline semiconductor layer has a second doped type contrary to the first doped type. The amorphous semiconductor layer is disposed on the first crystalline semiconductor layer, and the amorphous semiconductor layer has the second doped type. The first metal electrode layer is disposed on the amorphous semiconductor layer. The second metal electrode layer is disposed on the second surface of the crystalline semiconductor substrate.
    Type: Application
    Filed: March 29, 2011
    Publication date: April 26, 2012
    Inventors: Chee-Wee Liu, Wei-Shuo Ho, Yen-Yu Chen, Chun-Yuan Ku, Zhen-Cheng Wu, Shuo-Wei Liang, Jen-Chieh Chen, Chung-Wei Lai, Tsung-Pao Chen