Patents by Inventor Tsung-Shien Lin

Tsung-Shien Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240105654
    Abstract: A method of making a semiconductor device includes patterning a conductive layer over a substrate to define a conductive pad having a first width. The method includes depositing a passivation layer, wherein the passivation layer directly contacts the conductive pad. The method includes depositing a protective layer over the passivation layer, wherein the protective layer directly contacts the conductive pad. The method includes depositing an under-bump metallization (UBM) layer directly contacting the conductive pad, wherein the UBM layer has a second width greater than the first width. The method includes depositing a mask layer over the UBM layer; and forming an opening in the mask layer wherein the opening has the second width. The method includes forming a conductive pillar in the opening on the UBM layer; and etching the UBM layer using the conductive pillar as a mask, wherein the etched UBM layer has the second width.
    Type: Application
    Filed: November 29, 2023
    Publication date: March 28, 2024
    Inventors: Chita CHUANG, Yao-Chun CHUANG, Tsung-Shu LIN, Chen-Cheng KUO, Chen-Shien CHEN
  • Publication number: 20240076417
    Abstract: The present disclosure provides a method for manufacturing an auto-crosslinked hyaluronic acid gel, comprising conducting auto-crosslinking reaction of a colloid containing hyaluronic acid continuously at low temperature in an acidic environment, and treating the reaction product with steam at high temperature to obtain the auto-crosslinked hyaluronic acid gel with high viscosity.
    Type: Application
    Filed: September 5, 2023
    Publication date: March 7, 2024
    Applicant: SCIVISION BIOTECH INC.
    Inventors: TAI-SHIEN HAN, TSUNG-WEI PAN, TOR-CHERN CHEN, CHUN-CHANG CHEN, PO-HSUAN LIN, LI-SU CHEN
  • Patent number: 6794947
    Abstract: The present invention provides a method for adjusting the frequency of an oscillator. The method comprises providing a substrate having a plurality of openings, forming a conductive layer on a first surface of the substrate and patterning the conductive layer to form a plurality of strip line, one of which is formed corresponding to the openings to become an inductance circuit, covering the conductive layer with a lid, and cutting part of the strip line through the plurality of openings from the opposite side of the first surface to adjust frequencies of the oscillator.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: September 21, 2004
    Assignee: Delta Electronics Inc.
    Inventor: Tsung-Shien Lin
  • Publication number: 20020190801
    Abstract: The present invention provides a method for adjusting the frequency of an oscillator. The method comprises providing a substrate having a plurality of openings, forming a conductive layer on a first surface of the substrate and patterning the conductive layer to form a plurality of strip line, one of which is formed corresponding to the openings to become an inductance circuit, covering the conductive layer with a lid, and cutting part of the strip line through the plurality of openings from the opposite side of the first surface to adjust frequencies of the oscillator.
    Type: Application
    Filed: June 4, 2002
    Publication date: December 19, 2002
    Inventor: Tsung-Shien Lin