Abstract: A method for the surface treatment of a corrosion-resistant nickel-based alloy and the resulting surface structure of the treated alloy is disclosed. The method includes immersing a nickel-based alloy in a first neutral or alkaline solution to remove surface contaminants, followed by immersing the cleaned alloy in a second neutral or alkaline solution to form functional groups on its surface. Subsequently, a low-temperature heat treatment is performed to form a passivation layer on the surface of the nickel-based alloy. The passivation layer has a surface roughness of less than 0.04 microns and a thickness ranging from 5 nanometers to 200 nanometers. The resulting corrosion-resistant nickel-based alloy comprises a substrate made of the nickel-based alloy and a passivation layer established on at least one surface of the substrate. The nickel content of the alloy is greater than 50%, and the alloy may also contain additional metallic components such as chromium (Cr) and manganese (Mn).

Abstract: An apparatus includes a base component and a plurality of collimators housed within the base component. Each collimator of the plurality of collimators corresponds to a respective location of a plurality of locations of a wafer in an etch chamber. The plurality of locations includes a center location of the wafer, a plurality of inner ring locations along an inner ring of the wafer associated with a first set of radially symmetric optical emission spectroscopy (OES) signal sampling paths, and a plurality of outer ring locations along an outer ring of the wafer associated with a second set of radially symmetric OES signal sampling paths.

Abstract: An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.

Abstract: An apparatus includes a base component and collimators housed within the base component. The collimators correspond to collection cylinders for sampling optical emission spectroscopy (OES) signals with respect to locations of a wafer in an etch chamber. The apparatus further includes a guide, operatively coupled to the plurality of collimators, to guide the sampling of the OES signals along paths for sampling the OES signals.

Abstract: A protective film with high hardness and low friction coefficient includes an interface layer, a buffer layer, and a high-hardness passivation layer. The protective film has good wear resistance and low friction coefficient and can be applied to a mask package box for photolithography such as a deep ultraviolet (DUV) lithography, an extreme ultraviolet (EUV) lithography, an immersion lithography and a multiple patterning lithography of the photovoltaic and semiconductor industries. The protective film is used to protect the mask package box applied for photolithographic exposure and ensure the yield of the photolithographic process.

Abstract: Provided here are cell detection systems, fluidic devices, structures and techniques related to particle and cell sorting and detection in fluid, for example sorting specific subpopulations of cell types. A method for verification of sorting of particles includes receiving a first detection signal that is associated with optical characteristics of a particle in a first channel. A sorting channel of a plurality of second channels is determined based on the first detection signal, thereby determining the sorting of the particle into the sorting channel based on the optical characteristics of the particle. A sorting signal for sorting the particle from the first channel into the sorting channel is transmitted. A second detection signal is received that is associated with the presence of the particle in the sorting channel. The sorting of the particle from the first channel into the sorting channel is verified based on the second detection signal.

Abstract: Techniques, devices and systems are disclosed for characterizing particles in a fluid sample by optical space-time coding. In one aspect, a microfluidic device for optical detection of particles includes a substrate, a microfluidic channel formed on the substrate and structured to carry a fluid sample containing particles, in which the microfluidic channel is structured to transmit a probe light, and a mask formed on one side of the microfluidic channel and structured to include a pattern of openings along the microfluidic channel, in which at least two of the openings have varying dimensions across the microfluidic channel, and in which the pattern of openings encodes a waveform on the probe light that transmits through the microfluidic channel to allow optical detection of a position of a particle in the microfluidic channel.

Abstract: Techniques, devices and systems are disclosed for characterizing particles in a fluid sample by optical space-time coding. In one aspect, a microfluidic device for optical detection of particles includes a substrate, a microfluidic channel formed on the substrate and structured to carry a fluid sample containing particles, in which the microfluidic channel is structured to transmit a probe light, and a mask formed on one side of the microfluidic channel and structured to include a pattern of openings along the microfluidic channel, in which at least two of the openings have varying dimensions across the microfluidic channel, and in which the pattern of openings encodes a waveform on the probe light that transmits through the microfluidic channel to allow optical detection of a position of a particle in the microfluidic channel.