Abstract: A process which comprises reacting a high molecular weight polyorganosiloxane or a composition containing the same with an alkoxysilane and/or a partially hydrolyzed condensate thereof at a temperature of lower than 300.degree. C. in the presence of an alcoholate compound and recovering the resulting organoalkoxysilane and, in addition thereto, at least one of a distillable polyorganosiloxane low molecular weight compound, a non-volatile liquid polyorganosiloxane and a silica; and a process which comprises reacting a high molecular weight polyorganosiloxane or a composition containing the same with an alcoholate compound at a temperature of 50.degree. to 150.degree. C. in an anhydrous state and recovering the resulting distillable polyorganosiloxane low molecular weight compound and, in addition thereto, at least one of an organoalkoxysilane and a non-volatile liquid polyorganosiloxane.

Abstract: This invention relates to a process for preparing dialkyl carbonates by the reaction of one kind or a mixture of two or more kinds selected from urea, methyl carbamate and ethyl carbamate with methanol and/or ethanol in the presence of a catalyst under pressure at 100.degree. to 250.degree. C. and the process does not use poisonous phosgene or carbon monoxide as raw material and readily yields dimethyl carbonate and diethyl carbonate in simple equipment.

Abstract: This invention relates to a process for preparing alkoxysilanes of the general formula (R.sup.2) .sub.a SiH(OR.sup.1).sub.b in which R.sup.1 is a lower alkyl group with 1 to 6 carbon atoms, R.sup.2 is an aliphatic or aromatic hydrocarbon radical with 1 to 8 carbon atoms, a is 0 or 1, and b is 2 or 3 by the reaction of metallic silicon, an alcohol, and an acetal and/or an orthocarboxylic acid ester in the presence of a copper catalyst and provides a novel process for preparing directly and advantageously alkoxysilanes having one hydrogen atom linked to the silicon atom, particularly alkyldialkoxysilanes and trialkoxysilanes.

Abstract: Disclosed is a method for surface treatment of phosphor particles which comprises forming a continuous film of silicon dioxide on the surface of each phosphor particle by treating the phosphor particle with a solution containing an aqueous solution of organic alkali and silicon dioxide dissolved therein.