Patents by Inventor Tsutomu Doi

Tsutomu Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing method and processing apparatus
    Patent number: 6374834
    Abstract: This invention provides a cleaning method of cleaning a laser mark formed on a semiconductor wafer. A semiconductor wafer is rotated in a circumferential direction, and a laser mark is detected indirectly or directly in a non-contact manner. Rotation of the semiconductor wafer is controlled on the basis of detection of the laser mark, and an ultrasonic vibration-applied processing solution is sprayed to the laser mark.
    Type: Grant
    Filed: July 31, 2000
    Date of Patent: April 23, 2002
    Assignees: Shin-Etsu Handotai Co., Ltd., Shibaura Mechatronics Corporation of Kanagawa
    Inventors: Tatsuo Abe, Tsutomu Doi
  • Spin-processing apparatus and spin-processing method
    Patent number: 6192903
    Abstract: The present invention provides a spin-processing apparatus less likely to produce a mist when an object to be processed is rotated. The apparatus is characterized in that it comprises a cup body having a lower cup and an upper cup mounted relative to the lower cup to be up/down movable, a rotation body retaining the object mounted within the cup body, a step motor rotationally driving the rotation body, an exhaust tube connected to a bottom of the lower cup to allow a gas in the cup body to be exhausted, and a scatter-proof cover provided within the upper cup and mounted above the rotation body.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: February 27, 2001
    Assignees: Shibaura Mechatronics Corporation, Kabushiki Kaisha Toshiba
    Inventors: Tsutomu Doi, Yoshiaki Kurokawa, Naoaki Sakurai