Patents by Inventor Tsutomu Iida

Tsutomu Iida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120097205
    Abstract: Provided is a magnesium-silicon composite material which contains Mg2Si as an intermetallic compound imposing no burden on the environment, is suitable for use as a material for thermoelectric conversion modules, and has excellent thermoelectric conversion performance. The magnesium-silicon composite material has a dimensionless figure-of-merit parameter at 866K of 0.665 or larger. This magnesium-silicon composite material can have high thermoelectric conversion performance when used in, for example, a thermoelectric conversion module.
    Type: Application
    Filed: June 30, 2010
    Publication date: April 26, 2012
    Applicant: Tokyo University of Science Educational Foundation Administrative Organization
    Inventors: Tsutomu Iida, Yasuhiko Honda, Naoki Fukushima, Tatsuya Sakamoto, Yohiko Mito, Hirokuni Nanba, Yutaka Taguchi
  • Publication number: 20120000500
    Abstract: Provided is a thermoelectric conversion element which enables improvement in yield and durability, is easy to secure a temperature difference between the both ends and is easy to be bonded to an electrode without tilting, resulting in improvement of mass productivity. Also provided is a thermoelectric conversion module using the thermoelectric conversion element. A thermoelectric conversion element includes: a plurality of pole-shaped parts with one ends of which being electrically connected to a first electrode, and the pole-shaped-parts being arranged at an interval from each other; and a joining/connecting part joining/connecting the other ends of the pole-shaped parts together, and electrically connected to a second electrode. A connecting face of the joining/connecting part, the face being connected to the second electrode, is larger than the sum total of areas of one ends of the pole-shaped parts.
    Type: Application
    Filed: February 24, 2010
    Publication date: January 5, 2012
    Applicant: Tokyo University of Science Education Foundation Administration Organization
    Inventors: Tsutomu Iida, Yohei Oguni, Takashi Nemoto, Junichi Sato
  • Publication number: 20110070433
    Abstract: A sheet is produced by curing an energy ray curable composition which includes a urethane acrylate oligomer and a compound having a thiol group in the molecule. The sheet has heat resistance to prevent outgassing.
    Type: Application
    Filed: September 20, 2010
    Publication date: March 24, 2011
    Applicants: LINTEC CORPORATION, ARAKAWA CHEMICAL INDUSTRIES, LTD.
    Inventors: Hironobu Fujimoto, Tsutomu Iida, Tomohide Fukuzaki
  • Patent number: 7771608
    Abstract: A plasma processing method using a plasma processing apparatus comprising a vacuum processing chamber, a substrate electrode having an electrostatic chucking film for chucking a material to be processed, an electrostatic chucking DC power supply and a substrate bias high-frequency power supply connected to the substrate electrode, and a plasma generating unit for generating the plasma in the vacuum processing chamber. The high-frequency voltage Vpp applied to the substrate electrode is monitored, and based on the Vpp signal thus monitored, the output voltage of the electrostatic chucking DC power supply is controlled thereby to maintain the voltage applied on the electrostatic chucking film at the desired value while at the same time controlling the output of the substrate bias high-frequency power supply in ramp with time.
    Type: Grant
    Filed: January 29, 2007
    Date of Patent: August 10, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masahiro Sumiya, Tsutomu Iida
  • Publication number: 20100051081
    Abstract: A thermoelectric conversion material is provided which stably exhibits high thermoelectric conversion performance at about 300 to 600° C. and has high physical strength, resistance to weathering, durability, stability, and reliability. A method for manufacturing the same, and a thermoelectric conversion element are also provided. Also provided is a thermoelectric conversion material produced using, as a raw material, silicon sludge which has had to be disposed of in landfill. The thermoelectric conversion material of the invention is characterized by containing, as a main component, a sintered body composed of polycrystalline magnesium silicide containing at least one element selected from As, Sb, P, Al, and B. The manufacturing method uses purified and refined silicon sludge.
    Type: Application
    Filed: December 19, 2007
    Publication date: March 4, 2010
    Applicants: SHOWA KDE CO., LTD., TOKYO UNIVERSITY OF SCIENCE EDUCATIONAL FOUNDATION ADMINISTRATIVE ORGANIZATION, NIPPON THERMOSTAT CO., LTD.
    Inventors: Tsutomu Iida, Yohiko Mito, Takashi Nemoto
  • Publication number: 20080068774
    Abstract: A plasma processing method using a plasma processing apparatus comprising a vacuum processing chamber, a substrate electrode having an electrostatic chucking film for chucking a material to be processed, an electrostatic chucking DC power supply and a substrate bias high-frequency power supply connected to the substrate electrode, and a plasma generating unit for generating the plasma in the vacuum processing chamber. The high-frequency voltage Vpp applied to the substrate electrode is monitored, and based on the Vpp signal thus monitored, the output voltage of the electrostatic chucking DC power supply is controlled thereby to maintain the voltage applied on the electrostatic chucking film at the desired value while at the same time controlling the output of the substrate bias high-frequency power supply in ramp with time.
    Type: Application
    Filed: January 29, 2007
    Publication date: March 20, 2008
    Inventors: Masahiro Sumiya, Tsutomu Iida
  • Publication number: 20070235135
    Abstract: A plasma processing apparatus including a vacuum vessel, a lower electrode provided in the vacuum vessel to place a sample thereon, a matcher connected to the lower electrode, and a power supply for supplying power to the lower electrode via the matcher includes an electrostatic chuck electrode provided within the lower electrode to hold the sample, and a voltage measurement circuit provided within the lower electrode to measure a voltage at the electrostatic chuck electrode and output the measured voltage as a DC voltage.
    Type: Application
    Filed: August 31, 2006
    Publication date: October 11, 2007
    Inventors: Ryoji Nishio, Tsutomu Iida
  • Publication number: 20070181254
    Abstract: A plasma processing apparatus has a processing chamber connected to an exhaust system so that the inside pressure can be reduced, a gas feeding unit for supplying gas to the processing chamber, a wafer, and a substrate electrode on which the wafer can be placed. The plasma processing apparatus also has an antenna electrode provided in opposition to the substrate electrode to generate plasma, a plasma generating high-frequency power supply connected to the antenna electrode, and a wafer biasing power supply connected to the substrate electrode. In addition, a coaxial line and a coaxial waveguide are optimized by using a coaxial model, and a voltage measuring circuit is mounted right under the coaxial line.
    Type: Application
    Filed: February 27, 2006
    Publication date: August 9, 2007
    Inventors: Tsutomu Iida, Ryoji Nishio, Yutaka Omoto, Masahiro Sumiya
  • Patent number: 7125730
    Abstract: In power supply and a semiconductor making apparatus and a semiconductor fabricating method using the same, an abnormality can be detected when an offset occurs in a part constituting a closed-loop system of high-frequency power supply or dc power supply for a semiconductor making apparatus. Power supply for receiving a power value setting signal to set strength of power and a power on/off instruction to set on or off of outputting of the power interrupts the supply of the power even in a state in which a subsequent power on/off instruction is on if a power sense signal according to a value obtained by sensing the power exceeds a predetermined value when the power on/off instruction is off.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: October 24, 2006
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Youji Takahashi, Tsutomu Iida, Tsuyoshi Umemoto, Makoto Kashibe
  • Patent number: 6713885
    Abstract: In power supply and a semiconductor making apparatus and a semiconductor fabricating method using the same, an abnormality can be detected when an offset occurs in a part constituting a closed-loop system of high-frequency power supply or dc power supply for a semiconductor making apparatus. Power supply for receiving a power value setting signal to set strength of power and a power on/off instruction to set on or off of outputting of the power interrupts the supply of the power even in a state in which a subsequent power on/off instruction is on if a power sense signal according to a value obtained by sensing the power exceeds a predetermined value when the power on/off instruction is off.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: March 30, 2004
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Youji Takahashi, Tsutomu Iida, Tsuyoshi Umemoto, Makoto Kashibe
  • Publication number: 20040056706
    Abstract: In power supply and a semiconductor making apparatus and a semiconductor fabricating method using the same, an abnormality can be detected when an offset occurs in a part constituting a closed-loop system of high-frequency power supply or dc power supply for a semiconductor making apparatus. Power supply for receiving a power value setting signal to set strength of power and a power on/off instruction to set on or off of outputting of the power interrupts the supply of the power even in a state in which a subsequent power on/off instruction is on if a power sense signal according to a value obtained by sensing the power exceeds a predetermined value when the power on/off instruction is off.
    Type: Application
    Filed: September 4, 2003
    Publication date: March 25, 2004
    Inventors: Youji Takahashi, Tsutomu Iida, Tsuyoshi Umemoto, Makoto Kashibe
  • Publication number: 20030162309
    Abstract: In power supply and a semiconductor making apparatus and a semiconductor fabricating method using the same, an abnormality can be detected when an offset occurs in a part constituting a closed-loop system of high-frequency power supply or dc power supply for a semiconductor making apparatus. Power supply for receiving a power value setting signal to set strength of power and a power on/off instruction to set on or off of outputting of the power interrupts the supply of the power even in a state in which a subsequent power on/off instruction is on if a power sense signal according to a value obtained by sensing the power exceeds a predetermined value when the power on/off instruction is off.
    Type: Application
    Filed: February 26, 2002
    Publication date: August 28, 2003
    Inventors: Youji Takahashi, Tsutomu Iida, Tsuyoshi Umemoto, Makoto Kashibe
  • Publication number: 20030141394
    Abstract: A self-propelling wood crushing machine comprises a body frame 10; travel devices 11 provided at both ends of the body frame 10 in the widthwise direction; a crusher provided substantially at the center of the body frame 10 in the longitudinal direction and including a crushing rotor 20 having a crushing bit 18 disposed on an outer periphery thereof; a carrier conveyor 3 provided on one side of the body frame 10 in the longitudinal direction to extend in the longitudinal direction of the body frame 10 and feeding wood to be crushed to the crusher; a pressing conveyor 5 comprising a pressing roller provided above the carrier conveyor 3 in the vicinity of the crusher, a drive roller provided on the side opposite to the pressing roller away from the crusher, and a feeding belt stretched between and wound around the pressing roller and the drive roller, the pressing conveyor 5 pressing the wood to be crushed while moving up and down, thereby introducing the wood to the crusher under cooperation with the feeding m
    Type: Application
    Filed: January 3, 2003
    Publication date: July 31, 2003
    Inventors: Kazunori Ueda, Kazuhide Seki, Masamichi Tanaka, Yoshimi Shiba, Tsutomu Iida, Makoto Yagishita
  • Patent number: 6586079
    Abstract: A recording material having a resin layer containing a polyester resin as a main component on a support, the recording material is disclosed in having (A) a groove or grooves placed continuously or intermittently extending linearly with a depth not less than 45% but not more than 90% of the thickness of the recording material, or (B) linearly continuous holes wherein width of the holes is not less than 15·m and not more than 130·m, length of the holes is not less than 50·m and not more than 500·m, and interval between the holes is not less than 30·m and not more than 300·m. In use of this recording material, printed items in a desired size can be formed rapidly and easily.
    Type: Grant
    Filed: May 22, 2000
    Date of Patent: July 1, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoshihiko Shibahara, Fumihiro Oguri, Mio Fujimoto, Tsutomu Iida
  • Patent number: 5121439
    Abstract: In an image processor for detecting incomplete articles the image of a complete article is produced by a television camera so as to record the image, and the operator designates an area of the complete article that is considered to be essential in judging whether or not the subject of the inspection is complete while observing the reproduced image. Following this, the image of an inspection article is produced by another television camera. The video signals are binarized, and the number of the picture elements of the inspection article within the designated area is then counted. The inspection article is judged as being incomplete when this counted value fails to conform to the reference value obtained by statistically processing the number of the picture elements of the complete article.
    Type: Grant
    Filed: August 14, 1989
    Date of Patent: June 9, 1992
    Assignee: Sumitomo Wiring System, Ltd.
    Inventors: Michio Fukuda, Tsutomu Iida, Yoshihide Ichikawa, Kiyohide Abe, Hiroshi Igura, Tsuneyoshi Takahashi, Isao Kashihara
  • Patent number: 4979292
    Abstract: An apparatus and method for producing a filament harness which comprises feeding a plurality of strands in a downstream direction onto a support which receives the strands. There is a head which contacts the strands and a control means for causing relative motion between the support and the head to form the plurality of wires into a predetermined, desired pattern. In addition, the product produced by the method is also disclosed.
    Type: Grant
    Filed: September 22, 1989
    Date of Patent: December 25, 1990
    Assignee: Sumitomo Wiring Systems, Ltd.
    Inventors: Michio Fukuda, Tsutomu Iida, Naoki Kuroda, Nobuyuki Itaya