Patents by Inventor Tsutomu Nishinaga

Tsutomu Nishinaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8117737
    Abstract: A manufacturing method for a magnetic head includes the steps of: forming a structure on a lower shield, the structure including a lower gap, a main magnetic pole and first and second side gaps; forming first and second side shields; forming an upper gap; and forming an upper shield. In the step of forming the structure, an initial lower gap layer is formed on the lower shield, the initial lower gap layer including a pre-lower-gap portion, and two to-be-removed portions that are located on opposite sides of the pre-lower-gap portion. Then, a protrusion including the main magnetic pole and the first and second side gaps is formed on the pre-lower-gap portion. With the top surface of the protrusion covered with a mask, the initial lower gap layer is etched in part to thereby form the lower gap.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: February 21, 2012
    Assignee: TDK Corporation
    Inventors: Hisayoshi Watanabe, Masachika Hashino, Michitoshi Tsuchiya, Koichi Otani, Tatsuhiro Nojima, Tsutomu Nishinaga, Hideyuki Ukita
  • Publication number: 20110127234
    Abstract: A manufacturing method for a magnetic head includes the steps of; forming a structure on a lower shield, the structure including a lower gap, a main magnetic pole and first and second side gaps; forming first and second side shields; forming an upper gap; and forming an upper shield. In the step of forming the structure, an initial lower gap layer is formed on the lower shield, the initial lower gap layer including a pre-lower-gap portion, and two to-be-removed portions that are located on opposite sides of the pre-lower-gap portion. Then, a protrusion including the main magnetic pole and the first and second side gaps is formed on the pre-lower-gap portion. With the top surface of the protrusion covered with a mask, the initial lower gap layer is etched in part to thereby form the lower gap.
    Type: Application
    Filed: November 30, 2009
    Publication date: June 2, 2011
    Applicant: TDK CORPORATION
    Inventors: Hisayoshi Watanabe, Masachika Hashino, Michitoshi Tsuchiya, Koichi Otani, Tatsuhiro Nojima, Tsutomu Nishinaga, Hideyuki Ukita