Abstract: A heat pump system generates cooling by evaporating a refrigerant using an evaporator, and generates cooling by using a compressor to desorb refrigerant that has been evaporated by the evaporator and adsorbed at an adsorption device.

Abstract: A heat pump system generates cooling by evaporating a refrigerant using an evaporator, and generates cooling by using a compressor to desorb refrigerant that has been evaporated by the evaporator and adsorbed at an adsorption device.

Abstract: An object is to enable a compact and high output heat storage system to perform warm-up rapidly when a vehicle is started up, and after warm-up, to recover surplus heat that is present in a heat source in the vehicle to prepare for the next warm-up event. A heat recovery-type heating device includes: an ammonia buffer configured so as to be capable of fixing and desorbing ammonia that serves as a chemical reaction medium; and a chemical heat storage reactor provided with a chemical heat storage material that generates heat through a chemical reaction with ammonia supplied from the ammonia buffer, and that desorbs ammonia using surplus heat from a heat source and returns the ammonia to the ammonia buffer.

Abstract: An object is to enable a compact and high output heat storage system to perform warm-up rapidly when a vehicle is started up, and after warm-up, to recover surplus heat that is present in a heat source in the vehicle to prepare for the next warm-up event. A heat recovery-type heating device includes: an ammonia buffer configured so as to be capable of fixing and desorbing ammonia that serves as a chemical reaction medium; and a chemical heat storage reactor provided with a chemical heat storage material that generates heat through a chemical reaction with ammonia supplied from the ammonia buffer, and that desorbs ammonia using surplus heat from a heat source and returns the ammonia to the ammonia buffer.

Abstract: In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.

Abstract: In the manufacture of a photomask blank, a seed layer of a chromium material containing oxygen, nitrogen and/or carbon is formed on a transparent substrate before a light-shielding film and an antireflective film are deposited thereon. Any film on the seed layer builds up in accordance with fine granular growth, and so the resulting photomask blank has an improved surface roughness, which enables high-sensitivity detection in the process of defect inspection and circuit pattern inspection. By lithographically patterning the photomask blank, a photomask is fabricated.

Abstract: In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.

Abstract: In the manufacture of a photomask blank, a seed layer of a chromium material containing oxygen, nitrogen and/or carbon is formed on a transparent substrate before a light-shielding film and an antireflective film are deposited thereon. Any film on the seed layer builds up in accordance with fine granular growth, and so the resulting photomask blank has an improved surface roughness, which enables high-sensitivity detection in the process of defect inspection and circuit pattern inspection. By lithographically patterning the photomask blank, a photomask is fabricated.