Patents by Inventor Tsutomu Tawa
Tsutomu Tawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9006338Abstract: An aqueous resin composition with gas barrier properties contains (i) polyurethane resin having aurethane group and a urea group in a total concentration of 25 to 60% by weight and having a acid value of 5 to 100 mgKOH/g, (ii) a swelling inorganic layered compound (e.g., a water-swelling mica, and a montmorillonite), and (iii) a polyamine compound having an amine value of 100 to 1900 mgKOH/g. The polyurethane resin (i) is obtained by a reaction of (A) an aromatic, araliphatic or alicyclic polyisocyanate, (B) a polyhydroxyalkanecarboxylic acid, and at least one component selected from (C) a C2-8alkylene glycol and (D) a chain-extension agent (e.g., diamine, hydrazine and a hydrazine derivative), and neutralized with a neutralizing agent. The proportion of the acid group of the polyurethane resin (i) relative to the basic nitrogen atom of the polyamine compound (iii) is 10/1 to 1/5 as the equivalent ratio.Type: GrantFiled: October 7, 2004Date of Patent: April 14, 2015Assignees: Mitsui Takeda Chemicals, Inc., Futamura Kagaku Kabushiki KaishaInventors: Takashi Uchida, Tsutomu Tawa, Takuzo Imaizumi
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Patent number: 8034456Abstract: The present invention provides a surface-treated metal material having a film formed on at least a portion of a surface of a metal material, the film containing at least polyurethane resin and silicon oxide, and a metal surface treatment agent used to obtain the surface-treated metal material. The polyurethane resin contains one or more of siloxane bond, dehydration-condensation bond of silanol group and different functional group, and silanol moiety, and urea bond. The sum of the siloxane bond, the dehydration-condensation bond of silanol group and different functional group, total amount of the silanol moiety, and the silicon oxide falls within a range of equal to or more than 1.6 wt % to equal to or less than 25 wt % for solids of the film. The ratio of the total amount of urea bond and urethane bond to the total amount of resin components falls within a range of equal to or more than 0.1 wt % to equal to or less than 10 wt %.Type: GrantFiled: June 22, 2007Date of Patent: October 11, 2011Assignees: Nippon Steel Corporation, Mitsui Chemicals, Inc.Inventors: Atsushi Morishita, Masahiro Fuda, Hiroshi Kanai, Hiroshi Kosuge, Tsutomu Tawa
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Publication number: 20100233490Abstract: The present invention provides a surface-treated metal material having a film formed on at least a portion of a surface of a metal material, the film containing at least polyurethane resin and silicon oxide, and a metal surface treatment agent used to obtain the surface-treated metal material. The polyurethane resin contains one or more of siloxane bond, dehydration-condensation bond of silanol group and different functional group, and silanol moiety, and urea bond. The sum of the siloxane bond, the dehydration-condensation bond of silanol group and different functional group, total amount of the silanol moiety, and the silicon oxide falls within a range of equal to or more than 1.6 wt % to equal to or less than 25 wt % for solids of the film. The ratio of the total amount of urea bond and urethane bond to the total amount of resin components falls within a range of equal to or more than 0.1 wt % to equal to or less than 10 wt %.Type: ApplicationFiled: June 22, 2007Publication date: September 16, 2010Inventors: Atsushi Morishita, Masahiro Fuda, Hiroshi Kanai, Hiroshi Kosuge, Tsutomu Tawa
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Patent number: 7342241Abstract: The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.Type: GrantFiled: July 13, 2005Date of Patent: March 11, 2008Assignee: Hitachi High-Technologies CorporationInventors: Yasuko Aoki, Tsutomu Tawa, Yoshimitsu Saze
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Publication number: 20070031679Abstract: An aqueous resin composition with gas barrier properties contains (i) polyurethane resin having aurethane group and a urea group in a total concentration of 25 to 60% by weight and having a acid value of 5 to 100 mgKOH/g, (ii) a swelling inorganic layered compound (e.g., a water-swelling mica, and a montmorillonite), and (iii) a polyamine compound having an amine value of 100 to 1900 mgKOH/g. The polyurethane resin (i) is obtained by a reaction of (A) an aromatic, araliphatic or alicyclic polyisocyanate, (B) a polyhydroxyalkanecarboxylic acid, and at least one component selected from (C) a C2-8alkylene glycol and (D) a chain-extension agent (e.g., diamine, hydrazine and a hydrazine derivative), and neutralized with a neutralizing agent. The proportion of the acid group of the polyurethane resin (i) relative to the basic nitrogen atom of the polyamine compound (iii) is 10/1 to 1/5 as the equivalent ratio.Type: ApplicationFiled: October 7, 2004Publication date: February 8, 2007Inventors: Takashi Ushida, Tsutomu Tawa, Takuzo Imaizumi
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Publication number: 20060011080Abstract: The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.Type: ApplicationFiled: July 13, 2005Publication date: January 19, 2006Inventors: Yasuko Aoki, Tsutomu Tawa, Yoshimitsu Saze
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Patent number: 6979493Abstract: A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e.g., an aromatic diisocyanate) with a diol component (e.g., a C2–8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics, and others, and a film containing the same.Type: GrantFiled: April 10, 2003Date of Patent: December 27, 2005Assignee: Mitsui Takeda Chemical Inc.Inventors: Takashi Uchida, Tsutomu Tawa, Hiroyuki Shiraki
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Patent number: 6797770Abstract: A coating composition capable of forming an alkali-soluble lubricating film, which contains as main components an aqueous polyurethane composition (A) and a lubricating functionality-providing agent (B) at 1-30 wt % with respect to the solid content of the aqueous polyurethane composition, having excellent press moldability and scratch resistance, as well as lubricating surface treated metal articles with excellent press moldability and scratch resistance, that are coated with the coating composition to a dry film thickness of 0.5-5 &mgr;m. The coating composition preferably further contains as a main component silica particles (C) in an amount of 1-30 wt % with respect to the solid content of the aqueous polyurethane composition.Type: GrantFiled: October 31, 2001Date of Patent: September 28, 2004Assignees: Nippon Steel Corporation, Mitsui Takeda Chemicals, INCInventors: Yoichiro Mori, Makoto Yamasaki, Masahiro Fuda, Ryosuke Wake, Tsutomu Tawa, Chikako Kouda, Fumiaki Hirata
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Publication number: 20040121162Abstract: In order to provide an alkali-soluble-film surface-lubricated metal product excellent in moldability and long-term stable film-removability independent of the film drying temperature, an alkali-soluble lubricating film mainly comprising an alkali-soluble polyurethane aqueous composition containing a polyether polyol as a skeleton and also containing a carboxyl group within the molecule, and a lubricating function-imparting agent in an amount of 1 to 30 mass % based on the alkali-soluble polyurethane aqueous composition is coated on both surfaces or one surface of a metal to have a film thickness of 0.5 to 10 &mgr;m, thereby constituting an alkali-soluble-film surface-lubricated metal product excellent in moldability and long-term stable film-removability independent of the film drying temperature, wherein the elastic modulus of the film after coating is from 0.5 to 20 GPa at 25° C.Type: ApplicationFiled: September 30, 2003Publication date: June 24, 2004Inventors: Ikuro Yamaoka, Hiroshi Kanai, Akihiro Miyasaka, Yoichiro Mori, Tsutomu Tawa, Mitsuhiro Nishimura, Chikako Kouda
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Patent number: 6730407Abstract: A soluble lubricating surface-treated stainless steel sheet with excellent shapability for fuel tanks, comprising a substrate having on both surfaces or one surface thereof a soluble lubricating resin film. Preferably, the soluble lubricating resin film mainly comprises (A) an alkali-soluble polyurethane resin composition containing a carboxyl group or a sulfonic acid group within the molecule and having a glass transition point of 100° C. or more as a dry film and (B) a lubricating function-imparting agent in an amount of from 1 to 30% by mass based on the polyurethane composition.Type: GrantFiled: August 8, 2001Date of Patent: May 4, 2004Assignees: Nippon Steel Corporation, Mitsui Takeda Chemicals, Inc.Inventors: Yoichiro Mori, Akihiro Miyasaka, Hiroshi Kanai, Ikuro Yamaoka, Tsutomu Tawa, Chikako Kouda, Mitsuhiro Nishimura
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Publication number: 20040033909Abstract: A surface-lubricated metal product, with excellent shapability, comprising a metal having coated on both surfaces, or one surface, thereof an alkali-soluble lubricating film mainly comprising an alkali-soluble polyurethane aqueous composition containing a carboxyl group or a sulfonic acid group within the molecule, and a lubricating function-imparting agent in an amount of 1 to 30 mass % based on the alkali-soluble polyurethane aqueous composition, the film being coated to have a film thickness of 0.5 to 10 &mgr;m and the elastic modulus of the film after coating being 0.5 to 20 GPa at 25° C.Type: ApplicationFiled: May 15, 2003Publication date: February 19, 2004Inventors: Ikuro Yamaoka, Hiroshi Kanai, Akihiro Miyasaka, Yoichiro Mori, Tsutomu Tawa, Mitsuhiro Nishimura, Chikako Kouda
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Publication number: 20030207122Abstract: A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e.g., an aromatic diisocyanate) with a diol component (e.g., a C2-8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics, and others, and a film containing the same.Type: ApplicationFiled: April 10, 2003Publication date: November 6, 2003Inventors: Takashi Uchida, Tsutomu Tawa, Hiroyuki Shiraki
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Patent number: 6569533Abstract: A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e.g., an aromatic diisocyanate) with a diol component (e.g., a C2-8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics, and others, and a film containing the same.Type: GrantFiled: July 19, 2000Date of Patent: May 27, 2003Assignee: Mitsui Takeda Chemicals Inc.Inventors: Takashi Uchida, Tsutomu Tawa, Hiroyuki Shiraki
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Publication number: 20020098367Abstract: A soluble lubricating surface-treated stainless steel sheet with excellent shapability for fuel tanks, comprising a substrate having on both surfaces or one surface thereof a soluble lubricating resin film. Preferably, the soluble lubricating resin film mainly comprises (A) an alkali-soluble polyurethane resin composition containing a carboxyl group or a sulfonic acid group within the molecule and having a glass transition point of 100° C. or more as a dry film and (B) a lubricating function-imparting agent in an amount of from 1 to 30% by mass based on the polyurethane composition.Type: ApplicationFiled: August 8, 2001Publication date: July 25, 2002Inventors: Yoichiro Mori, Akihiro Miyasaka, Hiroshi Kanai, Ikuro Yamaoka, Tsutomu Tawa, Chikako Kouda, Mitsuhiro Nishimura
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Patent number: 5348837Abstract: A projection exposure apparatus has an effective source, a mask, a projection lens and an optical filter. The mask is illuminated with the light from the effective source having a substantially annular illumination distribution. The optical filter is disposed in the approximate position of the pupil plane of the projection lens. On the pupil plane, the transmittance of a first region is made lower than that of a second region, the first region being inside of the periphery of an annular region substantially conjugate with the effective source having the annular illumination distribution, the second region being outside of the periphery. Built in this manner, the apparatus forms fine patterns whose unit size is at least as small as the wavelength of the light used while maintaining high values of contrast and deep levels of focal length.Type: GrantFiled: February 2, 1993Date of Patent: September 20, 1994Assignee: Hitachi, Ltd.Inventors: Hiroshi Fukuda, Ryoko Yamanaka, Tsutomu Tawa, Tsuneo Terasawa, Seiji Yonezawa
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Patent number: 5323208Abstract: In a reduction-type projection exposure apparatus provided by the present invention, a spatial filter having a predetermined complex amplitude-transmission distribution is fixed approximately at the pupil position of a projection lens thereof or at such a position that the spatial filter conjugates with the pupil. The complex amplitude transmittance of the spatial filter is controlled by a multiple-interference effect of the multi-layer coating forming the spatial filter or by the surface reflection occurring on the surface of the film which constitutes the spatial filter and has an index of refraction different from the air. The filter can thus be prevented from absorbing light, incurring neither thermal damage nor damage due to dissipated heat. As a result, the reduction-type projection exposure apparatus offers excellent resolution and an outstanding depth of focus.Type: GrantFiled: March 8, 1993Date of Patent: June 21, 1994Assignee: Hitachi, Ltd.Inventors: Hiroshi Fukuda, Tsutomu Tawa, Toshihide Dohi