Abstract: A reactor device includes a reactor including at least one reacting unit supplied with a reactant to cause a reaction, a terminal portion provided at the reacting unit, and an electrically conductive member comprising an electrically conductive material and connected to the terminal portion, a space which extends between the terminal portion and an end face of the reactor, wherein the electrically conductive member is routed to outside the reactor through the space from the terminal portion to the end face of the reactor, and the electrically conductive member is fixed to the reactor at the end face.

Abstract: Disclosed is a reaction device including: a reaction device body including a reaction section in which a reactant reacts; and a first container to house the reaction device body, wherein the first container includes a radiation transmitting region through which radiation from the reaction device body transmits.

Abstract: Disclosed is a reaction device including: a reactor to cause a reaction of a reactant; a first container to house the reactor; and a second container to house the first container, wherein a gas is injected to a space between the reactor and the first container and the first container is sealed, and an atmospheric pressure in a space between the first container and the second container is lower than a normal atmospheric pressure.

Abstract: A thermal treatment apparatus provided on a substrate includes a heat generating section the section includes a heat generating layer, a diffusion preventing layer which contacts one surface of the heat generating layer to prevent heat diffusion due to heat generation of the heat generating layer, and a cohering layer disposed between the substrate and the diffusion preventing layer.

Abstract: A chemical reaction apparatus includes a solid body which has an outer surface, and in which at least one flow path which allows a chemical medium to flow is formed. This body has a heating element which heats the chemical medium in the flow path to accelerate a chemical reaction of the chemical medium, and a heat radiation preventing film which covers at least a portion of the outer surface of the body, and prevents radiation of heat generated by the heating element from a portion of the outer surface.

Abstract: A stack structure is formed by stacking and bonding a plurality of substrates. The stack structure includes bonding films each of which is interposed in a bonding region between, adjacent glass substrates, and bonded to oxygen atoms in the glass of the substrate by anodic bonding.

Abstract: A junction substrate includes a first substrate, a buffer film formed on one surface of the first substrate, a metal containing film formed on the buffer film and having a lower resistance than the buffer film, and a second substrate bonded to the other surface of the first substrate.

Abstract: A reactor device includes a reactor including at least one reacting unit supplied with a reactant to cause a reaction, a terminal portion provided at the reacting unit, and an electrically conductive member comprising an electrically conductive material and connected to the terminal portion, a space which extends between the terminal portion and an end face of the reactor, wherein the electrically conductive member is routed to outside the reactor through the space from the terminal portion to the end face of the reactor, and the electrically conductive member is fixed to the reactor at the end face.

Abstract: A reactor causing reaction of a reactant includes a plurality of substrates provided with top and bottom substrates having provided therein recessed portions for forming closely sealed regions and a plurality of intermediate substrates having provided therein at least openings that communicate with each other, a reactor main body portion including a reaction unit at which the intermediate substrates are formed to be laminated and joined with each other and a reaction flow channel reactant flows formed therein, and an envelope portion which houses the reactor main body portion therein except one end side thereof, via a closely sealed space formed by sandwiching the laminated intermediate substrates between the top and the bottom substrates and by communicating the opening and the closely sealed region on the substrates, and including a support portion which supports the reactor main body portion via the one end side of the reactor main body portion.

Abstract: A junction substrate includes a first substrate, a buffer film formed on one surface of the first substrate, a metal containing film formed on the buffer film and having a lower resistance than the buffer film, and a second substrate bonded to the other surface of the first substrate.

Abstract: A fuel cell fuel reformer including a gas reactor for producing reformed fuel and an electric heater for heating the gas reactor. An external container includes an inner vacuum chamber, which accommodates the gas reactor and the electric heater, and receiving portions. An electric wire extends through the external container to supply electric power to the electric heater in the inner vacuum chamber. Fluid tubes are received by the receiving portions and extend through the external container. A sealant seals gaps between the fluid tubes and the receiving portions. The gas reactor, the fluid tubes, the external container, and the sealant each have thermal expansion coefficients, with the maximum one of the thermal expansion coefficients being ten-times the minimum one of the thermal expansion coefficients or less.

Abstract: A stack structure is formed by stacking and bonding a plurality of substrates. The stack structure includes. Bonding films each of which is interposed in a bonding region between, adjacent glass substrates, and bonded to oxygen atoms in the glass of the substrate by anodic bonding.

Abstract: A thermal treatment apparatus provided on a substrate includes a heat generating section the section includes a heat generating layer, a diffusion preventing layer which contacts one surface of the heat generating layer to prevent heat diffusion due to heat generation of the heat generating layer, and a cohering layer disposed between the substrate and the diffusion preventing layer.

Abstract: A junction substrate includes a first substrate, a buffer film formed on one surface of the first substrate, a metal containing film formed on the buffer film and having a lower resistance than the buffer film, and a second substrate bonded to the other surface of the first substrate.

Abstract: A chemical reaction apparatus includes a solid body which has an outer surface, and in which at least one flow path which allows a chemical medium to flow is formed. This body has a heating element which heats the chemical medium in the flow path to accelerate a chemical reaction of the chemical medium, and a heat radiation preventing film which covers at least a portion of the outer surface of the body, and prevents radiation of heat generated by the heating element from a portion of the outer surface.