Patents by Inventor Tsutomu Tetsuka

Tsutomu Tetsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190287770
    Abstract: A plasma processing apparatus improves uniformity of a plasma in a radial direction, generation efficiency of plasma, and a yield of a process, and the apparatus includes a sample stage which includes a dielectric susceptor ring located surrounding a top surface of the sample stage on an outer peripheral and a dielectric lower ring-shaped plate located at a position lower than a top surface of the susceptor ring on its outer peripheral side. A difference in height between the top surfaces of the lower ring-shaped plate and the sample is set in a range of around 5 mm of a value found by a formula using a distance: G [mm] between the upper and the lower electrodes, a frequency: f [MHz] of a first high-frequency power, and a pressure: P [Pa] in the processing chamber, and ?0.1×G?0.06×f?4.4×ln(P)+22.
    Type: Application
    Filed: August 23, 2018
    Publication date: September 19, 2019
    Inventors: Taku IWASE, Tsutomu TETSUKA, Kenetsu YOKOGAWA
  • Publication number: 20190189396
    Abstract: A plasma processing apparatus includes: a processing room disposed inside a vacuum chamber; a sample stage disposed inside the processing room, having an upper surface on which a wafer to be processed is to be mounted; a dielectric discoid member opposed to the upper surface of the sample stage in an upper part of the processing room; a discoid upper electrode disposed having a side covered with the discoid member, the side facing the sample stage, the discoid upper electrode being to be supplied with first radio-frequency power for forming an electric field for forming plasma in the processing room; a coil disposed circumferentially above the processing room outside the vacuum chamber, the coil being configured to generate a magnetic field for forming the plasma; and a lower electrode disposed inside the sample stage, the lower electrode being to be supplied with second radio-frequency power for forming a bias potential on the wafer mounted on the sample stage.
    Type: Application
    Filed: February 27, 2018
    Publication date: June 20, 2019
    Inventors: Taku IWASE, Tsutomu TETSUKA, Masakazu ISOZAKI, Kenetsu YOKOGAWA, Masahito MORI
  • Patent number: 10229813
    Abstract: In a plasma processing apparatus including a processing chamber, a dielectric window for hermetically sealing the upper portion of the processing chamber, an induction antenna deployed above the dielectric window, a Faraday shield unit, and a control apparatus for controlling a first radio-frequency power source for supplying a radio-frequency power to the induction antenna, and a second radio-frequency power source for supplying a radio-frequency power to the Faraday shield unit, the Faraday shield unit includes a first Faraday shield having a first element, and a second Faraday shield having a second element deployed at a position adjacent to the first element, the control apparatus applying a time modulation to the radio-frequency powers that are respectively supplied to the first element and the second element, the phase of the first-element-supplied and time-modulated radio-frequency power being different from the phase of the second-element-supplied and time-modulated radio-frequency power.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: March 12, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Tadayoshi Kawaguchi, Ryoji Nishio, Tsutomu Tetsuka
  • Patent number: 10217613
    Abstract: A plasma processor, including a first gas supplier to supply first gas to the inside of a vacuum vessel, a stage on which a wafer is placed, an electromagnetic wave supplier to supply electromagnetic waves for generating first plasma, a susceptor provided to an outer peripheral portion of the stage, a second high frequency power source connected to the susceptor, and a second gas supplier to supply second gas to the inside of the susceptor. The inside of the susceptor is provided with a high frequency electrode connected to the second high frequency power source and a first earth electrode disposed opposite to the high frequency electrode. The second high frequency power source supplies high frequency power while the second gas supplier supplies the second gas, thereby generating second plasma inside the susceptor.
    Type: Grant
    Filed: September 23, 2016
    Date of Patent: February 26, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tetsuo Kawanabe, Takumi Tandou, Tsutomu Tetsuka, Naoki Yasui
  • Publication number: 20170186587
    Abstract: A plasma processor, including a first gas supplier to supply first gas to the inside of a vacuum vessel, a stage on which a wafer is placed, an electromagnetic wave supplier to supply electromagnetic waves for generating first plasma, a susceptor provided to an outer peripheral portion of the stage, a second high frequency power source connected to the susceptor, and a second gas supplier to supply second gas to the inside of the susceptor. The inside of the susceptor is provided with a high frequency electrode connected to the second high frequency power source and a first earth electrode disposed opposite to the high frequency electrode. The second high frequency power source supplies high frequency power while the second gas supplier supplies the second gas, thereby generating second plasma inside the susceptor.
    Type: Application
    Filed: September 23, 2016
    Publication date: June 29, 2017
    Inventors: Tetsuo KAWANABE, Takumi TANDOU, Tsutomu TETSUKA, Naoki YASUI
  • Publication number: 20150311040
    Abstract: In a plasma processing apparatus including a processing chamber, a dielectric window for hermetically sealing the upper portion of the processing chamber, an induction antenna deployed above the dielectric window, a Faraday shield unit, and a control apparatus for controlling a first radio-frequency power source for supplying a radio-frequency power to the induction antenna, and a second radio-frequency power source for supplying a radio-frequency power to the Faraday shield unit, the Faraday shield unit includes a first Faraday shield having a first element, and a second Faraday shield having a second element deployed at a position adjacent to the first element, the control apparatus applying a time modulation to the radio-frequency powers that are respectively supplied to the first element and the second element, the phase of the first-element-supplied and time-modulated radio-frequency power being different from the phase of the second-element-supplied and time-modulated radio-frequency power.
    Type: Application
    Filed: July 30, 2014
    Publication date: October 29, 2015
    Inventors: TADAYOSHI KAWAGUCHI, RYOJI NISHIO, TSUTOMU TETSUKA
  • Publication number: 20150270148
    Abstract: An etching apparatus including a processing chamber, a supply unit for reactive species, and a lamp for vacuum-ultraviolet light irradiation is prepared. In the etching apparatus, etching can be performed by repeating a first step of adsorbing the reactive species to a surface of a wafer to form byproducts, a second step of irradiating the surface of the wafer with vacuum-ultraviolet light from the lamp for vacuum-ultraviolet light irradiation, to desorb the byproducts, and a third step of exhausting the desorbed byproducts.
    Type: Application
    Filed: February 20, 2015
    Publication date: September 24, 2015
    Inventors: Kazunori Shinoda, Tsutomu Tetsuka, Kenji Maeda
  • Patent number: 9097754
    Abstract: The present invention provides a method for manufacturing a magnetoresistive element having a high selection ratio of an insulating layer to a free layer. The method for manufacturing a magnetoresistive element includes the steps of preparing (left drawing, middle drawing) a substrate on which a free layer, a fixed layer disposed under a first magnetic layer, and a barrier layer that is an insulating layer disposed between the free layer and the fixed layer are formed and processing (right drawing) the free layer by plasma etching, in which an insulating layer configuring the barrier layer contains a Ta element or a Ti element.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: August 4, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Makoto Satake, Jun Hayakawa, Tsutomu Tetsuka, Takeshi Shimada, Naohiro Yamamoto, Atsushi Yoshida
  • Publication number: 20150068681
    Abstract: A plasma processing device includes a processing chamber for generating a plasma, a vacuum window that constitutes a part of a wall of the processing chamber, induction antennas including at least two systems for generating plasma in the processing chamber, radio frequency power sources for applying the current independently to the respective induction antennas, and a controller including phase circuits for controlling the phase of the current of the radio frequency power sources of the respective systems or the current value over time, and a control unit. The controller sequentially time modulates the phase difference between currents flowing to the systems or the current value within a sample processing period to move the plasma generation position so as to make the ion incident angle to the wafer uniform in the wafer plane.
    Type: Application
    Filed: February 17, 2014
    Publication date: March 12, 2015
    Inventors: Tsutomu Tetsuka, Makoto Satake, Tadayoshi Kawaguchi
  • Patent number: 8926790
    Abstract: The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy-metal contamination caused by plasma damage of components constituting the high-frequency electrode and gas supply unit. The plasma processing apparatus comprises a processing chamber 1 for subjecting a processing substrate 4 to plasma processing, gas supply means 17, 16 and 11 for feeding gas to the processing chamber 1, and an antenna electrode 10 for supplying high-frequency radiation for discharging the gas to generate plasma, wherein the gas supply means includes a gas shower plate 11 having gas discharge holes on the surface exposed to plasma, and a portion of or a whole surface of the conductor 10 exposed to gas constituting the antenna-electrode side of the gas supply means is subjected to ceramic spraying containing no heavy metal to form a protecting film 12.
    Type: Grant
    Filed: August 23, 2006
    Date of Patent: January 6, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tsutomu Tetsuka, Toshio Masuda, Naoshi Itabashi, Masanori Kadotani, Takashi Fujii
  • Publication number: 20140116985
    Abstract: The present invention provides a method for manufacturing a magnetoresistive element having a high selection ratio of an insulating layer to a free layer. The method for manufacturing a magnetoresistive element includes the steps of preparing (left drawing, middle drawing) a substrate on which a free layer, a fixed layer disposed under a first magnetic layer, and a barrier layer that is an insulating layer disposed between the free layer and the fixed layer are formed and processing (right drawing) the free layer by plasma etching, in which an insulating layer configuring the barrier layer contains a Ta element or a Ti element.
    Type: Application
    Filed: January 24, 2013
    Publication date: May 1, 2014
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Makoto SATAKE, Jun HAYAKAWA, Tsutomu TETSUKA, Takeshi SHIMADA, Naohiro YAMAMOTO, Atsushi YOSHIDA
  • Publication number: 20130299091
    Abstract: A plasma processing apparatus includes a processing chamber, a flat-plate-like dielectric window, an induction coil, a flat electrode, a RF power source, a gas supply unit, and a sample stage on which a sample is mounted. A process gas supply plate is provided opposite the dielectric window on an inner side of the processing chamber, and a recess portion is formed in the flat electrode on a side opposite the induction coil corresponding to a gas supply position of the process gas supply plate.
    Type: Application
    Filed: January 17, 2013
    Publication date: November 14, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yusaku SAKKA, Ryoji NISHIO, Tadayoshi KAWAGUCHI, Tsutomu TETSUKA
  • Publication number: 20130200042
    Abstract: In processing a magnetic film composed for example of Fe, Co or Ni formed on a substrate and a nonvolatile metal containing the same in a vacuum reactor using a plasma generating gas for generating plasma and a gas containing C and O, a power applied to an antenna for generating plasma is time-modulated, wherein the feeding of gas containing C and O to the vacuum reactor is synchronized with the time-modulated antenna power so that the supply of gas containing C and O to the vacuum reactor is suppressed when the antenna power is high and the gas containing C and O is fed to the vacuum reactor when the antenna power is low.
    Type: Application
    Filed: March 15, 2013
    Publication date: August 8, 2013
    Inventors: Makoto SATAKE, Kenji MAEDA, Kenetsu YOKOGAWA, Tsutomu TETSUKA, Tatehito USUI, Ryoji NISHIO
  • Patent number: 8425786
    Abstract: In processing a magnetic film composed for example of Fe, Co or Ni formed on a substrate and a nonvolatile metal containing the same in a vacuum reactor using a plasma generating gas for generating plasma and a gas containing C and O, a power applied to an antenna for generating plasma is time-modulated, wherein the feeding of gas containing C and O to the vacuum reactor is synchronized with the time-modulated antenna power so that the supply of gas containing C and O to the vacuum reactor is suppressed when the antenna power is high and the gas containing C and O is fed to the vacuum reactor when the antenna power is low.
    Type: Grant
    Filed: February 5, 2010
    Date of Patent: April 23, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Makoto Satake, Kenji Maeda, Kenetsu Yokogawa, Tsutomu Tetsuka, Tatehito Usui, Ryoji Nishio
  • Publication number: 20130000847
    Abstract: There is provided a plasma processing apparatus enabling uniform plasma processing over the entire surface of a sample, without causing abnormal discharge even when the electromagnetic field strength is strong as in the case of the inductive coupling method. The plasma processing apparatus includes a process chamber, a first dielectric vacuum window, an inductive coil, a radio-frequency power supply, a gas supply unit, and a sample holder. The gas supply unit includes a second dielectric gas guide plate and a third dielectric island member. The second dielectric gas guide plate is located near below the vacuum window, and has a gas inlet port in the center. The third dielectric island member is provided in a gap between the vacuum window and the gas guide plate. The dielectric constant of the third dielectric is higher than the dielectric constant of the first and second dielectrics.
    Type: Application
    Filed: August 15, 2011
    Publication date: January 3, 2013
    Inventors: Tsutomu TETSUKA, Ryoji NISHIO
  • Patent number: 8282767
    Abstract: A plasma processing apparatus including a chamber having an inner wall with a protective film thereon and a sample stage disposed in the chamber in which plasma is generated by supplying high-frequency wave energy to processing gas to conduct plasma processing for a sample on the sample stage using the plasma. The apparatus includes a control device which determines, based on monitor values of a wafer attracting current monitor (Ip) to monitor a current supplied from a wafer attracting power source, an impedance monitor (Zp) to monitor plasma impedance viewed from a plasma generating power source, and an impedance monitor (Zb) to monitor a plasma impedance viewed from a bias power supply, presence or absence of occurrence of an associated one of abnormal discharge in inner parts, deterioration in insulation of an insulating film of a wafer attracting electrode, and abnormal injection in a gas injection plate.
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: October 9, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Naoshi Itabashi, Tsutomu Tetsuka, Seiichiro Kanno, Motohiko Yoshigai
  • Patent number: 8024831
    Abstract: A cleaning method using a cleaning apparatus having an adhesive sheet, a conductive sheet in contact with a base material of the adhesive sheet, and a pressing member for pressing the conductive sheet onto the adhesive sheet. The pressing member includes a voltage applier, and a pressing force controller which presses the adhesive sheet onto a curved surface of a portion to be cleaned of a vacuum processing apparatus from above the conductive sheet. The method includes pressing the pressing member by a pressing force controlled via the pressing force controller to press the conductive sheet and the adhesive sheet to adhere an adhesive surface of the adhesive sheet to the curved surface of the portion to be cleaned, and applying a voltage to the conductive sheet or applying a voltage having a temporally changed polarity.
    Type: Grant
    Filed: August 3, 2010
    Date of Patent: September 27, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazuyuki Ikenaga, Tsutomu Tetsuka, Muneo Furuse
  • Patent number: 8006340
    Abstract: The invention provides a cleaning apparatus for removing particles attached to the fine roughness on the surface of an insulating body coated on the metal surface of a vacuum processing apparatus.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: August 30, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kazuyuki Ikenaga, Tsutomu Tetsuka, Muneo Furuse
  • Publication number: 20110139370
    Abstract: A plasma processing apparatus including a chamber having an inner wall with a protective film thereon and a sample stage disposed in the chamber in which plasma is generated by supplying high-frequency wave energy to processing gas to conduct plasma processing for a sample on the sample stage using the plasma. The apparatus includes a control device which determines, based on monitor values of a wafer attracting current monitor (Ip) to monitor a current supplied from a wafer attracting power source, an impedance monitor (Zp) to monitor plasma impedance viewed from a plasma generating power source, and an impedance monitor (Zb) to monitor a plasma impedance viewed from a bias power supply, presence or absence of occurrence of an associated one of abnormal discharge in inner parts, deterioration in insulation of an insulating film of a wafer attracting electrode, and abnormal injection in a gas injection plate.
    Type: Application
    Filed: February 22, 2011
    Publication date: June 16, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Naoshi ITABASHI, Tsutomu Tetsuka, Seiichiro Kanno, Motohiko Yoshigai
  • Publication number: 20110100954
    Abstract: In processing a magnetic film composed for example of Fe, Co or Ni formed on a substrate and a nonvolatile metal containing the same in a vacuum reactor using a plasma generating gas for generating plasma and a gas containing C and O, a power applied to an antenna for generating plasma is time-modulated, wherein the feeding of gas containing C and O to the vacuum reactor is synchronized with the time-modulated antenna power so that the supply of gas containing C and O to the vacuum reactor is suppressed when the antenna power is high and the gas containing C and O is fed to the vacuum reactor when the antenna power is low.
    Type: Application
    Filed: February 5, 2010
    Publication date: May 5, 2011
    Inventors: Makoto SATAKE, Kenji Maeda, Kenetsu Yokogawa, Tsutomu Tetsuka, Tatehito Usui, Ryoji Nishio