Abstract: An object of the present invention is to provide a cleaning liquid for semiconductor substrates with a change in the pH of the cleaning liquid caused by dilution being suppressed.

Abstract: The present invention addresses the problem of providing a kit for a cleaning agent, which is used for the purpose of preparing a cleaning agent that maintains, even after long-term storage, adequate impurity removal performance from the surface of a semiconductor substrate that has been subjected to a CMP process. The present invention also addresses the problem of providing a method for preparing the above-described cleaning agent. A kit for a cleaning agent according to the present invention is a kit for preparing a cleaning agent which is used for cleaning of a semiconductor substrate that has been subjected to a CMP process, and which has a pH of from 7.5 to 13.0. This kit for a cleaning agent comprises a first liquid that is acidic and contains a compound represented by formula (1) and a second liquid that is alkaline and contains a basic compound; and an acidic compound is contained in at least one of the first liquid and the second liquid.

Abstract: It is an object of the present invention to provide an electrochemical device having an electrolytic solution having high current density, as well as high safety, where dissolution and deposition of magnesium progress repeatedly and stably. Furthermore, the present invention relates to an electrolytic solution for an electrochemical device, comprising (1) a supporting electrolyte comprising a magnesium salt, and (2) at least one or more kinds of the compound represented by following general formula (I) (wherein n represents an integer of 0 to 6, and n pieces of R1 and n pieces of R2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a halogenoalkyl group having 1 to 6 carbon atoms.

Abstract: The present invention relates to a cleaning agent for a semiconductor substrate having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film to be used in a post-process of a chemical mechanical polishing process, comprising (A) an organic acid represented by general formula described in the present specification, (B) amines selected from the group consisting of (B-1) diamines, (B-2) amidines, (B-3) azoles, and (B-4) pyrazines or pyrimidines, represented by general formulae described in the present specification, (C) a hydroxylamine derivative, and (D) an oxygen scavenger represented by general formula described in the present specification, and being an aqueous solution having a pH of 10 or higher; and a processing method for the surface of a semiconductor substrate, having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film, which comprises using the cleaning agent.

Abstract: The present invention relates to a cleaning agent for a semiconductor substrate having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film to be used in a post-process of a chemical mechanical polishing process, comprising (A) an organic acid represented by general formula described in the present specification, (B) amines selected from the group consisting of (B-1) diamines, (B-2) amidines, (B-3) azoles, and (B-4) pyrazines or pyrimidines, represented by general formulae described in the present specification, (C) a hydroxylamine derivative, and (D) an oxygen scavenger represented by general formula described in the present specification, and being an aqueous solution having a pH of 10 or higher; and a processing method for the surface of a semiconductor substrate, having a copper wiring film or a copper alloy wiring film, and a cobalt-containing film, which comprises using the cleaning agent.

Abstract: It is a subject of the present invention to provide a cleaning agent for a substrate having a metal wiring, and a cleaning method for a semiconductor substrate comprising that the cleaning agent is used, by which following effects (1) to (5) are obtained, in a cleaning process after chemical mechanical polishing (CMP) in a manufacturing process of a semiconductor device. (1) Residues of fine particles (polishing agents) used in the CMP process, fine particles (metal particles) derived from a polished metal, an anticorrosive, and the like, can be removed sufficiently. (2) A coating film (protective film: oxidation resistant film) on a surface of the metal wiring, containing a complex between an anticorrosive, such as benzotriazole or quinaldic acid, and a surface metal of the metal wiring, formed in the CMP process, can be removed (stripped) sufficiently. (3) An oxide film containing a metal oxide can be formed after removal (stripping) of the coating film.

Abstract: It is an object of the present invention to provide an electrochemical device having an electrolytic solution having high current density and high oxidation resistance, as well as high safety, where dissolution and deposition of magnesium progress repeatedly and stably. The present invention relates to the electrolytic solution for an electrochemical device comprising (1) the supporting electrolyte composed of a magnesium salt and (2) at least one or more kinds of the compound represented by the following general formula [2], as well as the electrochemical device comprising said electrolytic solution, a positive electrode, a negative electrode and a separator.

Abstract: The present invention provides a non-aqueous electrolytic solution including a methylenebissulfonate derivative and improving initial irreversible capacity and other characteristics of a battery such as a cycle characteristics, electric capacity, and storage characteristics; a method for producing thereof; and a battery using the electrolytic solution. The non-aqueous electrolytic solution includes: (1) a non-aqueous solvent comprising at least one selected from a cyclic carbonate ester, a straight chained carbonate ester and/or a cyclic carboxylic acid ester, (2) a lithium salt which may be dissolved in the non-aqueous solvent, as an electrolyte salt, and (3) a methylenebissulfonate derivative of formula [1]: The method includes steps of dissolving a lithium salt in a non-aqueous solvent, and then dissolving the methylenebissulfonate derivative.

Abstract: It is an object of the present invention to provide an electrochemical device having an electrolytic solution having high current density, as well as high safety, where dissolution and deposition of magnesium progress repeatedly and stably. Furthermore, the present invention relates to an electrolytic solution for an electrochemical device, comprising (1) a supporting electrolyte comprising a magnesium salt, and (2) at least one or more kinds of the compound represented by following general formula (I) (wherein n represents an integer of 0 to 6, and n pieces of R1 and n pieces of R2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a halogenoalkyl group having 1 to 6 carbon atoms.

Abstract: The present invention provides a non-aqueous electrolytic solution including a methylenebissulfonate derivative and improving initial irreversible capacity and other characteristics of a battery such as cycle characteristics, electric capacity, and storage characteristics; a method for producing thereof; and a battery using the electrolytic solution. The non-aqueous electrolytic solution includes: (1) a non-aqueous solvent comprising a cyclic carbonate ester, a straight chained carbonate ester, and/or a cyclic carboxylic acid ester, (2) a lithium salt which may be dissolved in the non-aqueous solvent, as an electrolyte salt, and (3) a methylenebissulfonate derivative of formula [I]: The method includes steps of dissolving a lithium salt in a non-aqueous solvent, and then dissolving the methylenebissulfonate derivative. The non-aqueous electrolytic solution battery includes (i) the non-aqueous electrolytic solution above, (ii) a negative electrode, (iii) a positive electrode, and (iv) a separator.

Abstract: A nonaqueous secondary cell comprising a positive electrode, a negative electrode, and a nonaqueous electrolytic solution, wherein the nonaqueous electrolytic solution contains at least a cyclic nitrogen-containing compound represented by the following general formula (1): wherein R1 is selected from a halogen atom, a lower alkyl group, a lower alkenyl group, a lower alkoxy group, a lower alkoxycarbonyl group, a lower alkylcarbonyl group and an aryl group, and R2 is selected from a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkenyl group, a lower alkoxy group, a lower alkoxycarbonyl group, a lower alkylcarbonyl group and an aryl group; or R1 and R2 are bonded together and are selected from a ring structure containing any of a methylene group, a vinylene group and a divalent linking group containing a hetero atom.

Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.

Abstract: It is an object of the present invention to provide an electrochemical device having an electrolytic solution having high current density and high oxidation resistance, as well as high safety, where dissolution and deposition of magnesium progress repeatedly and stably. The present invention relates to the electrolytic solution for an electrochemical device comprising (1) the supporting electrolyte composed of a magnesium salt and (2) at least one or more kinds of the compound represented by the following general formula [2], as well as the electrochemical device comprising said electrolytic solution, a positive electrode, a negative electrode and a separator.

Abstract: It is an object of the present invention to provide a commercially advantageous method for producing a cyclic disulfonic acid ester with high yield, the present invention discloses a method for producing a cyclic disulfonic acid ester represented by the general formula (3), which comprises reacting a silver alkanedisulfonate represented by the general formula (1) with a dihaloalkane represented by the general formula (2) in a nonpolar solvent. Wherein X1 and X2 are each independently a chlorine atom, a bromine atom or an iodine atom; and Y and Z are each independently a substituted or unsubstituted alkylene chain which may have a heteroatom in the chain.

Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.

Abstract: Object To provide a method for producing a bis-quaternary ammonium salt efficiently and a novel synthetic intermediate thereof. Solution The present invention relates to a method for producing a bis-quaternary ammonium salt represented by a general formula [3] which comprises reacting a disulfonic acid ester represented by a general formula [1] (in the formula, definitions of two R1's and T are as described in claim 1) with a tertiary amine represented by a general formula [2] (in the formula, definitions of R3 to R5 are as described in claim 1), and a disulfonic acid ester represented by a general formula [1?] (in the formula, two R16's represent independently a halogen atom or a C1-C3 fluoroalkyl group, and two m's represent independently an integer of 1 to 5).

Abstract: The present invention is directed to provide an efficient production method which is capable of not only obtaining a cyclic sulfonic acid ester (sultone) at low cost and in high yield, but also the sulfonic acid ester (sultone) stably even in a commercial scale. The present invention relates to a method for producing hydroxysultone comprising a first step where a diol having a specified structure and a thionyl halide are reacted to obtain a cyclic sulfite having a specified structure, and a second step where the cyclic sulfite is reacted with water or/and alcohol; a method for producing an unsaturated sultone having a specified structure comprising a third step where a hydroxylsultone having a specified structure is reacted with an acid halide or an acid anhydride to obtain an intermediate, subsequently the intermediate is treated with a base; as well as a cyclic sulfite having a specified structure.

Abstract: Problem: Providing a novel ionic liquid, which is low-cost, environment-friendly, and has low viscosity and melting point. Means for Solving the Problem: The present invention is the invention of the ionic liquid represented by the general formula [1]: {wherein, R1 to R3 and n pieces of R4 each independently represent hydrogen atom or alkyl group having 1 to 4 carbon atoms, R5 to R7 each independently represent alkyl group, aralkyl group, or aryl group, R8 represents alkyl group, aralkyl group, aryl group, or the one represented by the general formula [2]: (wherein T represents alkylene chain having 1 to 8 carbon atoms, n represents 1 or 2, and R1 to R7 are the same as the above-described), X represents nitrogen atom or phosphorus atom, n represents 1 or 2. When n is 1, R3 and R4 are bound and may form cyclohexene ring together with the adjacent carbon atoms. In addition, when X is nitrogen atom, R5 to R7 or R5 to R6 may form hetero ring with nitrogen atom binding thereto}.

Abstract: [PROBLEM] To provide: a novel non-aqueous electrolytic solution which uses a methylenebissulfonate derivative, reduces initial irreversible capacity of a battery, and further improves battery characteristics such as cycle characteristics, electric capacity and storage characteristics; a method for producing the non-aqueous electrolytic solution; and a battery which uses the electrolytic solution. [SOLUTION] The present invention relates to the following <1> to <3>. <1> A non-aqueous electrolytic solution comprising the following (1) to (3).

Abstract: [PROBLEM] To provide: a novel non-aqueous electrolytic solution which uses a methylenebissulfonate derivative, reduced initial irreversible capacity of a battery, and further improves battery characteristics such as cycle characteristics, electric capacity and storage characteristics; a method for producing the non-aqueous electrolytic solution; and a battery which uses the electrolytic solution. [SOLUTION] The present invention related to the following <1> to <3>. <1> A non-aqueous electrolytic solution comprising the following (1) to (3).