Patents by Inventor Tsuyoshi Fujiki

Tsuyoshi Fujiki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8163863
    Abstract: A polysilane having excellent functionalities (e.g., solubility in a solvent and reactivity) is obtained by introducing a structural unit of the following formula (1) to a polysilane through a reaction of a dihalosilane having a Si—H bond and adding a hydrosilylatable compound (e.g., a compound having a carbon-carbon unsaturated bond) to the Si—H bond, wherein R1 represents a hydrogen atom, an organic group, or a silyl group; and “n” denotes an integer of not less than 1.
    Type: Grant
    Filed: December 1, 2006
    Date of Patent: April 24, 2012
    Assignee: Osaka Gas Co., Ltd.
    Inventors: Hiroki Sakamoto, Hiroaki Murase, Tsuyoshi Fujiki, Shingo Osawa, Yoshiyuki Morita, Tetsuya Hosomi, Nobuaki Aoki
  • Patent number: 7781540
    Abstract: A resin composition, and molded articles thereof, where the resin composition simultaneously satisfies resistances, such as heat and environmental resistance, and moldability at high levels, and has excellent optical properties, such as high refractivity and low birefringence. The resin composition contains a polyester resin formed from a dicarboxylic acid component and a diol component (a) and a polycarbonate resin formed from a carbonate-forming component and a diol component (b), the diol component (a) containing a specific fluorene-containing compound and the diol component (b) containing a specific fluorene-containing compound.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: August 24, 2010
    Assignee: Osaka Gas Co., Ltd.
    Inventors: Takatsune Yanagida, Masatoshi Ando, Yoshihiko Imanaka, Masahiro Yamada, Shinichi Kawasaki, Mitsuaki Yamada, Hiroaki Murase, Tsuyoshi Fujiki, Kana Kobori
  • Patent number: 7772356
    Abstract: The present invention discloses an infrared absorption filter which enables a coloring matter having infrared absorptivity to be contained or dispersed uniformly in a high concentration and has excellent durability, and an infrared absorption panel comprising this infrared absorption filter. The infrared absorption filter comprises a polycarbonate resin which contains 20 to 100 mol % of a recurring unit having a fluorene skeleton represented by the formula (1) and 0 to 80 mol % of a recurring unit represented by the formula (2), and a coloring matter having infrared absorptivity.
    Type: Grant
    Filed: October 19, 2005
    Date of Patent: August 10, 2010
    Assignee: Osaka Gas Co., Ltd.
    Inventors: Masahiro Yamada, Tsuyoshi Fujiki, Shinichi Kawasaki, Mitsuaki Yamada, Takatsune Yanagida, Masatoshi Ando, Yoshihiko Imanaka
  • Publication number: 20090156775
    Abstract: A polysilane having excellent functionalities (e.g., solubility in a solvent and reactivity) is obtained by introducing a structural unit of the following formula (1) to a polysilane through a reaction of a dihalosilane having a Si—H bond and adding a hydrosilylatable compound (e.g., a compound having a carbon-carbon unsaturated bond) to the Si—H bond, wherein R1 represents a hydrogen atom, an organic group, or a silyl group; and “n” denotes an integer of not less than 1.
    Type: Application
    Filed: December 1, 2006
    Publication date: June 18, 2009
    Applicant: OSAKA GAS CO., LTD.
    Inventors: Hiroki Sakamoto, Hiroaki Murase, Tsuyoshi Fujiki, Shingo Osawa, Yoshiyuki Morita, Tetsuya Hosomi, Nobuaki Aoki
  • Patent number: 7358016
    Abstract: A top surface layer of an electrophotographic photosensitive element (e.g., a charge-transporting layer) is rendered to contain a cyclic polysilane represented by the following formula (1). In the formula, R1 and R2 are the same or different from each other and each represents a group such as an alkyl group, an aryl group, and “m” denotes an integer of not less than 4. The cyclic polysilane may be a copolysilane. The content of the cyclic polysilane may be about 0.01 to 10% by weight relative to the whole components of the top surface layer.
    Type: Grant
    Filed: July 18, 2003
    Date of Patent: April 15, 2008
    Assignee: Osaka Gas Co., Ltd.
    Inventors: Tsuyoshi Fujiki, Hiroki Sakamoto, Hiroaki Murase, Masashi Tanaka, Shinichi Kawasaki, Mitsuaki Yamada
  • Publication number: 20080085955
    Abstract: This invention seeks to provide a resin composition that can simultaneously satisfy resistances such as heat resistance and environmental resistance and moldability at high levels and that has excellent optical properties such as high refractivity and low birefringence and molded article thereof. The present invention is a resin composition containing a polyester resin formed from a dicarboxylic acid component and a diol component (a) and a polycarbonate resin formed from a carbonate-forming component and a diol component (b), the diol component (a) containing a specific fluorene-containing compound and the diol component (b) containing a specific fluorene-containing compound.
    Type: Application
    Filed: July 13, 2005
    Publication date: April 10, 2008
    Inventors: Takatsune Yanagida, Masatoshi Ando, Yoshihiko Imanaka, Masahiro Yamada, Shinichi Kawasaki, Mitsuaki Yamada, Hiroaki Murase, Tsuyoshi Fujiki, Kana Kobori
  • Publication number: 20070293606
    Abstract: It is an object of the present invention to provide an infrared absorption filter which enables a coloring matter having infrared absorptivity to be contained or dispersed uniformly in a high concentration and has excellent durability and an infrared absorption panel comprising this infrared absorption filter. The infrared absorption filter is composed of a polycarbonate resin which contains 20 to 100 mol % of a recurring unit having a fluorene skeleton represented by the formula (1) and 0 to 80 mol % of a recurring unit represented by the formula (2) and a coloring matter having infrared absorptivity.
    Type: Application
    Filed: October 19, 2005
    Publication date: December 20, 2007
    Inventors: Masahiro Yamada, Tsuyoshi Fujiki, Shinichi Kawasaki, Mitsuaki Yamada, Takatsune Yanagida, Masatoshi Ando, Yoshihiko Imanaka
  • Publication number: 20050238975
    Abstract: A top surface layer of an electrophotographic photosensitive element (e.g., a charge-transporting layer) is rendered to contain a cyclic polysilane represented by the following formula (1). In the formula, R1 and R2 are the same or different from each other and each represents a group such as an alkyl group, an aryl group, and “m” denotes an integer of not less than 4. The cyclic polysilane may be a copolysilane. The content of the cyclic polysilane may be about 0.01 to 10% by weight relative to the whole components of the top surface layer.
    Type: Application
    Filed: July 18, 2003
    Publication date: October 27, 2005
    Applicant: OSAKA GAS CO., LTD.,
    Inventors: Tsuyoshi Fujiki, Hiroki Sakamoto, Hiroaki Murase, Masashi Tanaka, Shinichi Kawasaki, Mitsuaki Yamada