Patents by Inventor Tsuyoshi Furukawa
Tsuyoshi Furukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11965048Abstract: An aspect according to the present invention provides an acrylic resin including a first structural unit represented by formula (1) and a second structural unit represented by formula (2): [in the formula (1), R1 represents a hydrogen atom or a methyl group, and R2 represents an alkyl group having 12-30 carbon atoms] [in the formula (2), R3 and R5 each independently represent a hydrogen atom or a methyl group, and R4 represents a divalent organic group].Type: GrantFiled: June 27, 2019Date of Patent: April 23, 2024Assignee: RESONAC CORPORATIONInventors: Naoki Furukawa, Nozomi Matsubara, Tsuyoshi Morimoto, Akira Nagai
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Publication number: 20230176904Abstract: A control device includes: an identification unit identifying a workflow waiting to execute an aggregation object process in aggregation rule data, an aggregation unit associating an identifier of the identified workflow with an aggregation identifier associated with a process that the identified workflow is waiting to execute and an aggregation condition identified from an attribute of the identified workflow in the aggregated data; and an execution unit outputting an instruction to aggregate and execute a process that the workflow associated with the aggregation identifier in the aggregated data is waiting to execute.Type: ApplicationFiled: May 11, 2020Publication date: June 8, 2023Inventors: Yuichi SUTO, Aiko OI, Ryosuke SATO, Kosuke SAKATA, Motomu NAKAJIMA, Yoshikazu HAGIWARA, Tsuyoshi FURUKAWA
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Patent number: 11429024Abstract: The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar1; and RG represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.Type: GrantFiled: June 5, 2020Date of Patent: August 30, 2022Assignee: JSR CORPORATIONInventors: Ryuichi Nemoto, Tsuyoshi Furukawa
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Publication number: 20210318613Abstract: A radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and a compound represented by formula (2). The polymer includes a first structural unit including a phenolic hydroxyl group, a second structural unit including a group represented by formula (1), and a third structural unit including an acid-labile group. In the formula (1), R1, R2, R3, R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms, wherein at least one of R1, R2, R3, R4, R5, and R6 represents a fluorine atom or a fluorinated hydrocarbon group; RA represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to a part other than the group represented by the formula (1).Type: ApplicationFiled: June 10, 2020Publication date: October 14, 2021Applicant: JSR CORPORATIONInventors: Katsuaki NISHIKORI, Ken MARUYAMA, Kazuki KASAHARA, Tsuyoshi FURUKAWA, Natsuko KINOSHITA
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Publication number: 20200393761Abstract: A radiation-sensitive resin composition includes a polymer, a radiation-sensitive acid generator, and a compound represented by formula (2). The polymer includes a first structural unit including a phenolic hydroxyl group, a second structural unit including a group represented by formula (1), and a third structural unit including an acid-labile group. In the formula (1), R1, R2, R3, R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or a monovalent fluorinated hydrocarbon group having 1 to 10 carbon atoms, wherein at least one of R1, R2, R3, R4, R5, and R6 represents a fluorine atom or a fluorinated hydrocarbon group; RA represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and * denotes a binding site to a part other than the group represented by the formula (1).Type: ApplicationFiled: June 10, 2020Publication date: December 17, 2020Applicant: JSR CORPORATIONInventors: Katsuaki NISHIKORI, Ken MARUYAMA, Kazuki KASAHARA, Tsuyoshi FURUKAWA, Natsuko KINOSHITA
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Publication number: 20200393755Abstract: The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar1; and RG represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.Type: ApplicationFiled: June 5, 2020Publication date: December 17, 2020Applicant: JSR CORPORATIONInventors: Ryuichi NEMOTO, Tsuyoshi FURUKAWA
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Publication number: 20180118859Abstract: Provided is a protein aggregation inhibitor capable of inhibiting aggregation of a protein even when the protein is heated, and further, capable of inhibiting a decrease in the protein activity even when the protein is heated, which characteristically contains a sulfobetaine polymer obtained by polymerizing monomer components containing sulfobetaine monomer represented by the formula (I): wherein R1 is a hydrogen atom or a methyl group, R2 is an alkylene group having a carbon number of 1-4, R3 is an alkyl group having a carbon number of 1-4, R4 is an alkylene group having a carbon number of 1-4, and X is an —NH— group or an —O— group.Type: ApplicationFiled: May 10, 2016Publication date: May 3, 2018Applicants: OSAKA ORGANIC CHEMICAL INDUSTRY LTD., JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Kazuaki MATSUMURA, Rajan ROBIN, Tsuyoshi FURUKAWA, Kentaro MAEHARA, Yoshiyuki SARUWATARI
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Patent number: 9354523Abstract: A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. R1 represents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; R2 represents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; M+ represents a monovalent cation; and R3 represents a monovalent organic group having 1 to 30 carbon atoms.Type: GrantFiled: July 9, 2015Date of Patent: May 31, 2016Assignee: JSR CorporationInventors: Yuuko Kiridoshi, Hiroyuki Nii, Tsuyoshi Furukawa, Takeo Shioya
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Publication number: 20160011513Abstract: A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. R1 represents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; R2 represents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; M+ represents a monovalent cation; and R3 represents a monovalent organic group having 1 to 30 carbon atoms.Type: ApplicationFiled: July 9, 2015Publication date: January 14, 2016Applicant: JSR CorporationInventors: Yuuko Kiridoshi, Hiroyuki Nii, Tsuyoshi Furukawa, Takeo Shioya
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Patent number: 9150962Abstract: Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium.Type: GrantFiled: January 21, 2014Date of Patent: October 6, 2015Assignee: JSR CORPORATIONInventors: Tatsuya Sakai, Hideki Nishimura, Masahiro Yamamoto, Hisashi Nakagawa, Ryuuichi Saitou, Hideyuki Aoki, Tsuyoshi Furukawa
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Publication number: 20140134331Abstract: Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium.Type: ApplicationFiled: January 21, 2014Publication date: May 15, 2014Applicant: JSR CORPORATIONInventors: Tatsuya SAKAI, Hideki NISHIMURA, Masahiro YAMAMOTO, Hisashi NAKAGAWA, Ryuuichi SAITOU, Hideyuki AOKI, Tsuyoshi FURUKAWA
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Publication number: 20130177277Abstract: An object is to provide an optical waveguide that has low optical coupling loss when optically coupled with an optical element and that is capable of performing high-quality optical communication, a method for efficiently producing the optical waveguide, an optical waveguide module that is provided with the optical waveguide and is capable of performing high-quality optical communication, a method for efficiently producing the optical waveguide module, and an electronic apparatus.Type: ApplicationFiled: September 27, 2011Publication date: July 11, 2013Applicant: SUMITOMO BAKELITE CO. LTD.Inventors: Makoto Fujiwara, Tsuyoshi Furukawa, Shinsuke Terada, Motoya Kaneta
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Patent number: 8318582Abstract: A method of forming a trench isolation, comprising the steps of: applying a silicone resin composition comprising a silicone resin which is represented by the following rational formula (1) and is solid at 120° C.: (H2SiO)n(HSiO1.5)m(SiO2)k??(1) (wherein n, m and k are each a number, with the proviso that when n+m+k=1, n is 0 to 0.8, m is 0 to 1.0, and k is 0 to 0.2) and an organic solvent to a substrate having trenches in such a manner that the trenches of the substrate are filled with the silicone resin composition so as to form a coating film; and carrying out the step of bringing the coating film into contact with at least one selected from the group consisting of water, an alcohol and hydrogen peroxide and the step of subjecting the coating film to at least one treatment selected from the group consisting of a heat treatment and an optical treatment.Type: GrantFiled: January 30, 2009Date of Patent: November 27, 2012Assignee: JSR CorporationInventors: Seitarou Hattori, Manabu Sekiguchi, Terukazu Kokubo, Kentaro Tamaki, Tsuyoshi Furukawa, Taichi Matsumoto, Chiaki Miyamoto
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Patent number: 8017700Abstract: A polycarbosilane has a main chain in which silicon atoms and carbon atoms are alternately repeated, and includes a structural unit shown by the following general formula (1), a structural unit shown by the following general formula (2), a structural unit shown by the following general formula (3), and a structural unit shown by the following general formula (4).Type: GrantFiled: October 24, 2006Date of Patent: September 13, 2011Assignee: JSR CorporationInventors: Hisashi Nakagawa, Masahiro Akiyama, Tsuyoshi Furukawa, Naohisa Tokushige
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Publication number: 20110053340Abstract: A method of forming a trench isolation, comprising the steps of: applying a silicone resin composition comprising a silicone resin which is represented by the following rational formula (1) and is solid at 120° C.: (H2SiO)n(HSiO1.5)m(SiO2)k??(1) (wherein n, m and k are each a number, with the proviso that when n+m+k=1, n is 0 to 0.8, m is 0 to 1.0, and k is 0 to 0.2) and an organic solvent to a substrate having trenches in such a manner that the trenches of the substrate are filled with the silicone resin composition so as to form a coating film; and carrying out the step of bringing the coating film into contact with at least one selected from the group consisting of water, an alcohol and hydrogen peroxide and the step of subjecting the coating film to at least one treatment selected from the group consisting of a heat treatment and an optical treatment.Type: ApplicationFiled: January 30, 2009Publication date: March 3, 2011Applicant: JSR CORPORATIONInventors: Seitarou Hattori, Manabu Sekiguchi, Terukazu Kokubo, Kentaro Tamaki, Tsuyoshi Furukawa, Taichi Matsumoto, Chiaki Miyamoto
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Publication number: 20090281237Abstract: A polycarbosilane has a main chain in which silicon atoms and carbon atoms are alternately repeated, and includes a structural unit shown by the following general formula (1), a structural unit shown by the following general formula (2), a structural unit shown by the following general formula (3), and a structural unit shown by the following general formula (4).Type: ApplicationFiled: October 24, 2006Publication date: November 12, 2009Applicant: JSR CorporationInventors: Hisashi Nakagawa, Masahiro Akiyama, Tsuyoshi Furukawa, Naohisa Tokushige
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Publication number: 20080249227Abstract: A resin composition comprising 10 to 99 mass % of a biodegradable aliphatic polyester resin (X), and 90 to 1 mass % of a polyolefin resin (Y). The resin composition preferably has a total light transmittance of not higher than 60% as measured with respect to a 3-mm thick test piece in conformity with JIS K7105, or the polyolefin resin (Y) preferably forms a continuous phase in the resin composition.Type: ApplicationFiled: October 7, 2004Publication date: October 9, 2008Inventors: Kazue Ueda, Tatsuya Matsumoto, Takuma Yano, Makoto Nakai, Tsuyoshi Furukawa
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Publication number: 20080167432Abstract: The invention aims to provide a curable liquid resin composition which produces a cured product having excellent surface slip characteristics and printability and has excellent liquid resin stability. This problem is solved by providing a curable liquid resin composition, comprising a silicone including an alkyl-modified siloxane unit and a polyether-modified siloxane unit.Type: ApplicationFiled: March 15, 2005Publication date: July 10, 2008Applicants: DSMIP ASSETS B.V., JSR CORPORATIONInventors: Hiroki Ohara, Tsuyoshi Furukawa, Takeo Shigemoto, Zen Komiya
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Patent number: 6195236Abstract: A magnetic head assembly including a carriage arm and a spring arm having at least one magnetic head attached thereto. The spring aim is provided with a cylindrical member including a thin plate member having a trapezoidal cross-section provided at one end thereof. The structure of the spring arm enables the spring arm to be removably attached to a carriage arm of the magnetic head assembly.Type: GrantFiled: August 26, 1997Date of Patent: February 27, 2001Assignee: Fujitsu LimitedInventors: Shinji Hiraoka, Hisato Arai, Yasuhiro Hamada, Tsuyoshi Furukawa
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Patent number: 5859746Abstract: A magnetic disk drive having one or more magnetic disks, one or more read/write heads each recording or reproducing information for a corresponding one of the magnetic disks, a servo head reading control information from a predetermined one of the magnetic disks, and an actuator supporting the one or more read/write heads and the servo head includes first leads extending from the one or more read/write heads along one side of the actuator, and second leads extending from the servo head along the other side of the actuator so that the second leads can be distanced in space from the first leads.Type: GrantFiled: August 30, 1996Date of Patent: January 12, 1999Assignee: Fujitsu LimitedInventors: Katsuaki Ishida, Mitsuhisa Sekino, Yoshiaki Nagasawa, Tomoo Sukagawa, Masaharu Sugimoto, Tsuyoshi Furukawa, Masaki Jinbo, Tsuneyori Ino, Hisashi Kaneko, Shinichi Fukuzawa