Patents by Inventor Tsuyoshi Ota

Tsuyoshi Ota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9362591
    Abstract: A positive electrode mixture including a positive electrode active material represented by the following formula (1); and a solid electrolyte that comprises Li and S: aLi2MnO3bLiNi1-yM1yO2-cLiM2vM3wM4xO2??(1) wherein M1 is one or more elements selected from Co, Mn, Al, Fe, Cu, V, Zn and Cr; M2, M3 and M4 are independently one or more elements selected from Ni, Co, Mn, Al, Fe, Cu, V, Zn and Cr; M2, M3 and M4 are elements different from each other; a, b and c satisfy a+b+c=1, 0<a<1, 0<b<1 and 0<c<1; y satisfies 0?y?1; and v, w and x satisfy v+w+x=1, and satisfy 0?v?1, 0?w?1 and 0?x?1.
    Type: Grant
    Filed: July 25, 2013
    Date of Patent: June 7, 2016
    Assignee: SANTOKU CORPORATION
    Inventors: Tadatoshi Murota, Masatoshi Kusatsu, Yoshikatsu Seino, Masakatsu Kimura, Tsuyoshi Ota
  • Publication number: 20160149424
    Abstract: A cell protection system includes a charge control MOSFET 21, a charge current detection MOSFET 23, a discharge control MOSFET 20, a discharge current detection MOSFET 22, a charge current detection resistance 19, a discharge current detection resistance 16 and a control circuit. The MOSFET 23 has a drain and a gate common with the MOSFET 21. The MOSFET 20 has a drain common with the MOSFET 21. The MOSFET 22 has a drain and a gate common with the MOSFET 20. The resistances 19 and 16 are provided in correspondence to the MOSFETs 23 and 22, respectively. The control circuit generates a gate control signal for the MOSFETs 21 and 23 by using the resistance 19 and generates a gate control signal for the MOSFETs 20 and 22 by using the resistance 16.
    Type: Application
    Filed: January 29, 2016
    Publication date: May 26, 2016
    Applicant: Renesas Electronics Corporation
    Inventors: Fumio TONOMURA, Hideo ISHII, Tsuyoshi OTA
  • Patent number: 9270128
    Abstract: A cell protection system includes a charge control MOSFET, a charge current detection MOSFET, a discharge control MOSFET, a discharge current detection MOSFET, a charge current detection resistance, a discharge current detection resistance and a control circuit. The charge current detection MOSFET has a drain and a gate common with the charge control MOSFET. The discharge control MOSFET has a drain common with the charge control MOSFET. The discharge current detection MOSFET has a drain and a gate common with the discharge control MOSFET. The resistancesare provided in correspondence to the charge and discharge current detection MOSFETs. The control circuit generates a gate control signal for the charge control and current detection MOSFETs by using one of the resistances and generates a gate control signal for the discharge control and current detection MOSFETs 20 by using another one of the resistances.
    Type: Grant
    Filed: November 4, 2013
    Date of Patent: February 23, 2016
    Assignee: Renesas Electronics Corporation
    Inventors: Fumio Tonomura, Hideo Ishii, Tsuyoshi Ota
  • Publication number: 20150372153
    Abstract: A semiconductor device includes a first electrode, a second electrode, a first semiconductor region that is formed between the first electrode and the second electrode and is in contact with the first electrode, a second semiconductor region that is formed between the first semiconductor region and the second electrode, a contact region that is formed between the second semiconductor region and the second electrode and is in contact with the second semiconductor region and the second electrode, a plurality of third semiconductor regions that are formed between the second electrode and the first semiconductor region and are in contact with the second electrode, and a wiring that is in contact with the second electrode, a portion of the wiring bonded to the second electrode being positioned above the third semiconductor region and not positioned above the contact region.
    Type: Application
    Filed: September 2, 2014
    Publication date: December 24, 2015
    Inventors: Yoichi HORI, Takao NODA, Tsuyoshi OTA
  • Publication number: 20150287840
    Abstract: A semiconductor device includes first and second electrodes. First semiconductor regions of a first conductivity type are positioned between the first electrode and the second electrode and contact the first electrode. These semiconductor regions are arranged along a first direction. A second semiconductor region of the first conductivity type also contacts the first electrode and is disposed around the plurality of first semiconductor regions. The second semiconductor region has a dopant concentration that is higher than the first semiconductor regions. A semiconductor layer of a second conductivity type has portions that are between the first semiconductor regions and the second semiconductor region. These portions are in Schottky contact with the first electrode.
    Type: Application
    Filed: June 18, 2015
    Publication date: October 8, 2015
    Inventors: Tsuyoshi OTA, Yoichi HORI, Takao NODA
  • Publication number: 20150221978
    Abstract: A positive electrode mixture including a positive electrode active material represented by the following formula (1); and a solid electrolyte that comprises Li and S: aLi2MnO3bLiNi1-yM1yO2-cLiM2vM3wM4xO2 ??(1) wherein M1 is one or more elements selected from Co, Mn, Al, Fe, Cu, V, Zn and Cr; M2, M3 and M4 are independently one or more elements selected from Ni, Co, Mn, Al, Fe, Cu, V, Zn and Cr; M2, M3 and M4 are elements different from each other; a, b and c satisfy a+b+c=1, 0<a<1, 0<b<1 and 0<c<1; y satisfies 0?y?1; and v, w and x satisfy v+w+x=1, and satisfy 0?v?1, 0?w?1 and 0?x?1.
    Type: Application
    Filed: July 25, 2013
    Publication date: August 6, 2015
    Inventors: Tadatoshi Murota, Masatoshi Kusatsu, Yoshikatsu Seino, Masakatsu Kimura, Tsuyoshi Ota
  • Publication number: 20150214575
    Abstract: Glass includes an aggregate of solid electrolyte particles including Li, P, and S, wherein when a Raman spectrum of the glass is repeatedly measured and a peak at 330 to 450 cm?1 in each Raman spectrum is separated to waveforms of individual components, a standard deviation of a waveform area ratio of each component is less than 4.0.
    Type: Application
    Filed: April 7, 2015
    Publication date: July 30, 2015
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Ryo ABURATANI, Minoru SENGA, Tsuyoshi OTA, Masaru NAKAGAWA
  • Publication number: 20150214213
    Abstract: A first MOSFET is formed in a first region of a chip, and a second MOSFET is formed in a second region thereof. A first source terminal and a first gate terminal are formed in the first region. In the second region, a second source terminal and a second gate terminal are arranged so as to be aligned substantially parallel to a direction in which the first source terminal and the first gate terminal are aligned. A temperature detection diode is arranged between the first source terminal and the second source terminal. A first terminal and a second terminal of the temperature detection diode are aligned in a first direction substantially parallel to a direction in which the first source terminal and the first gate terminal are aligned or in a second direction substantially perpendicular thereto.
    Type: Application
    Filed: April 8, 2015
    Publication date: July 30, 2015
    Applicant: RENESAS ELECTRONICS CORPORATION
    Inventors: Fumio TONOMURA, Hideo ISHII, Tsuyoshi OTA
  • Patent number: 9051201
    Abstract: Glass includes an aggregate of solid electrolyte particles including Li, P, and S, wherein when a Raman spectrum of the glass is repeatedly measured and a peak at 330 to 450 cm?1 in each Raman spectrum is separated to waveforms of individual components, a standard deviation of a waveform area ratio of each component is less than 4.0.
    Type: Grant
    Filed: April 7, 2010
    Date of Patent: June 9, 2015
    Assignee: IDEMITSU KOSAN CO., LTD.
    Inventors: Ryo Aburatani, Minoru Senga, Tsuyoshi Ota, Masaru Nakagawa
  • Patent number: 9024412
    Abstract: A first MOSFET is formed in a first region of a chip, and a second MOSFET is formed in a second region thereof. A first source terminal and a first gate terminal are formed in the first region. In the second region, a second source terminal and a second gate terminal are arranged so as to be aligned substantially parallel to a direction in which the first source terminal and the first gate terminal are aligned. A temperature detection diode is arranged between the first source terminal and the second source terminal. A first terminal and a second terminal of the temperature detection diode are aligned in a first direction substantially parallel to a direction in which the first source terminal and the first gate terminal are aligned or in a second direction substantially perpendicular thereto.
    Type: Grant
    Filed: July 29, 2013
    Date of Patent: May 5, 2015
    Assignee: Renesas Electronics Corporation
    Inventors: Fumio Tonomura, Hideo Ishii, Tsuyoshi Ota
  • Publication number: 20150035111
    Abstract: A semiconductor device includes first and second electrodes. First semiconductor regions of a first conductivity type are positioned between the first electrode and the second electrode and contact the first electrode. These semiconductor regions are arranged along a first direction. A second semiconductor region of the first conductivity type also contacts the first electrode and is disposed around the plurality of first semiconductor regions. The second semiconductor region has a dopant concentration that is higher than the first semiconductor regions. A semiconductor layer of a second conductivity type has portions that are between the first semiconductor regions and the second semiconductor region. These portions are in Schottky contact with the first electrode.
    Type: Application
    Filed: February 21, 2014
    Publication date: February 5, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Tsuyoshi OTA, Yoichi HORI, Takao NODA
  • Patent number: 8901894
    Abstract: A battery management method and apparatus. In one embodiment of the method, a source current is divided into Ic and Icr. Ic is transmitted to and charges a battery. A first voltage is generated that is related to Icr. The first voltage is converted into a first digital signal. A processing unit receives and processes the first digital signal in accordance with instructions stored in a memory. The transmission of Ic to the battery is interrupted in response to the processing unit processing the first digital signal. Current provided by the battery is divided into Idc and Idcr. Idc is transmitted to a device. A second voltage is generated that is related to Idcr. The second voltage is converted into a second digital signal. The processing unit receives and processes the second digital signal in accordance with instructions stored in the memory. The transmission of Idc to the battery is interrupted in response to the processing unit processing the second digital signal.
    Type: Grant
    Filed: April 18, 2011
    Date of Patent: December 2, 2014
    Assignee: Renesas Electronics America Inc.
    Inventors: Tetsuo Sato, Tsutomu Kawano, Koji Kashimoto, Takao Hidaka, Tsuyoshi Ota, Ryoji Kato
  • Publication number: 20140302382
    Abstract: A solid electrolyte including an alkali metal element, phosphorous, sulfur and halogen as constituent components.
    Type: Application
    Filed: November 2, 2012
    Publication date: October 9, 2014
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Takayoshi Kambara, Tadanori Junke, Ryo Aburatani, Hiroyuki Higuchi, Masaru Nakagawa, Tsuyoshi Ota, Yoshikatsu Seino
  • Publication number: 20140125289
    Abstract: A cell protection system includes a charge control MOSFET 21, a charge current detection MOSFET 23, a discharge control MOSFET 20, a discharge current detection MOSFET 22, a charge current detection resistance 19, a discharge current detection resistance 16 and a control circuit. The MOSFET 23 has a drain and a gate common with the MOSFET 21. The MOSFET 20 has a drain common with the MOSFET 21. The MOSFET 22 has a drain and a gate common with the MOSFET 20. The resistances 19 and 16 are provided in correspondence to the MOSFETs 23 and 22, respectively. The control circuit generates a gate control signal for the MOSFETs 21 and 23 by using the resistance 19 and generates a gate control signal for the MOSFETs 20 and 22 by using the resistance 16.
    Type: Application
    Filed: November 4, 2013
    Publication date: May 8, 2014
    Applicant: Renesas Electronics Corporation
    Inventors: Fumio TONOMURA, Hideo ISHII, Tsuyoshi OTA
  • Publication number: 20140070319
    Abstract: A first MOSFET is formed in a first region of a chip, and a second MOSFET is formed in a second region thereof. A first source terminal and a first gate terminal are formed in the first region. In the second region, a second source terminal and a second gate terminal are arranged so as to be aligned substantially parallel to a direction in which the first source terminal and the first gate terminal are aligned. A temperature detection diode is arranged between the first source terminal and the second source terminal. A first terminal and a second terminal of the temperature detection diode are aligned in a first direction substantially parallel to a direction in which the first source terminal and the first gate terminal are aligned or in a second direction substantially perpendicular thereto.
    Type: Application
    Filed: July 29, 2013
    Publication date: March 13, 2014
    Applicant: Renesas Electronics Corporation
    Inventors: Fumio TONOMURA, Hideo ISHII, Tsuyoshi OTA
  • Patent number: 8648160
    Abstract: The present invention provides an optical semiconductor sealing material comprising a radically polymerized polymer of a methacrylate ester having an alicyclic hydrocarbon group containing 7 or more carbon atoms, e.g. an adamantyl group, a norbornyl group, or a dicyclopentanyl group; and an optical semiconductor sealing material comprising a radically polymerized polymer of 50 to 97 mass % of the methacrylate ester and 3 to 50 mass % of acrylate ester having a hydroxyl group. The optical semiconductor sealing material of the present invention is highly transparent and stable to UV light and thus does not undergo yellowing. In addition, the material exhibits excellent compatibility between heat resistance and refractive index, does not undergo deformation or cracking during heating processes such as reflow soldering, and shows high processability.
    Type: Grant
    Filed: August 16, 2012
    Date of Patent: February 11, 2014
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Tomoaki Takebe, Tsuyoshi Ota, Yutaka Obata, Hiroyuki Higuchi
  • Publication number: 20140035030
    Abstract: According to one embodiment, in a semiconductor device, a semiconductor laminated body includes a first semiconductor region of a first conductivity type and a second semiconductor region of the first conductivity type provided on the first semiconductor region and having a higher concentration of impurities than that of the first semiconductor region. A third semiconductor region includes a side surface and a lower end, the side surface and the lower end are surrounded by the semiconductor laminated body. A fourth semiconductor region of a second conductivity type is provided between the semiconductor laminated body and the third semiconductor region. A fifth semiconductor region of the first conductivity type is in contact with an outside surface of the semiconductor laminated body opposite to an inside surface of the semiconductor laminated body, the inside surface is in contact with the fourth semiconductor region.
    Type: Application
    Filed: February 28, 2013
    Publication date: February 6, 2014
    Inventors: Masaaki OGAWA, Toshifumi NISHIGUCHI, Tsuyoshi OTA
  • Patent number: 8638067
    Abstract: In one embodiment of the cold end switch battery management control method, a battery generates an output voltage at a positive terminal thereof. A first control voltage is also generated by an integrated circuit. A gate of a field effect transistor (FET) receives the first control voltage, wherein the FET comprises a drain and a source with the source coupled to a negative terminal of the battery. The FET transmits current towards the battery in response to the gate receiving the first control voltage, wherein the first control voltage is greater than the output voltage, and wherein the first control voltage is less than a breakdown voltage of the integrated circuit.
    Type: Grant
    Filed: September 8, 2011
    Date of Patent: January 28, 2014
    Assignee: Renesas Electronics America Inc.
    Inventors: Tetsuo Sato, Tsutomu Kawano, Koji Kashimoto, Takao Hidaka, Tsuyoshi Ota, Ryoji Kato
  • Publication number: 20130295464
    Abstract: A composite material including a conducting material and an alkali metal sulfide formed integrally on the surface of the conducting material.
    Type: Application
    Filed: January 25, 2012
    Publication date: November 7, 2013
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Kazuaki Yanagi, Minoru Senga, Ryo Aburatani, Tsuyoshi Ota
  • Publication number: 20130248998
    Abstract: According to one embodiment, a semiconductor device includes, a drain, source, base and drift regions, a gate electrode, a gate insulating film, a first semiconductor region, a drain electrode, and a source electrode. The drain region has a first portion, and a second portion having a surface extending in a first direction which is vertical to a main surface of the first portion. The source region extends in a second direction which is parallel to the second portion, and is provided to be spaced from the drain region. The gate electrode extends in the first direction and a third direction which is vertical to the first direction and the second direction, and passes through the base region in the third direction. The first semiconductor region is provided between the gate insulating film and the drain region, and has a lower impurity concentration than the drift region.
    Type: Application
    Filed: September 14, 2012
    Publication date: September 26, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Shinichiro Misu, Tsuyoshi Ota, Tatsuya Nishiwaki, Takeshi Uchihara, Yusuke Kawaguchi