Abstract: A method and system for security assessment include a simulator configured to simulate a warping-based backdoor attack and an evaluation module configured to evaluate security and output a warning about a backdoor risk. The simulator, which comprises a warping unit and a backdoor model, is configured to generate a warping field, the warping unit is configured to receive the clean image and the warping field as inputs and output the warped backdoor image and the simulator is configured to train the backdoor model using the warped backdoor image.

Abstract: A cluster tool for fabricating substrates includes a factory interface; a first processing mainframe coupled to the factory interface, including: a processing chamber monolithic structure including four processing chambers in the same housing; four load locks coupled to the processing chamber monolithic structure, each load lock including a heater assembly configured to increase the temperature of a substrate disposed in the load lock; and a swapper assembly disposed between the four load locks and the processing chamber monolithic structure, wherein the swapper assembly includes four swappers, each swapper configured to swap substrates between one processing chamber and one load lock along a linear trajectory.

Abstract: Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a bottom plate coupled with a bottom surface of the chamber body. The chambers may include a substrate support assembly disposed within the chamber body. The substrate support assembly may include a support plate and a support stem coupled with the support plate. The chambers may include a mounting bracket that couples the support stem with a lower surface of the bottom plate. The chambers may include a plurality of tilt actuators. Each of the tilt actuators may couple the mounting bracket with the lower surface of the bottom plate. Each of the tilt actuators may be operable to adjust a vertical distance between the lower surface of the bottom plate and the mounting bracket at a mounting site of the respective tilt actuator to adjust a planarity of the support plate relative to the bottom plate.

Abstract: The system described herein is a Global Personal Health Records (PHR) system that supports: 1) retrieving and storing data offline in HL7 FHIR local storage and online in HL7 FHIR server for the entire household, each member having their own records; 2) retrieving and storing data from user inputs (handwriting or voice), from hospital systems of records (EHR, or EMR and HIS/CIS), from personal health/medical devices (Apple HealthKit, Blood Pressure Monitor, Continuous Glucose Monitor, etc.) via PHR Device Hub (OneHub), and from insurance reimbursement and authorization systems; 3) data mining for descriptive analytics like real-time patient monitoring (RPM), for predictive analytics like drug interaction warnings, or for prescriptive analytics such as exam or lab recommendations; and 4) secured data sharing using a Blockchain protected system.

Abstract: A cluster tool includes: a factory interface including a first robot with an end effector; a first processing mainframe coupled to the factory interface, including: a first processing chamber; a first load lock including a first opening facing the factory interface configured to receive the end effector of the first robot, the first load lock further including a first slit valve configured to selectively open and close the first opening; at least one first LCF sensor disposed between the factory interface and the first slit valve; and a swapper assembly disposed between the first load lock and the first processing chamber, wherein the swapper assembly includes a first swapper configured to swap substrates between the first processing chamber and the first load lock along a first trajectory.

Abstract: Apparatus comprising: a sleeve adapted to be slid over the exterior of an endoscope; a proximal balloon secured to the sleeve; an inflation/deflation tube carried by the sleeve and in fluid communication with the interior of the proximal balloon; a push tube slidably mounted to the sleeve; and a distal balloon secured to the distal end of the push tube, the interior of the distal balloon being in fluid communication with the push tube, wherein the distal balloon is capable of assuming a deflated condition and an inflated condition, and further wherein when the distal balloon is in its deflated condition, an axial opening extends therethrough, the axial opening being sized to receive the endoscope therein, and when the distal balloon is in its inflated condition, the axial opening is closed down.

Abstract: The present disclosure generally relates to an apparatus for improving azimuthal uniformity of a pressure profile of a processing gas. In one example, a processing chamber includes a lid, sidewalls, and a substrate support defining a processing volume. A bottom bowl, a chamber base, and a wall define a purge volume. The purge volume is disposed beneath the processing volume. The bottom bowl includes a first surface having a first equalizer hole. A passage couples the processing volume to the purge volume via the first equalizer hole and an inlet. The passage is positioned above the first equalizer hole. The chamber base has a purge port coupleable to a purge gas line for supplying a purge gas to the purge volume. A baffle is disposed in the purge volume at a height above the purge port, and is configured to deflect a trajectory of the purge gas.

Abstract: The present invention relates to an organic waste treatment apparatus consisting of a garbage receiving unit, a probing door, a garbage compactor unit, a crushing unit fixed to the upper part of the structure frame, a mixing unit positioned underneath the crushing unit, a motor that drives all movements of the apparatus using belt drive and gear drive, and a control panel controlling the functions of this device.

Abstract: The present disclosure relates to a cleaning assemblies, components thereof, and methods associated therewith for substrate processing chambers. In one example, a cleaning assembly for a substrate processing chamber includes a distribution ring. The distribution ring comprises a body with an inlet and an outlet. The outlet is fluidly coupled to an internal volume of the substrate processing chamber via a sidewall of the substrate processing chamber. The cleaning assembly includes a cleaning conduit configured to fluidly couple a gas manifold to the distribution ring for diverting a first portion of cleaning fluid from the gas manifold to the distribution ring.

Abstract: A first electronic device of a local group of connected electronic devices receives a first voice command including a request for a first operation assigns a first target device from among a local group of connected electronic devices as an in-focus device for performing the first operation, causes the first operation to be performed by the first target device via operation of a server-implemented common network service, receives a second voice command including a request for a second operation and based on a determination that the second voice command does not include an explicit designation of a second target device and a determination that the second operation can be performed by the first target device, assigning the first target device.

Abstract: Embodiments described herein generally relate to apparatuses for processing a substrate. In one or more embodiments, a heater support kit includes a heater assembly contains a heater plate having an upper surface and a lower surface, a chuck ring disposed on at least a portion of the upper surface of the heater plate, a heater arm assembly contains a heater arm and supporting the heater assembly, and a heater support plate disposed between the heater plate and the heater arm and in contact with at least a portion of the lower surface of the heater plate.

Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.

Abstract: In one embodiment, at least a processing chamber includes a perforated lid, a gas blocker disposed on the perforated lid, and a substrate support disposed below the perforated lid. The gas blocker includes a gas manifold, a central gas channel formed in the gas manifold, a first gas distribution plate comprising an inner and outer trenches surrounding the central gas channel, a first and second gas channels formed in the gas manifold, the first gas channel is in fluid communication with a first gas source and the inner trench, and the second gas channel is in fluid communication with the first gas source and the outer trench, a second gas distribution plate, a third gas distribution plate disposed below the second gas distribution plate, and a plurality of pass-through channels disposed between the second gas distribution plate and the third gas distribution plate.

Abstract: Exemplary methods of treating a chamber may include delivering a cleaning precursor to a remote plasma unit. The methods may include forming a plasma of the cleaning precursor. The methods may include delivering plasma effluents of the cleaning precursor to a processing region of a semiconductor processing chamber. The processing region may be defined by one or more chamber components. The one or more chamber components may include an oxide coating. The methods may include halting delivery of the plasma effluents. The methods may include treating the oxide coating with a hydrogen-containing material delivered to the processing region subsequent halting delivery of the plasma effluents.

Abstract: Embodiments of the disclosure relate to faceplates for a processing chamber. In one example, a faceplate includes a body having a plurality of apertures formed therethrough. A heating element is disposed within the body, and the heating element circumscribes the plurality of apertures. A support ring is disposed the body. The support ring circumscribes the heating element. The support ring includes a main body and a cantilever extending radially inward from the main body. The cantilever contacts the body of the faceplate.

Abstract: The present disclosure provides an electrical power supply structure comprising a plurality of insulated pipes, each insulated pipe extending longitudinally and configured to carry high amperage electrical power, a barrier support plate comprising one or more openings for receiving the plurality of insulated pipes, the barrier support plate configured for mounting over a hole through a floor of a building, a first support structure extending longitudinally upward from an upper side of the barrier support plate, and a second support structure extending longitudinally downward from a lower side of the barrier support plate through the hole. Each of the first and second support structures comprises a longitudinally extending enclosure having a plurality of transversely extending conductor support members for supporting the plurality of insulated pipes, and the plurality of insulated pipes are grouped by phase.

Abstract: Aspects of the present disclosure relate generally to isolator devices, components thereof, and methods associated therewith for substrate processing chambers. In one implementation, a substrate processing chamber includes an isolator ring disposed between a pedestal and a pumping liner. The isolator ring includes a first surface that faces the pedestal, the first surface being disposed at a gap from an outer circumferential surface of the pedestal. The isolator ring also includes a second surface that faces the pumping liner and a protrusion that protrudes from the first surface of the isolator ring and towards the outer circumferential surface of the pedestal. The protrusion defines a necked portion of the gap between the pedestal and the isolator ring.

Abstract: A first electronic device of a local group of connected electronic devices receives a first voice command including a request for a first operation assigns a first target device from among a local group of connected electronic devices as an in-focus device for performing the first operation, causes the first operation to be performed by the first target device via operation of a server-implemented common network service, receives a second voice command including a request for a second operation and based on a determination that the second voice command does not include an explicit designation of a second target device and a determination that the second operation can be performed by the first target device, assigning the first target device.

Abstract: A method and apparatus for processing a semiconductor is disclosed herein. In one embodiment, a processing system for semiconductor processing is disclosed. The processing chamber includes two transfer chambers, a processing chamber, and a rotation module. The processing chamber is coupled to the transfer chamber. The rotation module is positioned between the transfer chambers. The rotation module is configured to rotate the substrate. The transfer chambers are configured to transfer the substrate between the processing chamber and the transfer chamber. In another embodiment, a method for processing a substrate on the apparatus is disclosed herein.

Abstract: Embodiments described herein relate to ground path systems providing a shorter and symmetrical path for radio frequency (RF) energy to propagate to a ground to reduce generation of the parasitic plasma. The ground path system bifurcates the processing volume of the chamber to form an inner volume that isolates an outer volume of the processing volume.