Patents by Inventor Tulay Duyal

Tulay Duyal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4786582
    Abstract: An organic solvent free developing composition which comprises an aqueous admixture having a pH of from about 6.8 to about 7.2 of(a) one or more components selected from the group consisting of tri-sodium, -lithium, or -potassium phosphate, or sodium, lithium or potassium carbonate; and(b) one or more components selected from the group consisting of sodium, lithium, or potassium benzoate or salicylate; and(c) one or more components selected from the group consisting of sodium, lithium, potassium, magnesium or calcium octyl, decyl or dodecyl sulfate; and(d) one or more components selected from the group consisting of mono-sodium, -lithium, or -potassium phosphates and carbonates, and(e) sufficient water to formulate an effective developer.
    Type: Grant
    Filed: October 10, 1986
    Date of Patent: November 22, 1988
    Assignee: Hoechst Celanese Corporation
    Inventor: Tulay Duyal
  • Patent number: 4539285
    Abstract: An improved resin coated substrate is prepared by coating a suitable substrate, such as aluminum with a composition comprising a salt having the structure A-N.sub.2.sup.+ X.sup.- wherein A is an aromatic or heterocyclic residue and X is an anion of an acid; and a binder composition comprising both an acrylic polymer and an acid containing acrylic copolymer.
    Type: Grant
    Filed: March 14, 1984
    Date of Patent: September 3, 1985
    Assignee: American Hoechst Corporation
    Inventors: Tulay Duyal, John E. Walls
  • Patent number: 4435496
    Abstract: Disclosed are novel photosensitive compositions containing a compound consisting essentially of repeating structural units of an alkyl aryl ether, which are end-capped with a substituent functional group containing an ethylenically unsaturated moiety, and a photosensitizing effective amount of a free radical generating compound. Through the selected exposure of films and coatings prepared from the above composition, it is possible to record information in such materials in a manner as to alter the physical and/or chemical properties of such films and coatings. This selective modification can then be simply manifested by contacting the exposed surface of the film or coating, subsequent to such exposure, with an alkaline developing solution. These compositions are useful in the graphic arts and in the manufacture of printed curcuit boards for the electronics industry.
    Type: Grant
    Filed: September 22, 1982
    Date of Patent: March 6, 1984
    Assignee: American Hoechst Corporation
    Inventors: John E. Walls, Tulay Duyal