Abstract: Provided is to perform an identification of a temperature and/or a material of a target object to be measured in a non-contact and simple manner. A relationship between a wavelength and an emissivity of thermal radiation such as infrared rays radiated from an object is determined by the material of the object. In the present invention, the identification is performed by using this. In other words, the object above can be achieved by comparing thermal radiation intensities at a plurality of wavelengths from the given object with a database in the present invention. The database is stored by measuring the thermal radiation intensities at the plurality of wavelengths and temperatures for a plurality of materials in advance. An external light source is not required, and the target to be measured itself is used as a thermal radiation light source in this measurement.

Abstract: Provided is to perform an identification of a temperature and/or a material of a target object to be measured in a non-contact and simple manner. A relationship between a wavelength and an emissivity of thermal radiation such as infrared rays radiated from an object is determined by the material of the object. In the present invention, the identification is performed by using this. In other words, the object above can be achieved by comparing thermal radiation intensities at a plurality of wavelengths from the given object with a database in the present invention. The database is stored by measuring the thermal radiation intensities at the plurality of wavelengths and temperatures for a plurality of materials in advance. An external light source is not required, and the target to be measured itself is used as a thermal radiation light source in this measurement.

Abstract: Provided is a radiation light source that enables adjustment of infrared radiation to a significantly narrow band. A plasmonic reflector layer consisting of a plasmonic material, a resonator layer consisting of an insulator, and a partially reflecting layer are alternately laminated in this order to form a multi-layered radiation light source, wherein the partially reflecting layer are selected from any one of a free interface, an ultrathin-film metallic layer, and a distributed reflector layer having a structure in which layers having different refractive indexes are alternately laminated. When a material with high-temperature resistance such as SiC is used in the outermost layer of the distributed reflector layer, the multi-layered radiation light source can operate at high temperatures of 550° C. and higher.