Abstract: Disclosed are a bonding system and a bonding method. In one embodiment, the bonding system includes a chamber, first and second electrostatic chucks, a visible light sensor module and a nonvisible light module. The chamber is configured to provide a vacuum state. The first electrostatic chuck is configured to hold a first substrate having a first alignment mark in the chamber, wherein the first electrostatic chuck has a first window. The second electrostatic chuck is configured to hold a second substrate having a second alignment mark in the chamber, wherein the second electrostatic chuck has a second window. The visible light sensor module is configured to capture images of the first and the second alignment marks. The nonvisible light module is configured to capture a combined image of the first and second alignment marks via the first and second windows overlapping each other in the vacuum state.

Abstract: A method for manufacturing a lithographic mask for an integrated circuit includes performing an optical proximity correction (OPC) process to an integrated circuit mask layout to produce a corrected mask layout. The method further includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout. The method also includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout.

Abstract: A method for manufacturing a lithographic mask for an integrated circuit includes performing an optical proximity correction (OPC) process to an integrated circuit mask layout to produce a corrected mask layout. The method further includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout. The method also includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout.

Abstract: A method includes patterning a hard mask over a target layer, capturing a low resolution image of the hard mask, and enhancing the low resolution image of the hard mask with a first machine learning model to produce an enhanced image of the hard mask. The method further includes analyzing the enhanced image of the hard mask with a second machine learning model to determine whether the target layer has defects.

Abstract: A method for manufacturing a lithographic mask for an integrated circuit includes performing an optical proximity correction (OPC) process to an integrated circuit mask layout to produce a corrected mask layout. The method further includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout. The method also includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout.

Abstract: A method for manufacturing a lithographic mask for an integrated circuit includes performing an optical proximity correction (OPC) process to an integrated circuit mask layout to produce a corrected mask layout. The method further includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout. The method also includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout.

Abstract: A method for switching a direction setting of direction keys is provided. The method is applied to a device and includes: receiving a signal, wherein the device is defined as having a first axis and a second axis, and the signal indicates a first-axis rotation angle of the device around the first axis and a second-axis rotation angle of the device around the second axis; and switching the direction setting of the direction keys in a key area of the device according to the first-axis rotation angle and the second-axis rotation angle to perform directional control on a current display image displayed by the device.

Abstract: A method for manufacturing a lithographic mask for an integrated circuit includes performing an optical proximity correction (OPC) process to an integrated circuit mask layout to produce a corrected mask layout. The method further includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout. The method also includes performing an inverse lithographic technology (ILT) process to the corrected mask layout to enhance the corrected mask layout to produce an OPC-ILT-enhanced mask layout.

Abstract: A display device and a manufacturing method thereof are provided. The manufacturing method of the display device includes following steps: assembling a protection substrate and a display panel, wherein the protection substrate has an inner surface, facing a first surface of the display panel, and an end portion extends towards the display panel; assembling a device component and the display panel disposed between the device component and the protection substrate, wherein the device component has a component side surface, the display panel has a side surface, and a gap is formed among the end portion, the component side surface and the side surface; extending a dispensing extending portion to the gap; and dispensing an adhesive to the side surface and the component side surface to form an adhesive layer.

Abstract: A laser light source module includes a laser source, a connecting unit, a controlled switch unit, and a verification unit. When a verification signal is received, the verification unit judges whether the verification signal complies with a verifying condition. If the verification signal complies with the verifying condition, the controlled switch unit is in the on state, so that a first output voltage is transmitted to the laser source through the controlled switch unit to drive illumination of the laser source. Whereas, if the verification signal does not comply with the verifying condition, the controlled switch unit is in the off state, so that the first output voltage fails to be transmitted to the laser source through the controlled switch unit and the laser source is turned off.

Abstract: A cursor-control device is provided for an electrical device having a display unit. The cursor-control device includes a button, an image-capture unit and a processing unit. The image-capture unit obtains a screen from the display unit. The processing unit determines cursor coordinates according to the screen, detects the number of times the button has been pressed and released, and determines whether to transmit a double-click signal to the electrical device according to the number of times of the button switching. When the button becomes pressed or released, the number of times of the button switching increases by one. Also, when the number of times of the button switching reaches two, the processing unit stores the cursor coordinates.

Abstract: A projection system includes an indicating device and a projection device, and the indicating device includes a button. When the button is pressed for the first time, the indicating device is configured to obtain a corresponding coordinate value and output a coordinate signal based on the coordinate value, and the projection device is configured to receive and process the coordinate signal to obtain and store the coordinate value. When the button is pressed for the second time in a first predetermined time, the projection device is configured to output a simulating double click signal to a computer. A method for controlling the projection system is also disclosed herein.

Abstract: An orthognathic planning system applied with at least a dental cast includes an articulator, a detecting device, at least a label module and a data processing device. The dental cast is mounted on the articulator. The detecting device is disposed with respect to the articulator. The label module has at least a label and is disposed on the dental cast. The data processing device is signally connected with the detecting device and stores midface and mandible image data. The detecting device traces the label and provides position data, and the data processing device provides orthognathic planning data in accordance with the position data and the midface and mandible image data. The present invention also discloses an orthognathic planning method.

Abstract: An auxiliary device for an articulator includes a base and at least an adjusting structure. The base is provided for positioning an articulator, and the adjusting structure is disposed on the base. The adjusting structure includes a first ball joint, a second ball joint and a connecting assembly. The first ball joint is connected to the base, and the two ends of the connecting assembly are connected to the first ball joint and the second ball joint, respectively. The adjusting structure is moved relatively to the articulator by the movement of at least one of the first ball joint and the second ball joint, thereby adjusting the position of a dental cast disposed on the articulator. The auxiliary device is advantageous for conveniently adjusting the dental cast disposed on the articulator and accelerating the process of the preoperative planning.

Abstract: A laser light source module includes a laser source, a connecting unit, a controlled switch unit, and a verification unit. When a verification signal is received, the verification unit judges whether the verification signal complies with a verifying condition. If the verification signal complies with the verifying condition, the controlled switch unit is in the on state, so that a first output voltage is transmitted to the laser source through the controlled switch unit to drive illumination of the laser source. Whereas, if the verification signal does not comply with the verifying condition, the controlled switch unit is in the off state, so that the first output voltage fails to be transmitted to the laser source through the controlled switch unit and the laser source is turned off.

Abstract: An orthognathic planning system applied with at least a dental cast includes an articulator, a detecting device, at least a label module and a data processing device. The dental cast is mounted on the articulator. The detecting device is disposed with respect to the articulator. The label module has at least a label and is disposed on the dental cast. The data processing device is signally connected with the detecting device and stores midface and mandible image data. The detecting device traces the label and provides position data, and the data processing device provides orthognathic planning data in accordance with the position data and the midface and mandible image data. The present invention also discloses an orthognathic planning method.

Abstract: The method is performed in a computer and includes acts of importing medical image data sets of an object, selecting regions of interest of the object in each medical image data set, processing the medical image data and constructing an optimal symmetry plane. The act of selecting the regions of interest of the object in each medical image data set defines the regions of interest of the object in each medical image data set and locates the regions of interest of the object in each medical image data set. The act of processing the medical image data executes an error equation and obtains optimal parameters of the optimal symmetry plane with a symmetry value. The act of constructing an optimal symmetry plane constructs an optimal symmetry plane with the obtained optimal parameters. Based on the discovered Optimal Symmetry Plane, slanted images from medical imaging can be rectified.

Abstract: The method is performed in a computer and comprises acts of importing medical image data sets of an object, selecting regions of interest of the object in each medical image data set, processing the medical image data and constructing an optimal symmetry plane. The act of selecting the regions of interest of the object in each medical image data set defines the regions of interest of the object in each medical image data set and locates the regions of interest of the object in each medical image data set. The act of processing the medical image data executes an error equation and obtains optimal parameters of the optimal symmetry plane with a symmetry value. The act of constructing an optimal symmetry plane constructs an optimal symmetry plane with the obtained optimal parameters. Base on the discovered Optimal Symmetry Plane, the slanted images from medical imaging can be rectified.