Patents by Inventor Tung Jung Chang
Tung Jung Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11921431Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.Type: GrantFiled: January 30, 2023Date of Patent: March 5, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tung-Jung Chang, Jen-Yang Chung, Han-Lung Chang
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Publication number: 20230176488Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.Type: ApplicationFiled: January 30, 2023Publication date: June 8, 2023Inventors: Tung-Jung CHANG, Jen-Yang CHUNG, Han-Lung CHANG
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Patent number: 11592754Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.Type: GrantFiled: September 17, 2021Date of Patent: February 28, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Tung-Jung Chang, Jen-Yang Chung, Han-Lung Chang
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Publication number: 20220342321Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.Type: ApplicationFiled: September 17, 2021Publication date: October 27, 2022Inventors: Tung-Jung CHANG, Jen-Yang CHUNG, Han-Lung CHANG
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Patent number: 11162524Abstract: A fittable and releasable fastener includes a head which has a fitted and released portion and a fastening portion; and a fitting and releasing piece which has a fitting and releasing portion. Accordingly, when the fitting and releasing portion fits to the fitted and released portion, an external turning force is applied to the fitting and releasing piece or the head to make the fastening portion combine with at least one object. After the fastening portion is combined with the object, the fitting and releasing portion would release the fitted and released portion to limit the force or the force interval applied on the fastening portion for preventing excessively locking if the force is continuously applied.Type: GrantFiled: July 9, 2019Date of Patent: November 2, 2021Assignee: FIVETECH TECHNOLOGY INC.Inventors: Ting-Jui Wang, Tung-Jung Chang
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Patent number: 11054756Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.Type: GrantFiled: June 15, 2020Date of Patent: July 6, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yu-Fu Lin, Tung-Jung Chang, Chia-Chen Chen
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Publication number: 20200310258Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.Type: ApplicationFiled: June 15, 2020Publication date: October 1, 2020Inventors: Yu-Fu LIN, Tung-Jung CHANG, Chia-Chen CHEN
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Patent number: 10684559Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.Type: GrantFiled: February 22, 2018Date of Patent: June 16, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yu-Fu Lin, Tung-Jung Chang, Chia-Chen Chen
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Patent number: 10627728Abstract: A method for creating a vacuum in a load lock chamber is provided. The method includes building an air-tight environment in the load lock chamber. The method further includes reducing the pressure in a gas tank to a predetermined vacuum pressure. The method also includes enabling an exchange of gas between the load lock chamber and the gas tank when the pressure in the gas tank is at the predetermined vacuum pressure so as to reduce the pressure in the load lock chamber to an adjusted vacuum pressure.Type: GrantFiled: June 14, 2017Date of Patent: April 21, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tung-Jung Chang, Yu-Fu Lin, Sheng-Kang Yu
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Publication number: 20200018342Abstract: A fittable and releasable fastener includes a head which has a fitted and released portion and a fastening portion; and a fitting and releasing piece which has a fitting and releasing portion. Accordingly, when the fitting and releasing portion fits to the fitted and released portion, an external turning force is applied to the fitting and releasing piece or the head to make the fastening portion combine with at least one object. After the fastening portion is combined with the object, the fitting and releasing portion would release the fitted and released portion to limit the force or the force interval applied on the fastening portion for preventing excessively locking if the force is continuously applied.Type: ApplicationFiled: July 9, 2019Publication date: January 16, 2020Inventors: TING-JUI WANG, Tung-Jung Chang
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Publication number: 20190155178Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.Type: ApplicationFiled: February 22, 2018Publication date: May 23, 2019Inventors: Yu-Fu LIN, Tung-Jung CHANG, Chia-Chen CHEN
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Publication number: 20180364596Abstract: A method for creating a vacuum in a load lock chamber is provided. The method includes building an air-tight environment in the load lock chamber. The method further includes reducing the pressure in a gas tank to a predetermined vacuum pressure. The method also includes enabling an exchange of gas between the load lock chamber and the gas tank when the pressure in the gas tank is at the predetermined vacuum pressure so as to reduce the pressure in the load lock chamber to an adjusted vacuum pressure.Type: ApplicationFiled: June 14, 2017Publication date: December 20, 2018Inventors: Tung-Jung CHANG, Yu-Fu LIN, Sheng-Kang YU
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Publication number: 20100031583Abstract: A wind driven device for preventing the accumulation of debris in a gutter at a mouth of a downspout comprises a drive shaft coupled to the impeller and a bit is disposed at a distal end of the drive shaft. Means for mounting the device on the gutter ensures that the bit is disposed above and spaced-apart from the mouth of the downspout.Type: ApplicationFiled: August 6, 2008Publication date: February 11, 2010Inventor: Tung Jung Chang