Patents by Inventor Tung-Li Wu
Tung-Li Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230324814Abstract: An extreme ultra violet (EUV) lithography apparatus includes a light source that generates an EUV light beam, a scanner that receives the light from a junction with the light source and directs the light to a reticle stage, and a debris catcher disposed on a EUV beam path between the light source and the scanner. The debris catcher includes a network membrane including a plurality of nano-fibers.Type: ApplicationFiled: April 11, 2022Publication date: October 12, 2023Inventors: I-Hsiung HUANG, Yung-Cheng CHEN, Tung-Li WU
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Patent number: 9709904Abstract: A lithography apparatus includes a plurality reticle edge masking assemblies (REMAs), wherein each REMA of the plurality of REMAs is positioned to receive one of a plurality of light beams, and each REMA of the plurality of REMAs comprises a movable slit for passing the received light beam therethrough. The lithography apparatus includes a controller for controlling a speed of the movable slit based on a size of the movable slit, an intensity of the one or more collimated light beams, or a material to be patterned. The lithography apparatus further includes a single mask having a single pattern, wherein the mask is configured to receive light from every REMA of the plurality of REMAs. The lithography apparatus includes a projection lens configured to receive light transmitted through the single mask, wherein the lithography apparatus is configured to introduce an immersion liquid into a space adjacent to the projection lens.Type: GrantFiled: June 24, 2015Date of Patent: July 18, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Tung-Li Wu, Chin-Hsiang Lin, Heng-Hsin Liu, Jui-Chun Peng
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Patent number: 9658536Abstract: An immersion lithography apparatus includes a lens system, an immersion hood, a wafer stage, an inspection system and a cleaning fluid supplier. The lens system is configured to project a pattern onto a wafer. The immersion hood is configured to confine an immersion fluid between the lens system and the wafer, and includes a peripheral hole configured to suck up the immersion fluid. The wafer stage is configured to position the wafer under the lens system. The inspection system is configured to detect whether there is contamination in the peripheral hole. The cleaning fluid supplier is coupled to the inspection system and configured to supply a cleaning fluid through the peripheral hole to remove the contamination, in which the inspection system and the cleaning fluid supplier are coupled to the wafer stage.Type: GrantFiled: February 25, 2014Date of Patent: May 23, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tung-Li Wu, Heng-Hsin Liu, Jui-Chun Peng
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Publication number: 20150293462Abstract: A lithography apparatus includes a plurality reticle edge masking assemblies (REMAs), wherein each REMA of the plurality of REMAs is positioned to receive one of a plurality of light beams, and each REMA of the plurality of REMAs comprises a movable slit for passing the received light beam therethrough. The lithography apparatus includes a controller for controlling a speed of the movable slit based on a size of the movable slit, an intensity of the one or more collimated light beams, or a material to be patterned. The lithography apparatus further includes a single mask having a single pattern, wherein the mask is configured to receive light from every REMA of the plurality of REMAs. The lithography apparatus includes a projection lens configured to receive light transmitted through the single mask, wherein the lithography apparatus is configured to introduce an immersion liquid into a space adjacent to the projection lens.Type: ApplicationFiled: June 24, 2015Publication date: October 15, 2015Inventors: Tung-Li WU, Chin-Hsiang LIN, Heng-Hsin LIU, Jui-Chun PENG
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Publication number: 20150241789Abstract: An immersion lithography apparatus includes a lens system, an immersion hood, a wafer stage, an inspection system and a cleaning fluid supplier. The lens system is configured to project a pattern onto a wafer. The immersion hood is configured to confine an immersion fluid between the lens system and the wafer, and includes a peripheral hole configured to suck up the immersion fluid. The wafer stage is configured to position the wafer under the lens system. The inspection system is configured to detect whether there is contamination in the peripheral hole. The cleaning fluid supplier is coupled to the inspection system and configured to supply a cleaning fluid through the peripheral hole to remove the contamination, in which the inspection system and the cleaning fluid supplier are coupled to the wafer stage.Type: ApplicationFiled: February 25, 2014Publication date: August 27, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tung-Li WU, Heng-Hsin LIU, Jui-Chun PENG
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Patent number: 9081297Abstract: A lithography apparatus includes at least two reticle edge masking assemblies (REMAs). The lithography apparatus further includes a light source configured to emit a light beam having a wavelength and a beam separating element configured to divide the light beam into more than one collimated light beam. Each REMA is positioned to receive one of the more than one collimating light beams and each REMA comprises a movable slit for passing the one collimated light beam therethrough. The lithography apparatus further includes at least one mask having a pattern, where the at least one mask is configured to receive light from at least one of the REMA and a projection lens configured to receive light from the at least one mask. A method of using a lithography apparatus is also discussed.Type: GrantFiled: May 1, 2012Date of Patent: July 14, 2015Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Tung-Li Wu, Chin-Hsiang Lin, Heng-Hsin Liu, Jui-Chun Peng
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Publication number: 20130293857Abstract: A lithography apparatus includes at least two reticle edge masking assemblies (REMAs). The lithography apparatus further includes a light source configured to emit a light beam having a wavelength and a beam separating element configured to divide the light beam into more than one collimated light beam. Each REMA is positioned to receive one of the more than one collimating light beams and each REMA comprises a movable slit for passing the one collimated light beam therethrough. The lithography apparatus further includes at least one mask having a pattern, where the at least one mask is configured to receive light from at least one of the REMA and a projection lens configured to receive light from the at least one mask. A method of using a lithography apparatus is also discussed.Type: ApplicationFiled: May 1, 2012Publication date: November 7, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Tung-Li WU, Chin-Hsiang LIN, Heng-Hsin LIU, Jui-Chun PENG
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Patent number: 8237132Abstract: An apparatus includes a radiation source that emits a radiation beam that causes substantially all of a quantity of material to evaporate; and structure having first and second surface portions, a first operational mode wherein a greater quantity of a byproduct of the evaporation impinges on the first surface portion, and a second operational mode wherein a greater quantity of the byproduct impinges on the second surface portion. A different aspect involves emitting a radiation beam toward a quantity of material, the radiation beam causing substantially all of the quantity of material to evaporate; operating a structure having first and second surface portions in a first operational mode wherein a greater quantity of a byproduct of the evaporation impinges on the first surface portion; and thereafter operating the structure in a second operational mode wherein a greater quantity of the byproduct impinges on the second surface portion.Type: GrantFiled: June 17, 2009Date of Patent: August 7, 2012Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Jui-Chun Peng, Heng-Jen Lee, Tung-Li Wu, I-Hsiung Huang
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Publication number: 20100321660Abstract: An apparatus includes a radiation source that emits a radiation beam that causes substantially all of a quantity of material to evaporate; and structure having first and second surface portions, a first operational mode wherein a greater quantity of a byproduct of the evaporation impinges on the first surface portion, and a second operational mode wherein a greater quantity of the byproduct impinges on the second surface portion. A different aspect involves emitting a radiation beam toward a quantity of material, the radiation beam causing substantially all of the quantity of material to evaporate; operating a structure having first and second surface portions in a first operational mode wherein a greater quantity of a byproduct of the evaporation impinges on the first surface portion; and thereafter operating the structure in a second operational mode wherein a greater quantity of the byproduct impinges on the second surface portion.Type: ApplicationFiled: June 17, 2009Publication date: December 23, 2010Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Jui-Chun Peng, Heng-Jen Lee, Tung-Li Wu, I-Hsiung Huang
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Patent number: 7285147Abstract: An air supply system for a clean room with a critical machine. An intake duct connects the exterior of the clean room to a make-up air unit, and is configured to transport external air into the make-up air unit. A first air duct connects the make-up air unit to an air conditioning cabinet including a first chemical filter, and is configured to transport the air flowing through the make-up air unit into the air conditioning cabinet. The first chemical filter removes airborne molecular contamination from the air transported into the air conditioning cabinet. A second air duct connects the air conditioning cabinet to the critical machine, and is configured to transport the air flowing through the first chemical filter of the air conditioning cabinet into the critical machine. An exhaust duct connects the critical machine to the exterior of the clean room, discharging waste gas produced in the critical machine.Type: GrantFiled: December 2, 2004Date of Patent: October 23, 2007Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Po-Sung Kuo, Yung-Dar Chen, Jheng-Long Chou, Tung-Li Wu, Ming-Wen Huang
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Publication number: 20060117722Abstract: An air supply system for a clean room with a critical machine. An intake duct connects the exterior of the clean room to a make-up air unit, and is configured to transport external air into the make-up air unit. A first air duct connects the make-up air unit to an air conditioning cabinet including a first chemical filter, and is configured to transport the air flowing through the make-up air unit into the air conditioning cabinet. The first chemical filter removes airborne molecular contamination from the air transported into the air conditioning cabinet. A second air duct connects the air conditioning cabinet to the critical machine, and is configured to transport the air flowing through the first chemical filter of the air conditioning cabinet into the critical machine. An exhaust duct connects the critical machine to the exterior of the clean room, discharging waste gas produced in the critical machine.Type: ApplicationFiled: December 2, 2004Publication date: June 8, 2006Inventors: Po-Sung Kuo, Yung-Dar Chen, Jheng-Long Chou, Tung-Li Wu, Ming-Wen Huang