Abstract: A process cartridge and developer container assembly is constructed to include a main cartridge holding an electrophotographic photosensitive member, developing means, charging means, and cleaning means, a developer container holding developer and detachably secured to the main cartridge, and a coupling member for enabling the developer container to be detachably coupled to the main cartridge. The main cartridge has a plurality of developer receiving openings, and a first sliding cover, which opens the developer receiving openings upon installation of the developer container in the main cartridge, or closes the developer receiving openings after removal of the developer container.

Abstract: A toner supplying container detachably mountable to an image forming apparatus. In one embodiment, the toner supplying container includes a first container for receiving toner and a second container for accommodating toner and providing toner to the first container. The second container is releasably mounted to the first container at a predetermined position such that the first container and second container communicate to each other. The second container is replaceable when the toner accommodated in the second container is used up by a third container that is substantially identical to the second container but has toner therein.

Abstract: Embodiments of the present invention relate to a method and a system for determining an exposure time of a wafer photolithography process is applied to a wafer photolithography system and is used to determine the preferred exposure time for the L(N) batch production wafer. In one embodiment, at least three batches of the batch test wafers are recalled in a time sequence and the corresponding test values are obtained. A mean value of the test values corresponding to the at least three batches of the batch test wafers is calculated with a predetermined mathematical model. The calculated mean value is compared with a predetermined qualified examination value, and a margin value between the mean value and the qualified examination value is thus determined to adjust and generate an appropriate process exposure time. The preferred process exposure time is then employed as the exposure time of the L(N) batch production wafer.

Abstract: An implant device including a tubular matrix made of a biocompatible and bioresorbable biopolymeric material. The matrix has a first end and a second end, a wall of a homogeneous thickness; a plurality of ridges on the wall; and a channel which is defined by the wall and extends from the first end to the second end of the tubular matrix.

Abstract: A sheet membrane containing a layer of oriented biopolymeric fibers. The membrane has a thickness of 0.1 mm to 3.0 mm, a density of 0.1 g/cm3 to 1.2 g/cm3, a hydrothermal shrinkage temperature of 50° C. to 85° C., a suture pullout strength of 0.1 kg to 5 kg, a tensile strength of 10 kg/cm2 to 150 kg/cm2, and permeability to molecules having molecular weights of 200 to 300,000 daltons.

Abstract: A developer-replenishing container having a cylindrical container body holding a developer, a front bottleneck for output of the developer, a tubular front extension axially connected between the container body and the front bottleneck, smooth developer guide wall portions and oblique developer guide wall portions alternatively arranged in a spiral series inside the container body and the tubular front extension and adapted to guide the developer toward the front bottleneck without causing a laminar flow.

Abstract: A sheet membrane containing a lair of oriented biopolymeric fibers. The membrane has a thickness of 0.1 mm to 3.0 mm, a density of 0.1 g/cm3 to 1.2 g/cm3, a hydrothermal shrinkage temperature of 50° C. to 85° C., a suture pullout strength of 0.1 kg to 5 kg, a tensile strength of 10 kg/cm2 to 150 kg/cm2, and permeability to molecules having molecular weights of 200 to 300,000 daltons.

Abstract: This invention relates to an embolization device for occluding a vessel. This device includes a matrix made of a biocompatible and biopolymeric material and a radiopaque material, wherein the radiopaque material is interspersed in the biocompatible and biopolymeric material. The matrix can adopt a linear extended form or a folded relaxed form.

Abstract: Disclosed is an implant delivery system, e.g., an implant delivery device which includes a detector having a probe positioned at the distal end of a cannula to detect the presence of body fluid flowing in the lumen, and thereby locate the implant member at the wall of the lumen. The implant member further includes a retaining member slidably positioned within the cannula to maintain the implant member at the wall of the lumen when the cannula is withdrawn over the implant member.

Abstract: A method for protecting stepper alignment marks suitable for a substrate with an alignment mark on a scribe line and a metal layer that will be etched includes the following steps. First, a photoresist layer is formed over the metal layer. Next, a photo mask which has a predefined photo mask pattern for transfer to the metal layer is provided, and a pattern protecting the alignment marks is added to the photo mask pattern. Then, a photolithographic process is performed with the photo mask pattern on the photoresist layer to form the desired transferring photoresist mask to the metal layer and the protective photoresist mask for protecting the alignment marks.

Abstract: A first III-V semiconductor wafer is bonded to a second III-V semiconductor wafer, e.g. by thermal fusion. The {110} crystal plane of the III-V semiconductor wafer is displaced angularly relative to the {110} crystal plane of the second III-V semiconductor wafer. Because of this, the tendency of the bonded wafer to break is reduced and many backside processes can be moved to front side and results in a robust device manufacturing process.

Abstract: A developer replenishing container includes a container body, and a plurality of clamping strips selectively used with the container body for mounting in a copier, wherein the container body has a slide moved in and out of a frame at a bottom neck thereof for developer output control, and two locating blocks at two opposite sides of the bottom neck above the frame; the clamping strips each have a mouth adapted to receive the bottom neck of the container body, two recessed receiving portions disposed at two opposite lateral sides and facing each other and adapted to receive the locating blocks of the bottom neck, two flat positioning ribs respectively disposed in the recessed receiving portions at a bottom side and adapted for engaging into the gaps between the top side wall of the frame and the locating blocks of the bottom neck, and at least one stop rod disposed outside the mouth for positioning in a copier.

Abstract: A developer replenishing container having a cylindrical container body with a bottle neck, and a tapered plug installed in the bottle neck of the cylindrical container body, wherein the tapered plug has a tubular shank axially extended from one end thereof and suspended in the bottle neck and defining with the bottle neck a developer passage for enabling the developer to be smoothly and evenly guided out of the container body through the developer passage upon rotary motion of the container body.

Abstract: A container body installed in an image forming apparatus to supply developer, having a spiral developer guide spirally extended around an inside wall thereof for guiding developer out of a front opening thereof, the spiral developer guide having a spiral guide way formed of flat surface portions and sloping surface portions alternatively connected in series, and two spiral flanges spirally formed integral with the inside wall of the container body along the series of flat surface portions and sloping surface portions at two opposite lateral sides.

Abstract: An object of the present invention is to provide a method for accurately determining a swing curve in the &mgr;m order's semiconductor technology. Photoresist films with different thicknesses are coated on silicon dummy wafers, respectively. Using a mask with a critical dimension bar's pattern, each of the chips of the silicon dummy wafers is exposed by different exposure doses such that the pattern is transferred on each of the chips. After the silicon dummy wafers are developed, each of the chips of the silicon dummy wafers is inspected by using a scanning electron microscope. For each of the silicon dummy wafers, the exposure dose resulting in completely removing the photoresist film on the region between the adjacent critical dimension bars of the pattern by developing is recorded. According to the present invention, it is easy to obtain an accurate swing curve since the resolution of the scanning electron microscope is up to the order of &mgr;m.

Abstract: The present invention relates to a method for actually measuring misalignment of a via. According to the invention, a via is formed by etching an inter metal dielectric (IMD) layer using a photoresist with a via pattern as a mask so that via pattern can be accurately transferred to the inter metal dielectric layer. Then a patterned metal interconnection line underlying the inter metal dielectric layer is etched using the patterned inter metal dielectric layer as a mask and followed by a process of stripping the inter metal dielectric layer. After that, an actual misalignment can be detected by measuring relative distance between the patterned metal interconnection line and the via thereon through Scanning Electron Microscopy (SEM), by which overlay specifications for OSI instrument can be verified and adjusted.

Abstract: A developer replenishing container having a developer guide cone connected between a cylindrical body portion and a bottle neck for guiding developer out of the cylindrical body portion via the bottle neck, wherein the developer guide cone defines a spiral guide wall portion and a spiral developer flow passageway for guiding developer from the cylindrical body portion toward the bottle neck, the developer guide cone having a diameter made gradually reduced toward the bottle neck, and an angle of slope within about 15°˜45°, the spiral guide wall portion having a depth within about 3˜18 mm, the spiral developer flow passageway having a rear end smoothly extended to the bottle neck in a flush manner for guiding developer to the bottle neck.