Patents by Inventor TUNG-LIN YANG

TUNG-LIN YANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240133949
    Abstract: An outlier IC detection method includes acquiring first measured data of a first IC set, training the first measured data for establishing a training model, acquiring second measured data of a second IC set, generating predicted data of the second IC set by using the training model according to the second measured data, generating a bivariate dataset distribution of the second IC set according to the predicted data and the second measured data, acquiring a predetermined Mahalanobis distance on the bivariate dataset distribution of the second IC set, and identifying at least one outlier IC from the second IC set when at least one position of the at least one outlier IC on the bivariate dataset distribution is outside a range of the predetermined Mahalanobis distance.
    Type: Application
    Filed: October 3, 2023
    Publication date: April 25, 2024
    Applicant: MEDIATEK INC.
    Inventors: Yu-Lin Yang, Chin-Wei Lin, Po-Chao Tsao, Tung-Hsing Lee, Chia-Jung Ni, Chi-Ming Lee, Yi-Ju Ting
  • Patent number: 11725577
    Abstract: An exhaust system includes an exhaust line configured to receive an exhaust mixture. The exhaust system further includes an oscillating assembly connected to the exhaust line. The exhaust system further includes a feedback path extending from an external gas source to the oscillating assembly, wherein the feedback path is separate from the exhaust line.
    Type: Grant
    Filed: July 12, 2022
    Date of Patent: August 15, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Hsuan Huang, Tung-Lin Yang
  • Publication number: 20220349340
    Abstract: An exhaust system includes an exhaust line configured to receive an exhaust mixture. The exhaust system further includes an oscillating assembly connected to the exhaust line. The exhaust system further includes a feedback path extending from an external gas source to the oscillating assembly, wherein the feedback path is separate from the exhaust line.
    Type: Application
    Filed: July 12, 2022
    Publication date: November 3, 2022
    Inventors: Po-Hsuan HUANG, Tung-Lin YANG
  • Patent number: 11401860
    Abstract: A method of using an exhaust system includes activating an oscillating assembly connected to an exhaust line, wherein the oscillating assembly is configured to vibrate the exhaust line. The method further includes measuring a value indicating a flow of particles through the exhaust line. The method further includes comparing the value with a predetermined threshold value. The method further includes increasing a rate of vibration of the exhaust line in response to the value being below the predetermined threshold value.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: August 2, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Hsuan Huang, Tung-Lin Yang
  • Publication number: 20200347781
    Abstract: A method of using an exhaust system includes activating an oscillating assembly connected to an exhaust line, wherein the oscillating assembly is configured to vibrate the exhaust line. The method further includes measuring a value indicating a flow of particles through the exhaust line. The method further includes comparing the value with a predetermined threshold value. The method further includes increasing a rate of vibration of the exhaust line in response to the value being below the predetermined threshold value.
    Type: Application
    Filed: July 21, 2020
    Publication date: November 5, 2020
    Inventors: Po-Hsuan HUANG, Tung-Lin YANG
  • Patent number: 10731552
    Abstract: An exhaust system includes an inlet configured to receive an exhaust mixture. The exhaust system further includes an exhaust line connected to the inlet. The exhaust system further includes an oscillating assembly connected to the exhaust line. The exhaust system further includes a by-pass line connected to the exhaust line. The exhaust system further includes a feedback path extending from an external gas source to the oscillating assembly, wherein the feedback path is separate from the exhaust line.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: August 4, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Po-Hsuan Huang, Tung-Lin Yang
  • Publication number: 20180149082
    Abstract: An exhaust system includes an inlet configured to receive an exhaust mixture. The exhaust system further includes an exhaust line connected to the inlet. The exhaust system further includes an oscillating assembly connected to the exhaust line. The exhaust system further includes a by-pass line connected to the exhaust line. The exhaust system further includes a feedback path extending from an external gas source to the oscillating assembly, wherein the feedback path is separate from the exhaust line.
    Type: Application
    Filed: April 4, 2017
    Publication date: May 31, 2018
    Inventors: Po-Hsuan HUANG, Tung-Lin YANG
  • Patent number: 9657757
    Abstract: Some embodiments of the present disclosure provide a method of dissipating process exhaust from a chamber. The method includes conveying the process exhaust from the chamber through an inner tube of a pipeline to abatement. The process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline. The method maintains an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline. The second temperature is negative offset from the first temperature within a predetermined value.
    Type: Grant
    Filed: March 16, 2015
    Date of Patent: May 23, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Tung-Lin Yang, Chun-Hung Chang, Rouh Jier Wang
  • Publication number: 20160273541
    Abstract: Some embodiments of the present disclosure provide a method of dissipating process exhaust from a chamber. The method includes conveying the process exhaust from the chamber through an inner tube of a pipeline to abatement. The process exhaust has a first temperature while exiting the chamber, and a second temperature while exiting the pipeline. The method maintains an outer tube of the pipeline at a vacuum state by a pump such that the inner tube is substantially thermal isolated from the atmosphere outside the pipeline. The second temperature is negative offset from the first temperature within a predetermined value.
    Type: Application
    Filed: March 16, 2015
    Publication date: September 22, 2016
    Inventors: TUNG-LIN YANG, CHUN-HUNG CHANG, ROUH JIER WANG