Abstract: A method for managing tools using statistical process control. Process progression for a wafer in a chamber of a process tool is recorded. When a wafer process is complete and the wafer leaves the chamber, the wafer is transferred to a measurement tool. A wafer ID of the wafer is obtained using the measurement tool. A chamber ID is obtained according to the wafer ID and a chart point corresponding to the wafer ID and the chamber ID is generated according to measurement results. A plurality of generated chart points are grouped according to a plurality of obtained wafer IDs and a plurality of chamber IDs corresponding to the wafer IDs to split a control chart corresponding to the process tool into a plurality of separate control charts. Statistical process control analysis is implemented according to the generated control charts and alarms are issued according to the analysis results to adjust an abnormal chamber.