Patents by Inventor Tung-Ying Lin

Tung-Ying Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11973067
    Abstract: Methods for manufacturing a display device are provided. The methods include providing a plurality of light-emitting units and a substrate. The methods also include transferring the light-emitting units to a transfer head. The methods further include attaching at least one of the plurality of light-emitting units on the transfer head to the substrate by a bonding process, wherein the transfer head and the substrate satisfy the following equation during the bonding process: 0 ? ? ? T ? ? 1 T ? ? 2 ? A ? ( T ) ? dT - ? T ? ? 1 T ? ? 3 ? E ? ( T ) ? dT ? ? < 0.01 wherein A(T) is the coefficient of thermal expansion of the transfer head, E(T) is the coefficient of thermal expansion of the substrate, T1 is room temperature, T2 is the temperature of the transfer head, and T3 is the temperature of the substrate.
    Type: Grant
    Filed: August 24, 2021
    Date of Patent: April 30, 2024
    Assignee: INNOLUX CORPORATION
    Inventors: Tung-Kai Liu, Tsau-Hua Hsieh, Fang-Ying Lin, Kai Cheng, Hui-Chieh Wang, Shun-Yuan Hu
  • Publication number: 20240131808
    Abstract: A tape laying device includes a tape transmission mechanism, a compaction head mechanism, a cutter mechanism, a heating mechanism and a motion mechanism. The tape transmission mechanism is configured to transmit the pre-impregnated tape. The compaction head mechanism, connected with the tape transmission mechanism, is configured to depress and drive the pre-impregnated tape transmitted by the tape transmission mechanism to follow a moving path so as to adhere the pre-impregnated tape onto the mould surface. The cutter mechanism is configured to cut the pre-impregnated tape. The heating mechanism, disposed downstream to the cutter mechanism, is configured to heat the pre-impregnated tape. The motion mechanism is used to have the cutter mechanism having an active path to move toward the moving path while the cutter mechanism cuts the pre-impregnated tape.
    Type: Application
    Filed: December 7, 2022
    Publication date: April 25, 2024
    Inventors: TENG-YEN WANG, SHUN-SHENG KO, MIAO-CHANG WU, TUNG-YING LIN, CHAO-HONG HSU
  • Patent number: 11957070
    Abstract: A memory cell includes a memory device, a connecting structure, an insulating layer and a selector. The connecting structure is disposed on and electrically connected to the memory device. The insulating layer covers the memory device and the connecting structure. The selector is located on and electrically connected to the memory device, where the selector is disposed on the insulating layer and connected to the connecting structure by penetrating through the insulating layer.
    Type: Grant
    Filed: August 6, 2021
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tung-Ying Lee, Bo-Jiun Lin, Shao-Ming Yu, Yu-Chao Lin
  • Patent number: 11955579
    Abstract: A method for manufacturing a semiconductor device is provided. The method includes forming a plurality of light-emitting elements on a first substrate and forming a first pattern array on a second substrate, wherein the first pattern array includes an adhesive layer. The method also includes transferring the plurality of light-emitting elements from the first substrate to the second substrate and forming the first pattern array on a third substrate. The method includes transferring the plurality of light-emitting elements from the second substrate to the third substrate, and reducing an adhesion force of a portion of the adhesive layer. The method also includes forming a second pattern array on a fourth substrate, and transferring the plurality of light-emitting elements from the third substrate to the fourth substrate. The pitch between the plurality of light-emitting elements on the first substrate is different than the pitch of the first pattern array.
    Type: Grant
    Filed: April 21, 2022
    Date of Patent: April 9, 2024
    Assignee: INNOLUX CORPORATION
    Inventors: Kai Cheng, Tsau-Hua Hsieh, Fang-Ying Lin, Tung-Kai Liu, Hui-Chieh Wang, Chun-Hsien Lin, Jui-Feng Ko
  • Patent number: 11949040
    Abstract: A method for manufacturing a semiconductor device is provided. The method includes forming a plurality of diodes on a first substrate and forming a first pattern array on a second substrate. The method also includes transferring the plurality of diodes from the first substrate to the second substrate. The method further includes forming the first pattern array on a third substrate. In addition, the method includes transferring the plurality of diodes from the second substrate to the third substrate. The method also includes forming a second pattern array on a fourth substrate. The method further includes transferring the plurality of diodes from the third substrate to the fourth substrate. The pitch between the plurality of diodes on the first substrate is different from the pitch of the first pattern array.
    Type: Grant
    Filed: April 21, 2022
    Date of Patent: April 2, 2024
    Assignee: INNOLUX CORPORATION
    Inventors: Kai Cheng, Tsau-Hua Hsieh, Fang-Ying Lin, Tung-Kai Liu, Hui-Chieh Wang, Chun-Hsien Lin, Jui-Feng Ko
  • Patent number: 11935958
    Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a first stacked nanostructure and a second stacked nanostructure formed over a substrate. The semiconductor device structure includes a first gate structure formed over the first stacked nanostructure, and the first gate structure includes a first portion of a gate dielectric layer and a first portion of a filling layer. The semiconductor device structure includes a second gate structure formed over the second stacked nanostructure, and the second gate structure includes a second portion of the gate dielectric layer and a second portion of the filling layer. The semiconductor device structure includes a first isolation layer between the first gate structure and the second gate structure, wherein the first isolation layer has an extending portion which is formed in a recess between the gate dielectric layer and the filling layer.
    Type: Grant
    Filed: March 27, 2023
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Chao Lin, Wei-Sheng Yun, Tung-Ying Lee
  • Publication number: 20240090354
    Abstract: Provided are a memory cell and a method of forming the same. The memory cell includes a bottom electrode, a top electrode, and a storage element layer. The storage element layer is disposed between the bottom and top electrodes. An extending direction of a sidewall of the storage element layer is different from an extending direction of a sidewall of the top electrode. A semiconductor device having the memory cell is also provided.
    Type: Application
    Filed: November 20, 2023
    Publication date: March 14, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Chao Lin, Tung-Ying Lee
  • Patent number: 11925127
    Abstract: A method includes forming a dielectric layer over a substrate, the dielectric layer having a top surface; etching an opening in the dielectric layer; forming a bottom electrode within the opening, the bottom electrode including a barrier layer; forming a phase-change material (PCM) layer within the opening and on the bottom electrode, wherein a top surface of the PCM layer is level with or below the top surface of the dielectric layer; and forming a top electrode on the PCM layer.
    Type: Grant
    Filed: July 15, 2022
    Date of Patent: March 5, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tung Ying Lee, Yu Chao Lin, Shao-Ming Yu
  • Publication number: 20240074334
    Abstract: A phase-change memory device and a method for fabricating the same are provided. The phase-change memory device comprises a first electrode, a stack and a multi-layered spacer. The first electrode is disposed on and electrically connected to an interconnect wiring of the interconnect structure. The stack is disposed on the first electrode and comprises a phase-change layer disposed on the first electrode and a second electrode disposed on the phase-change layer. The multi-layered spacer covers the stack. A first portion of the multi-layered spacer covers a top surface of the stack, and a second portion of the multi-layered spacer covers a sidewall of the stack.
    Type: Application
    Filed: August 25, 2022
    Publication date: February 29, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Shao-Ming Yu, Yu-Chao Lin, Tung-Ying Lee
  • Patent number: 9977696
    Abstract: A technique, as well as select implementations thereof, pertaining to adaptive memory preparation is described. The technique may involve analyzing memory usage data of a plurality of child processes of a parent process. The technique may also involve determining whether a shared memory space is to be prepared by the parent process for use by at least a first child process based at least in part on the analyzing.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: May 22, 2018
    Assignee: MEDIATEK INC.
    Inventors: Tsung-Chieh Huang, Wen-Hung Su, Tung-Ying Lin
  • Publication number: 20170162826
    Abstract: A composite barrier layer including at least one first barrier layer and at least one second barrier layer disposed in a stacking manner is provided. The Si—O—Si linear bond ratio is higher than the Si—O—Si network bond ratio in the first barrier layer. The Si—O—Si network bond ratio is higher than the Si—O—Si linear bond ratio in the second barrier layer.
    Type: Application
    Filed: September 19, 2016
    Publication date: June 8, 2017
    Applicant: Industrial Technology Research Institute
    Inventors: Tung-Ying Lin, Kun-Wei Lin
  • Publication number: 20160239236
    Abstract: A technique, as well as select implementations thereof, pertaining to adaptive memory preparation is described. The technique may involve analyzing memory usage data of a plurality of child processes of a parent process. The technique may also involve determining whether a shared memory space is to be prepared by the parent process for use by at least a first child process based at least in part on the analyzing.
    Type: Application
    Filed: April 26, 2016
    Publication date: August 18, 2016
    Inventors: Tsung-Chieh Huang, Wen-Hung Su, Tung-Ying Lin
  • Patent number: 8604696
    Abstract: A plasma excitation module including a chamber, a plurality of coils and a multi-duct gas intake system is provided. The chamber has a dielectric layer. The coils are disposed at an outer side of the dielectric layer, and the coils are separated from each other by an interval and in parallel connection. The multi-duct gas intake system surrounds the dielectric layer and is communicated with the chamber.
    Type: Grant
    Filed: June 16, 2009
    Date of Patent: December 10, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Tung-Ying Lin, Ming-Hsien Ko, Hui-Ta Chen, Chun-Hao Chang
  • Patent number: 8235002
    Abstract: A plasma assisted apparatus for organic film deposition, comprising: a plasma chamber, capable of thermally cracking a precursor in the plasma chamber; and a deposition chamber, being channeled with the plasma chamber for receiving the thermally cracked precursor. In an exemplary embodiment, the deposition chamber further comprises a substrate device, being provided for the thermally cracked precursor to deposit thereon to form an organic film. As the plasma chamber is separated from the deposition chamber in the aforesaid apparatus, a low-temperature film deposition process can be used for forming organic films while preventing the substrate device from being bombarded directly by plasma. In addition, as there is a flow guiding device arranged at the outlet of the plasma chamber, the thermally cracked precursor is guided or disturbed and thus is prevented from overly concentrating at the outlet or the center of the substrate device.
    Type: Grant
    Filed: March 11, 2008
    Date of Patent: August 7, 2012
    Assignee: Industrial Technology Research Institute
    Inventors: Guo-Shing Huang, Tung-Ying Lin, Chun-Hao Chang, Herrison Wang, Teng-Yen Wabg
  • Publication number: 20120145325
    Abstract: A plasma apparatus including a chamber, an electrode set and a gas supplying tube set is provided. The chamber has a supporting table for supporting a substrate. The gas supplying tube set is disposed in the chamber and has a plurality of gas apertures. The gas supplying tube set is located between the supporting table and the electrode set.
    Type: Application
    Filed: March 10, 2011
    Publication date: June 14, 2012
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Hui-Ta Chen, Chun-Hao Chang, Tung-Ying Lin, Ming-Hsien Ko
  • Publication number: 20100156300
    Abstract: A plasma excitation module including a chamber, a plurality of coils and a multi-duct gas intake system is provided. The chamber has a dielectric layer. The coils are disposed at an outer side of the dielectric layer, and the coils are separated from each other by an interval and in parallel connection. The multi-duct gas intake system surrounds the dielectric layer and is communicated with the chamber.
    Type: Application
    Filed: June 16, 2009
    Publication date: June 24, 2010
    Applicant: Industrial Technology Research Institute
    Inventors: Tung-Ying Lin, Ming-Hsien Ko, Hui-Ta Chen, Chun-Hao Chang
  • Publication number: 20090133622
    Abstract: A plasma assisted apparatus for organic film deposition, comprising: a plasma chamber, capable of thermally cracking a precursor in the plasma chamber; and a deposition chamber, being channeled with the plasma chamber for receiving the thermally cracked precursor. In an exemplary embodiment, the deposition chamber further comprises a substrate device, being provided for the thermally cracked precursor to deposit thereon to form an organic film. As the plasma chamber is separated from the deposition chamber in the aforesaid apparatus, a low-temperature film deposition process can be used for forming organic films while preventing the substrate device from being bombarded directly by plasma. In addition, as there is a flow guiding device arranged at the outlet of the plasma chamber, the thermally cracked precursor is guided or disturbed and thus is prevented from overly concentrating at the outlet or the center of the substrate device.
    Type: Application
    Filed: March 11, 2008
    Publication date: May 28, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: GUO-SHING HUANG, TUNG-YING LIN, CHUN-HAO CHANG, HERRISON WANG, TENG-YEN WANG
  • Patent number: 6752289
    Abstract: A lottery ticket machine includes a base frame, a face panel fixedly fastened to the base frame at a front side, the face panel having a transversely extended ticket slot, a rack fastened to the base frame to hold a serrated plate behind the ticket slot of the face panel, a locating plate fixedly fastened to one lateral side of the base frame, a transverse rod fastened to the locating plate and suspended above the base frame, a pressure plate pivoted to the base frame and adapted to hold down a continuous sheet of lottery tickets being passed from the transverse rod to the ticket slot of the face panel, a control circuit assembly installed in the base frame and controlled to transfer a continuous sheet of lottery tickets from a ticket reel at the transverse rod toward the ticket slot of the face panel, the serrated plate having a serrated edge of substantially M-shaped profile extended along one long side thereof and suspended above the topmost edge of the rack and two protruded portions integral with the ser
    Type: Grant
    Filed: October 26, 2000
    Date of Patent: June 22, 2004
    Assignee: Gamemax Corporation
    Inventor: Tung-Ying Lin
  • Patent number: 6375185
    Abstract: A paper currency receiving control assembly for currency-coin exchanging machine is constructed to include a paper currency receiving unit adapted to receive paper money, a paper currency delivery unit adapted to delivery paper money to the paper currency receiving unit, and a control unit adapted to control the operation of the paper currency delivery unit, the control unit having a control circuit board adapted to control the operation of the paper currency delivery unit, a first solenoid switch adapted to turn on the control circuit board, a second solenoid switch adapted to turn off the control circuit board, a fixed magnetic member, which drives the first solenoid switch to turn on the control circuit board, and movable magnetic member, which drives the second solenoid switch to turn off the control circuit board when the received amount of paper currency reaches the set range.
    Type: Grant
    Filed: October 20, 2000
    Date of Patent: April 23, 2002
    Assignee: Gamemax Corporation
    Inventor: Tung-Ying Lin