Abstract: An example of a flow cell includes a substrate having an active region that is directly adjacent to an inactive region. The active region includes a hydrophilic material disposed within a plurality of first depressions that are separated by first interstitial regions. The inactive region includes a fluidic pinning region that is directly adjacent to the active region. The inactive region further includes a plurality of second depressions that are separated by second interstitial regions, wherein at least some of the plurality of second depressions are directly adjacent to the fluidic pinning region. The inactive region still further includes a hydrophobic barrier positioned over at least the plurality of second depressions. The hydrophobic barrier includes a hydrophobic polymer.

Abstract: In a method of preparing a flow cell, a slot die coater is used to introduce a nanoparticle suspension at a continuous flow rate to a substrate surface including depressions separated by interstitial regions, which generates a layer of the nanoparticle suspension at a stable concentration across the substrate surface. During the introduction of the nanoparticle suspension, at least some functionalized nanoparticles within the layer respectively enter at least some of the depressions. An excess amount of the layer is removed from the interstitial regions.

Abstract: A flow cell includes a substrate that has both an active region and an inactive region. The active region is defined in a portion of the substrate, and includes: a plurality of first depressions defined in the portion of the substrate; and surface chemistry positioned in the plurality of first depressions. The inactive region is defined in another portion of the substrate that is adjacent to the active region, and the inactive region includes: at least one row of second depressions defined in the substrate; and an unpatterned fluidic pinning region positioned between the at least one row and an edge of the active region. The unpatterned fluidic pinning region has a predetermined width.

Abstract: The present disclosure relates to methods, systems and compositions directed to unspooling a substrate from a source coil and polishing a surface of the substrate, wherein before the polishing, the substrate includes depressions separated by interstices and a coating including a hydrogel disposed on the depressions and the interstices, and the polishing includes applying a slurry to the surface of the substrate and removing the hydrogel from the interstices but not the depressions by contacting the surface of the substrate with one or more polisher and introducing relative movement between the one or more polisher and the surface.

Abstract: A chemical analyte sensor. The sensor has a monolayer of shaped nanostructures, a metal or metallized surface, and analyte confined between the monolayer of shaped nanostructures and the metal or metallized surface. The analyte is confined in the highly absorbing optical cavity of the metasurface defined at the metal or metallized surface.

Abstract: A chemical analyte sensor. The sensor has a monolayer of shaped nanostructures, a metal or metallized surface, and analyte confined between the monolayer of shaped nanostructures and the metal or metallized surface. The analyte is confined in the highly absorbing optical cavity of the metasurface defined at the metal or metallized surface.