Abstract: An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.

Abstract: Described are filter products and methods of using filter products, wherein the filter products include multiple cells, each cell containing an individual circulating fluidized beds during use.

Abstract: An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.

Abstract: Described are filter products and methods of using filter products, wherein the filter products include multiple cells, each cell containing an individual circulating fluidized beds during use.

Abstract: Described herein are liquid-free traps for trace levels of an acidic or basic airborne molecular contaminant in a gas. In one version of the invention described herein, the liquid-free trap comprises a housing, comprising an inlet and an outlet; a flow path between the inlet and the outlet; and a rigid sintered hydrophilic material situated in the flow path between the inlet and the outlet and sealed in the housing. The rigid sintered hydrophilic material is functionalized with from about 0.05 molar milliequivalents to about 10 molar milliequivalents of a basic species for trapping an acidic airborne molecular contaminant in the gas or from about 0.05 molar milliequivalents to about 10 molar milliequivalents of an acidic species for trapping a basic airborne molecular contaminant in the gas. Methods of using the liquid-free traps to detect or measure trace levels of an acidic or basic airborne molecular contaminant are also described.

Abstract: Described herein are liquid-free traps for trace levels of an acidic or basic airborne molecular contaminant in a gas. In one version of the invention described herein, the liquid-free trap comprises a housing, comprising an inlet and an outlet; a flow path between the inlet and the outlet; and a rigid sintered hydrophilic material situated in the flow path between the inlet and the outlet and sealed in the housing. The rigid sintered hydrophilic material is functionalized with from about 0.05 molar milliequivalents to about 10 molar milliequivalents of a basic species for trapping an acidic airborne molecular contaminant in the gas or from about 0.05 molar milliequivalents to about 10 molar milliequivalents of an acidic species for trapping a basic airborne molecular contaminant in the gas. Methods of using the liquid-free traps to detect or measure trace levels of an acidic or basic airborne molecular contaminant are also described.