Abstract: A method for manufacturing an integrated circuit includes patterning a plurality of photomask layers over a substrate, partially backfilling the patterned plurality of photomask layers with a first material using atomic layer deposition, completely backfilling the patterned plurality of photomask layers with a second material using atomic layer deposition, removing the plurality of photomask layers to form a masking structure comprising at least one of the first and second materials, and transferring a pattern formed by the masking structure to the substrate and removing the masking structure. The first material includes a silicon dioxide, silicon carbide, or carbon material, and the second material includes a metal oxide or metal nitride material.

Abstract: The automatic workflow application program generator of this invention automatically generates workflow definition files to be executed in the computer system by including organization and role definition information, activity definition information and data entity information input by user. Users may input definitions and cite definitions of workflow, organization/role, activities and data entit in to complete development of workflow application programs. In the present invention, steps in inputting the related definition files may be conducted in sequential, parallel or alternative manners, selectively by the user. The present invention also provides method for generation of workflow application programs using the invented program generator.