Patents by Inventor Tzong Tsong Miau

Tzong Tsong Miau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Charged particle guide
    Patent number: 7135678
    Abstract: A charged particle guide adapted to be coupled with a charged particle detector, such as a secondary electron detector. The charged particle guide, in one example, comprising two wires extending from the charged particle detector toward a source of charged particles, such as secondary electrons emitted from an IC upon application of a focused ion beam. Upon application of a bias voltage, the charged particle guide introduces a collecting electric field that attracts charged particles and directs the charged particles to the charged particles detector.
    Type: Grant
    Filed: July 9, 2004
    Date of Patent: November 14, 2006
    Assignee: Credence Systems Corporation
    Inventors: Qinsong Steve Wang, Tzong Tsong Miau, Theodore R. Lundquist
  • Process for charged particle beam micro-machining of copper
    Patent number: 6824655
    Abstract: A micro-machining process that includes etching a substrate having copper overlying a dielectric layer to a charged particle beam in the presence of an etch assisting agent. The etch assisting agent is selected from the group consisting of ammonia, acetic acid, thiolacetic acid, and combinations thereof.
    Type: Grant
    Filed: August 26, 2002
    Date of Patent: November 30, 2004
    Assignee: Credence Systems Corporation
    Inventors: Vladimir V. Makarov, Javier Fernandez Ruiz, Tzong-Tsong Miau
  • Process for charged particle beam micro-machining of copper
    Publication number: 20030038113
    Abstract: A micro-machining process that includes etching a substrate having copper overlying a dielectric layer to a charged particle beam in the presence of an etch assisting agent. The etch assisting agent is selected from the group consisting of ammonia, acetic acid, thiolacetic acid, and combinations thereof.
    Type: Application
    Filed: August 26, 2002
    Publication date: February 27, 2003
    Inventors: Vladimir V. Makarov, Javier Fernandez Ruiz, Tzong-Tsong Miau