Patents by Inventor Tzu-Cheng Chen

Tzu-Cheng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11938405
    Abstract: An electronic device and a method for detecting abnormal device operation are provided. The method includes: obtaining multiple action events of a movable input device, and each action event including a relative coordinate and a time stamp of the movable input device; generating multiple absolute coordinates based on the relative coordinate of each action event; estimating multiple speed vectors based on the absolute coordinates and the time stamp of each action event; estimating multiple acceleration vectors based on the speed vectors and the time stamp of each action event; and estimating a probability of abnormal operation based on the speed vectors and the acceleration vectors.
    Type: Grant
    Filed: November 8, 2022
    Date of Patent: March 26, 2024
    Assignee: Acer Incorporated
    Inventors: Tien-Yi Chi, Wei-Chieh Chen, Shih-Cheng Huang, Tzu-Lung Chuang
  • Publication number: 20240065438
    Abstract: A slide rail assembly is provided and includes a first rail, a second rail movable with respect to the first rail, a working member, an operating member and a blocking member. When the second rail is located at an extended position with respect to the first rail and the working member is in a first state, the working member and a blocking feature of the first rail block each other for restraining the second rail from moving toward a first predetermined direction from the extended position. The blocking member is switchable between a blocking state and a non-blocking state for restraining the operating member from driving the working member to disengage from the first state or for allowing the operating member to drive the working member from the first state to a second state. Besides, a related slide rail kit is also provided.
    Type: Application
    Filed: December 19, 2022
    Publication date: February 29, 2024
    Applicants: KING SLIDE WORKS CO., LTD., KING SLIDE TECHNOLOGY CO.,LTD.
    Inventors: Ken-Ching Chen, Shun-Ho Yang, Tzu-Cheng Weng, Chun-Chiang Wang
  • Publication number: 20240068516
    Abstract: A slide rail assembly includes a first rail, a second rail, a slide assisting device, an elastic member and a working member. The second rail and the first rail are movable relative to each other. The elastic member is arranged on the second rail. During a process of the second rail being moved relative to the first rail along an opening direction, the working member is configured to contact the elastic member in an initial state in order to drive the slide assisting device to move along the opening direction to a predetermined position. When the slide assisting device is located at the predetermined position, the elastic member releases an elastic force through a predetermined space of the first rail, such that the elastic member is no longer in the initial state with the working member no longer contacting the elastic member.
    Type: Application
    Filed: January 11, 2023
    Publication date: February 29, 2024
    Inventors: Ken-Ching Chen, Shun-Ho Yang, Tzu-Cheng Weng, Chun-Chiang Wang
  • Patent number: 8975153
    Abstract: A method for forming a semiconductor device includes forming a hard mask layer over a substrate comprising a semiconductor material of a first conductivity type, and forming a plurality of trenches in the hard mask layer and extending into the substrate. Each trench has at least one side wall and a bottom wall. The method further includes forming at least one barrier insulator layer along the at least one side wall and over the bottom wall of each trench, removing the at least one barrier insulator layer over the bottom wall of each trench, and filling the plurality of trenches with a semiconductor material of a second conductivity type.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: March 10, 2015
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tai-I Yang, Hong-Seng Shue, Kun-Ming Huang, Tzu-Cheng Chen, Ming-Che Yang, Po-Tao Chu
  • Publication number: 20140264559
    Abstract: A method for forming a semiconductor device includes forming a hard mask layer over a substrate comprising a semiconductor material of a first conductivity type, and forming a plurality of trenches in the hard mask layer and extending into the substrate. Each trench has at least one side wall and a bottom wall. The method further includes forming at least one barrier insulator layer along the at least one side wall and over the bottom wall of each trench, removing the at least one barrier insulator layer over the bottom wall of each trench, and filling the plurality of trenches with a semiconductor material of a second conductivity type.
    Type: Application
    Filed: April 19, 2013
    Publication date: September 18, 2014
    Inventors: Tai-I Yang, Hong-Seng Shue, Kun-Ming Huang, Tzu-Cheng Chen, Ming-Che Yang, Po-Tao Chu