Abstract: The present invention provides a use of platelet dry powder (PDP) for relieving inflammation or injury in an airway portion, wherein per gram of platelet dry powder (PDP) comprises at least 100,000 platelets.

Abstract: The present invention provides a use of platelet dry powder (PDP) for relieving inflammation or injury in an airway portion, wherein per gram of platelet dry powder (PDP) comprises at least 100,000 platelets.

Abstract: A management nodal point of a wireless sensor network (WSN) receives a plurality of tasks and stores the tasks in a buffer. Each of the tasks would be assigned to and executed by a corresponding one of execution nodal points of the WSN. The management nodal point records a status of each execution nodal point as an executable status or a non-executable status. Before the management nodal point assigns a first task, the management nodal point obtains the status of a first execution nodal point corresponding to the first task. If the first execution nodal point is at the executable status, the management nodal point assigns the first task to the first execution nodal point according to a predetermined rule.

Abstract: A management nodal point of a wireless sensor network (WSN) receives a plurality of tasks and stores the tasks in a buffer. Each of the tasks would be assigned to and executed by a corresponding one of execution nodal points of the WSN. The management nodal point records a status of each execution nodal point as an executable status or a non-executable status. Before the management nodal point assigns a first task, the management nodal point obtains the status of a first execution nodal point corresponding to the first task. If the first execution nodal point is at the executable status, the management nodal point assigns the first task to the first execution nodal point according to a predetermined rule.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.