Patents by Inventor Tzu-Min Yang

Tzu-Min Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12059495
    Abstract: The present invention provides a use of platelet dry powder (PDP) for relieving inflammation or injury in an airway portion, wherein per gram of platelet dry powder (PDP) comprises at least 100,000 platelets.
    Type: Grant
    Filed: June 16, 2022
    Date of Patent: August 13, 2024
    Assignees: SPIRIT SCIENTIFIC CO. LTD.
    Inventors: Chin-Ho Chen, Yi-Shin Tsai, Tzu-Min Yang, Dao Lung Steven Lin
  • Publication number: 20220401359
    Abstract: The present invention provides a use of platelet dry powder (PDP) for relieving inflammation or injury in an airway portion, wherein per gram of platelet dry powder (PDP) comprises at least 100,000 platelets.
    Type: Application
    Filed: June 16, 2022
    Publication date: December 22, 2022
    Applicants: Spirit Scientific Co. LTD.
    Inventors: Chin-Ho Chen, Yi-Shin Tsai, Tzu-Min Yang, Dao Lung Steven Lin
  • Patent number: 10841877
    Abstract: A management nodal point of a wireless sensor network (WSN) receives a plurality of tasks and stores the tasks in a buffer. Each of the tasks would be assigned to and executed by a corresponding one of execution nodal points of the WSN. The management nodal point records a status of each execution nodal point as an executable status or a non-executable status. Before the management nodal point assigns a first task, the management nodal point obtains the status of a first execution nodal point corresponding to the first task. If the first execution nodal point is at the executable status, the management nodal point assigns the first task to the first execution nodal point according to a predetermined rule.
    Type: Grant
    Filed: October 1, 2018
    Date of Patent: November 17, 2020
    Assignee: PEGATRON CORPORATION
    Inventors: Bo-Rong Chen, Tzu-Min Yang, Wen-Pin Li
  • Publication number: 20190166554
    Abstract: A management nodal point of a wireless sensor network (WSN) receives a plurality of tasks and stores the tasks in a buffer. Each of the tasks would be assigned to and executed by a corresponding one of execution nodal points of the WSN. The management nodal point records a status of each execution nodal point as an executable status or a non-executable status. Before the management nodal point assigns a first task, the management nodal point obtains the status of a first execution nodal point corresponding to the first task. If the first execution nodal point is at the executable status, the management nodal point assigns the first task to the first execution nodal point according to a predetermined rule.
    Type: Application
    Filed: October 1, 2018
    Publication date: May 30, 2019
    Inventors: Bo-Rong Chen, Tzu-Min Yang, Wen-Pin Li
  • Patent number: 9341950
    Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: May 17, 2016
    Assignee: Au Optronics Corporation
    Inventors: Hsiang-Chih Hsiao, Ta-Wen Liao, Tzu-Min Yang, Shan-Fang Chen, Ya-Ping Chang, Chi-Hung Yang, Chung-Yuan Liao
  • Publication number: 20150253672
    Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
    Type: Application
    Filed: May 27, 2015
    Publication date: September 10, 2015
    Inventors: Hsiang-Chih Hsiao, Ta-Wen Liao, Tzu-Min Yang, Shan-Fang Chen, Ya-Ping Chang, Chi-Hung Yang, Chung-Yuan Liao
  • Patent number: 9122162
    Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: September 1, 2015
    Assignee: Au Optronics Corporation
    Inventors: Hsiang-Chih Hsiao, Ta-Wen Liao, Tzu-Min Yang, Shan-Fang Chen, Ya-Ping Chang, Chi-Hung Yang, Chung-Yuan Liao
  • Publication number: 20130235316
    Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
    Type: Application
    Filed: March 15, 2013
    Publication date: September 12, 2013
    Applicant: AU OPTRONICS CORPORATION
    Inventors: Hsiang-Chih Hsiao, Ta-Wen Liao, Tzu-Min Yang, Shan-Fang Chen, Ya-Ping Chang, Chi-Hung Yang, Chung-Yuan Liao