Abstract: A semiconductor device includes a source/drain feature over a semiconductor substrate, channel layers over the semiconductor substrate and connected to the source/drain feature, a gate portion between vertically adjacent channel layers, and an inner spacer between the source/drain feature and the gate portion and between adjacent channel layers. The semiconductor device further includes an air gap between the inner spacer and the source/drain feature.

Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.

Abstract: A fabric feature predicting method includes following operations: measuring multiple first fabrics to generate multiple first fabric actual feature value groups; storing the first fabric actual feature value groups and multiple first fabric information groups of the first fabrics; selecting multiple third fabrics from the first fabrics according to a second fabric information group of a second fabric; generating at least one equation according to multiple third fabric actual feature value groups of the third fabrics and multiple third fabric information groups of the third fabrics; generating a second fabric predicted feature value group of the second fabric according to the at least one equation and the second fabric information group. The first fabric actual feature value groups include the third fabric actual feature value groups. The first fabric information groups include the third fabric information groups.

Abstract: A method of forming low-k material is provided. The method includes providing a plurality of core-shell particles. The core of the core-shell particles has a first ceramic with a low melting point. The shell of the core-shell particles has a second ceramic with a low melting point and a low dielectric constant. The core-shell particles are sintered and molded to form a low-k material. The shell of the core-shell particles is connected to form a network structure of a microcrystal phase.

Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.

Abstract: A semiconductor device includes a source/drain feature over a semiconductor substrate, channel layers over the semiconductor substrate and connected to the source/drain feature, a gate portion between vertically adjacent channel layers, and an inner spacer between the source/drain feature and the gate portion and between adjacent channel layers. The semiconductor device further includes an air gap between the inner spacer and the source/drain feature.

Abstract: A method of predicting fabric features is disclosed herein, and the method includes following operations. Inputting first fabric information of a first fabric. Generating first fabric feature values of the first fabric. Performing a first calculation on the first fabric information and the first fabric feature values. Generating feature parameters and first predicted feature values of the first fabric by the first calculation. Inputting second fabric information of a second fabric. Generating second fabric feature values of the second fabric according to the second fabric information and the feature parameters. A system of predicting fabric features is also disclosed herein.