Patents by Inventor Tzu-Yu Lin

Tzu-Yu Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250048645
    Abstract: In some embodiments, the present disclosure relates to a memory device including a semiconductor substrate, a first electrode disposed over the semiconductor substrate, a ferroelectric layer disposed between the first electrode and the semiconductor substrate, and a first stressor layer separating the first electrode from the ferroelectric layer. The first stressor layer has a coefficient of thermal expansion greater than that of the ferroelectric layer.
    Type: Application
    Filed: October 23, 2024
    Publication date: February 6, 2025
    Inventors: Bi-Shen Lee, Tzu-Yu Lin, Yi-Yang Wei, Hai-Dang Trinh, Hsun-Chung Kuang, Cheng-Yuan Tsai
  • Publication number: 20250044668
    Abstract: A tripod-head structure includes a first clamping plate, a second clamping plate, a rotating base, a tightening element, and an adjustment component. The first clamping plate includes a first arc-shaped groove, and the second clamping plate includes a second arc-shaped groove. A portion of a slide rail of the rotating base is placed between the first arc-shaped groove and the second arc-shaped groove. The tightening element passes through the first clamping plate and the second clamping plate. The adjustment component is connected to the tightening element and switchable between an unlocked position and a locked position. In the unlocked position, the slide rail is slidable to adjust an angle of the rotating base. In the locked position, the tightening element presses the first clamping plate and the second clamping plate to tightly secure the slide rail for rapid adjustment of the angle of the rotating base.
    Type: Application
    Filed: July 31, 2023
    Publication date: February 6, 2025
    Inventors: Tzu-Yu LIN, Ching-Jung LAI, Yen-Ting LAI
  • Publication number: 20240404975
    Abstract: Various embodiments of the present disclosure are directed towards an integrated chip. The integrated chip includes an interconnect structure overlying a semiconductor substrate and comprising a conductive wire. A passivation structure overlies the interconnect structure. An upper conductive structure overlies the passivation structure and comprises a first conductive layer, a dielectric layer, and a second conductive layer. The first conductive layer is disposed between the dielectric layer and the passivation structure. The second conductive layer extends along a top surface of the dielectric layer and penetrates through the first conductive layer and the passivation structure to the conductive wire.
    Type: Application
    Filed: July 25, 2024
    Publication date: December 5, 2024
    Inventors: Tzu-Yu Lin, Yao-Wen Chang, Chia-Wen Zhong, Yen-Liang Lin
  • Patent number: 12160995
    Abstract: In some embodiments, the present disclosure relates to a memory device including a semiconductor substrate, a first electrode disposed over the semiconductor substrate, a ferroelectric layer disposed between the first electrode and the semiconductor substrate, and a first stressor layer separating the first electrode from the ferroelectric layer. The first stressor layer has a coefficient of thermal expansion greater than that of the ferroelectric layer.
    Type: Grant
    Filed: June 26, 2023
    Date of Patent: December 3, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Bi-Shen Lee, Tzu-Yu Lin, Yi-Yang Wei, Hai-Dang Trinh, Hsun-Chung Kuang, Cheng-Yuan Tsai
  • Publication number: 20240381664
    Abstract: Ferroelectric stacks are disclosed herein that can improve retention performance of ferroelectric memory devices. An exemplary ferroelectric stack has a ferroelectric switching layer (FSL) stack disposed between a first electrode and a second electrode. The ferroelectric stack includes a barrier layer disposed between a first FSL and a second FSL, where a first crystalline condition of the barrier layer is different than a second crystalline condition of the first FSL and/or the second FSL. In some embodiments, the first crystalline condition is an amorphous phase, and the second crystalline condition is an orthorhombic phase. In some embodiments, the first FSL and/or the second FSL include a first metal oxide, and the barrier layer includes a second metal oxide. The ferroelectric stack can be a ferroelectric capacitor, a portion of a transistor, and/or connected to a transistor in a ferroelectric memory device to provide data storage in a non-volatile manner.
    Type: Application
    Filed: July 25, 2024
    Publication date: November 14, 2024
    Inventors: Yi Yang WEI, Tzu-Yu LIN, Bi-Shen LEE, Hai-Dang TRINH, Hsing-Lien LIN, Hsun-Chung KUANG
  • Patent number: 12137572
    Abstract: Ferroelectric stacks are disclosed herein that can improve retention performance of ferroelectric memory devices. An exemplary ferroelectric stack has a ferroelectric switching layer (FSL) stack disposed between a first electrode and a second electrode. The ferroelectric stack includes a barrier layer disposed between a first FSL and a second FSL, where a first crystalline condition of the barrier layer is different than a second crystalline condition of the first FSL and/or the second FSL. In some embodiments, the first crystalline condition is an amorphous phase, and the second crystalline condition is an orthorhombic phase. In some embodiments, the first FSL and/or the second FSL include a first metal oxide, and the barrier layer includes a second metal oxide. The ferroelectric stack can be a ferroelectric capacitor, a portion of a transistor, and/or connected to a transistor in a ferroelectric memory device to provide data storage in a non-volatile manner.
    Type: Grant
    Filed: July 26, 2021
    Date of Patent: November 5, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yi Yang Wei, Tzu-Yu Lin, Bi-Shen Lee, Hai-Dang Trinh, Hsing-Lien Lin, Hsun-Chung Kuang
  • Publication number: 20240355358
    Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a lower electrode disposed within a dielectric structure over a substrate. A ferroelectric data storage structure is disposed over the lower electrode and an upper electrode is disposed over the ferroelectric data storage structure. One or more stressed sidewall spacers are arranged on opposing sides of the upper electrode. The ferroelectric data storage structure has an orthorhombic phase concentration that varies from directly below the one or more stressed sidewall spacers to laterally outside of the one or more stressed sidewall spacers.
    Type: Application
    Filed: July 3, 2024
    Publication date: October 24, 2024
    Inventors: Tzu-Yu Lin, Yao-Wen Chang
  • Patent number: 12119035
    Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a lower electrode disposed within a dielectric structure over a substrate. A ferroelectric data storage structure is disposed over the lower electrode and an upper electrode is disposed over the ferroelectric data storage structure. One or more stressed sidewall spacers are arranged on opposing sides of the upper electrode. The ferroelectric data storage structure has an orthorhombic phase concentration that varies from directly below the one or more stressed sidewall spacers to laterally outside of the one or more stressed sidewall spacers.
    Type: Grant
    Filed: January 5, 2023
    Date of Patent: October 15, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tzu-Yu Lin, Yao-Wen Chang
  • Publication number: 20240298555
    Abstract: A semiconductor device that includes a semiconductor substrate, a bottom electrode over the semiconductor substrate, a switching layer over the bottom electrode, a metal ion source layer over the switching layer, and a top electrode over the metal ion source layer. The switching layer includes a compound having aluminum, oxygen, and nitrogen.
    Type: Application
    Filed: March 2, 2023
    Publication date: September 5, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sheng-Siang Ruan, Chia-Wen Zhong, Tzu-Yu Lin, Yao-Wen Chang, Ching Ju Yang, Chin I Wang
  • Publication number: 20240191040
    Abstract: Synthetic amino acid-modified polymers and methods of making the same and using the same are disclosed. The synthetic amino acid-modified polymers possess distinct thermosensitive, improved water-erosion resistant, and enhanced mechanical properties, and are suitable of reducing or preventing formation of postoperative tissue adhesions. Additionally, the amino acid-modified polymers can also be used as a vector to deliver pharmaceutically active agents.
    Type: Application
    Filed: February 21, 2024
    Publication date: June 13, 2024
    Applicant: PROVIEW-MBD BIOTECH CO., LTD.
    Inventors: Yu-Chia CHANG, Yunn-Kuen CHANG, Wen-Yen HUANG, Ging-Ho HSIUE, Hsieh-Chih TSAI, Shuian-Yin LIN, Nai-Sheng HSU, Tzu-Yu LIN
  • Patent number: 11973050
    Abstract: Various embodiments of the present disclosure are directed towards an integrated chip. The integrated chip includes an interconnect structure overlying a semiconductor substrate and comprising a conductive wire. A passivation structure overlies the interconnect structure. An upper conductive structure overlies the passivation structure and comprises a first conductive layer, a dielectric layer, and a second conductive layer. The first conductive layer is disposed between the dielectric layer and the passivation structure. The second conductive layer extends along a top surface of the dielectric layer and penetrates through the first conductive layer and the passivation structure to the conductive wire.
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: April 30, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Tzu-Yu Lin, Yao-Wen Chang, Chia-Wen Zhong, Yen-Liang Lin
  • Patent number: 11939432
    Abstract: Synthetic amino acid-modified polymers and methods of making the same and using the same are disclosed. The synthetic amino acid-modified polymers possess distinct thermosensitive, improved water-erosion resistant, and enhanced mechanical properties, and are suitable of reducing or preventing formation of postoperative tissue adhesions. Additionally, the amino acid-modified polymers can also be used as a vector to deliver pharmaceutically active agents.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: March 26, 2024
    Assignee: PROVIEW-MBD BIOTECH CO., LTD.
    Inventors: Yu-Chia Chang, Yunn-Kuen Chang, Wen-Yen Huang, Ging-Ho Hsiue, Hsieh-Chih Tsai, Shuian-Yin Lin, Nai-Sheng Hsu, Tzu-Yu Lin
  • Patent number: 11939431
    Abstract: The present invention relates to a composition comprising an amino acid-modified polymer, a carboxypolysaccharide, and may further include a metal ion for anti-adhesion and vector application. More specifically, the invention relates to a thermosensitive composition having enhanced mechanical and improved water-erosion resistant properties for efficiently preventing tissue adhesions and can serve as a vector with bio-compatible, bio-degradable/absorbable, and in-vivo sustainable properties.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: March 26, 2024
    Assignee: PROVIEW-MBD BIOTECH CO., LTD.
    Inventors: Yu-Chia Chang, Yunn-Kuen Chang, Wen-Yen Huang, Ging-Ho Hsiue, Hsieh-Chih Tsai, Shuian-Yin Lin, Nai-Sheng Hsu, Tzu-Yu Lin
  • Publication number: 20240071813
    Abstract: A dielectric structure is formed over a layer than contains a conductive component. An opening is formed in the dielectric structure. The opening exposes an upper surface of the conductive component. A first deposition process is performed that deposits a first conductive layer over the dielectric structure and partially in the opening. A treatment process is performed on a first portion of the first conductive layer formed over the dielectric structure. The treatment process introduces a non-metal material to the first portion of the first conductive layer. After the treatment process has been performed, a second deposition process is performed that at least partially fills the opening with a second conductive layer without trapping a gap therein.
    Type: Application
    Filed: August 25, 2022
    Publication date: February 29, 2024
    Inventors: Tzu-Yu Lin, Yao-Wen Chang
  • Publication number: 20240038265
    Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a lower electrode disposed within a dielectric structure over a substrate. A ferroelectric data storage structure is disposed over the lower electrode and an upper electrode is disposed over the ferroelectric data storage structure. One or more stressed sidewall spacers are arranged on opposing sides of the upper electrode. The ferroelectric data storage structure has an orthorhombic phase concentration that varies from directly below the one or more stressed sidewall spacers to laterally outside of the one or more stressed sidewall spacers.
    Type: Application
    Filed: January 5, 2023
    Publication date: February 1, 2024
    Inventors: Tzu-Yu Lin, Yao-Wen Chang
  • Publication number: 20240021561
    Abstract: Various embodiments of the present disclosure are directed towards an integrated chip. The integrated chip includes an interconnect structure overlying a semiconductor substrate and comprising a conductive wire. A passivation structure overlies the interconnect structure. An upper conductive structure overlies the passivation structure and comprises a first conductive layer, a dielectric layer, and a second conductive layer. The first conductive layer is disposed between the dielectric layer and the passivation structure. The second conductive layer extends along a top surface of the dielectric layer and penetrates through the first conductive layer and the passivation structure to the conductive wire.
    Type: Application
    Filed: August 9, 2023
    Publication date: January 18, 2024
    Inventors: Tzu-Yu Lin, Yao-Wen Chang, Chia-Wen Zhong, Yen-Liang Lin
  • Publication number: 20230365130
    Abstract: A rear approaching vehicle detecting and warning device comprises a detecting device installed at an appropriate position behind a motorbike body, a signal processing module, and a riding safety component capable of being assembled on handlebars of the motorbike. The detecting device is provided with a sensing module, a control circuit, and a signal transmitting module. The sensing module senses a vehicle approaching around to generate a detection signal. The signal transmitting module receives the detection signal through the control circuit and then transmits the detection signal. The signal processing module is used for receiving and processing the detection signal transmitted by the signal transmitting module to generate a warning signal. The riding safety component is provided with a light module and electrically connected to the signal processing module. The riding safety component is used for receiving the warning signal to display on the light module.
    Type: Application
    Filed: May 13, 2022
    Publication date: November 16, 2023
    Inventors: FENG-CHENG CHEN, CHENG-HSIUNG LU, CHIA-SHENG SUNG, CHAO-HUANG CHEN, TZU-YU LIN, YI-CHIEH CHANG
  • Publication number: 20230363178
    Abstract: 1. Various embodiments of the present disclosure are directed towards a ferroelectric random-access memory (FeRAM) cell or some other suitable type of memory cell comprising a bottom-electrode interface structure. The memory cell further comprises a bottom electrode, a switching layer over the bottom electrode, and a top electrode over the switching layer. The bottom-electrode interface structure separates the bottom electrode and the switching layer from each other. Further, the interface structure is dielectric and is configured to block or otherwise resist metal atoms and/or impurities in the bottom electrode from diffusing to the switching layer. By blocking or otherwise resisting such diffusion, leakage current may be decreased. Further, endurance of the memory cell may be increased.
    Type: Application
    Filed: July 18, 2023
    Publication date: November 9, 2023
    Inventors: Tzu-Yu Lin, Chia-Wen Zhong, Yao-Wen Chang
  • Publication number: 20230354613
    Abstract: In some embodiments, the present disclosure relates to a memory device including a semiconductor substrate, a first electrode disposed over the semiconductor substrate, a ferroelectric layer disposed between the first electrode and the semiconductor substrate, and a first stressor layer separating the first electrode from the ferroelectric layer. The first stressor layer has a coefficient of thermal expansion greater than that of the ferroelectric layer.
    Type: Application
    Filed: June 26, 2023
    Publication date: November 2, 2023
    Inventors: Bi-Shen Lee, Tzu-Yu Lin, Yi-Yang Wei, Hai-Dang Trinh, Hsun-Chung Kuang, Cheng-Yuan Tsai
  • Publication number: 20230343218
    Abstract: A blind spot detecting and warning device suitable for two-wheeled mobile device comprises a detecting device installed at a first position behind a user and a warning device installed at a second position that is in front of the user and can be seen by the user. The detecting device is provided with a sensing module, a control circuit and a signal transmitting module. When the sensing module senses a vehicle is approaching around, the sensing module generates a detection signal. The signal transmitting module receives the detection signal through the control circuit and then transmits the detection signal. The warning device is provided with a signal processing module and a warning module, wherein the signal processing module is used for receiving the detection signal transmitted by the signal transmitting module, and the detection signal drives the warning module to generate a warning.
    Type: Application
    Filed: April 25, 2022
    Publication date: October 26, 2023
    Inventors: FENG-CHENG CHEN, CHENG-HSIUNG LU, CHIA-SHENG SUNG, CHAO-HUANG CHEN, TZU-YU LIN, YI-CHIEH CHANG