Patents by Inventor Tzu-Yu Liu
Tzu-Yu Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240103378Abstract: The present disclosure provides an extreme ultraviolet (EUV) lithography system including a radiation source and an EUV control system integrated with the radiation source. The EUV control system includes a 3-dimensional diagnostic module (3DDM) designed to collect a laser beam profile of a laser beam from the radiation source in a 3-dimensional (3D) mode, an analysis module designed to analyze the laser beam profile, a database designed to store the laser beam profile, and an EUV control module designed to adjust the radiation source. The analysis module is coupled with the database and the EUV control module. The database is coupled with the 3DDM and the analysis module. The EUV control module is coupled with the analysis module and the radiation source.Type: ApplicationFiled: November 30, 2023Publication date: March 28, 2024Inventors: Tai-Yu CHEN, Tzu-Jung PAN, Kuan-Hung CHEN, Sheng-Kang YU, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
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Patent number: 11939268Abstract: A method of forming low-k material is provided. The method includes providing a plurality of core-shell particles. The core of the core-shell particles has a first ceramic with a low melting point. The shell of the core-shell particles has a second ceramic with a low melting point and a low dielectric constant. The core-shell particles are sintered and molded to form a low-k material. The shell of the core-shell particles is connected to form a network structure of a microcrystal phase.Type: GrantFiled: December 23, 2020Date of Patent: March 26, 2024Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Kuo-Chuang Chiu, Tzu-Yu Liu, Tien-Heng Huang, Tzu-Chi Chou, Cheng-Ting Lin
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Publication number: 20240087945Abstract: Semiconductor processing apparatuses and methods are provided in which an electrostatic discharge (ESD) prevention layer is utilized to prevent or reduce ESD events from occurring between a semiconductor wafer and one or more components of the apparatuses. In some embodiments, a semiconductor processing apparatus includes a wafer handling structure that is configured to support a semiconductor wafer during processing of the semiconductor wafer. The apparatus further includes an ESD prevention layer on the wafer handling structure. The ESD prevention layer includes a first material and a second material, and the second material has an electrical conductivity that is greater than an electrical conductivity of the first material.Type: ApplicationFiled: November 21, 2023Publication date: March 14, 2024Inventors: Tsai-Hao HUNG, Ping-Cheng KO, Tzu-Yang LIN, Fang-Yu LIU, Cheng-Han WU
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Publication number: 20240087932Abstract: An apparatus having a first portion including a first front wall, a first rear wall, and a bottom wall integrally coupled to the first front wall and the first rear wall, and pivotal pin structures integrally coupled to and extending from the first rear wall. The apparatus includes a second portion having a second front wall, a second rear wall, and a top wall integrally coupled to the second front wall and the second rear wall, and pin holders integrally coupled to and extending from the second rear wall and at an offset angle with reference to the top wall. The pivotal pin structure includes a base support connected to the first rear wall and a shaft connected to the base support, and the pin holder defines an opening sized and shaped to accept the shaft. The first and second portions are sized and shaped to be pivotally movable between open and closed configurations.Type: ApplicationFiled: November 20, 2023Publication date: March 14, 2024Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tzu-Chung TSAI, Ping-Cheng KO, Fang-yu LIU, Jhih-Yuan YANG
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Patent number: 11923409Abstract: A semiconductor device includes a source/drain feature over a semiconductor substrate, channel layers over the semiconductor substrate and connected to the source/drain feature, a gate portion between vertically adjacent channel layers, and an inner spacer between the source/drain feature and the gate portion and between adjacent channel layers. The semiconductor device further includes an air gap between the inner spacer and the source/drain feature.Type: GrantFiled: August 5, 2021Date of Patent: March 5, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Po-Yu Lin, Wei-Yang Lee, Chia-Pin Lin, Tzu-Hua Chiu, Kuan-Hao Cheng, Wei-Han Fan, Li-Li Su, Wei-Min Liu
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Patent number: 11847532Abstract: Systems and methods that analyze blood-based cancer diagnostic tests using multiple classes of molecules are described. The system uses machine learning (ML) to analyze multiple analytes, for example cell-free DNA, cell-free microRNA, and circulating proteins, from a biological sample. The system can use multiple assays, e.g., whole-genome sequencing, whole-genome bisulfite sequencing or EM-seq, small-RNA sequencing, and quantitative immunoassay. This can increase the sensitivity and specificity of diagnostics by exploiting independent information between signals. During operation, the system receives a biological sample, and separates a plurality of molecule classes from the sample. For a plurality of assays, the system identifies feature sets to input to a machine learning model. The system performs an assay on each molecule class and forms a feature vector from the measured values.Type: GrantFiled: February 11, 2021Date of Patent: December 19, 2023Assignee: Freenome Holdings, Inc.Inventors: Adam Drake, Daniel Delubac, Katherine Niehaus, Eric Ariazi, Imran Haque, Tzu-Yu Liu, Nathan Wan, Ajay Kannan, Brandon White
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Patent number: 11811021Abstract: A precursor structure is provided. The precursor structure has the following chemical formula: ( La 2 ? Zr 2 - x ? M x ? O 7 ) · 1 2 ? ( La 2 - y ? M y ? ? O 3 ) , wherein M is a trivalent ion or a pentavalent ion, M? is a bivalent ion, x=0-1, y=0-1.5, and the precursor structure includes a pyrochlore phase. Since the pyrochlore phase may be transformed into the garnet phase through a lithiation process and the phase transition temperature is lower (e.g., 500-1000° C.), the precursor structure may be co-fired with the cathode material (e.g., lithium cobalt oxide (LiCoO2)) to form a thin lamination structure. That is, the thickness of the solid electrolyte may be effectively reduced, thereby improving the ionic conductivity of the solid electrolyte ion battery.Type: GrantFiled: June 29, 2020Date of Patent: November 7, 2023Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Sheng-Min Yu, Tzu-Yu Liu
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Patent number: 11681953Abstract: Systems and methods that analyze blood-based cancer diagnostic tests using multiple classes of molecules are described. The system uses machine learning (ML) to analyze multiple analytes, for example cell-free DNA, cell-free microRNA, and circulating proteins, from a biological sample. The system can use multiple assays, e.g., whole-genome sequencing, whole-genome bisulfite sequencing or EM-seq, small-RNA sequencing, and quantitative immunoassay. This can increase the sensitivity and specificity of diagnostics by exploiting independent information between signals. During operation, the system receives a biological sample, and separates a plurality of molecule classes from the sample. For a plurality of assays, the system identifies feature sets to input to a machine learning model. The system performs an assay on each molecule class and forms a feature vector from the measured values.Type: GrantFiled: April 15, 2019Date of Patent: June 20, 2023Assignee: Freenome Holdings, Inc.Inventors: Adam Drake, Daniel Delubac, Katherine Niehaus, Eric Ariazi, Imran Haque, Tzu-Yu Liu, Nathan Wan, Ajay Kannan, Brandon White
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Publication number: 20230136503Abstract: A method for monitoring and controlling multi-phase condition of reactant in manufacturing process is provided. The monitoring and controlling method includes the following steps. A plurality of clusters of monitoring images is captured corresponding to a plurality of process reaction time points in a plurality of observation regions. According to the clusters of the monitoring images, a plurality of image index features is extracted. According to the image index features, a plurality of phase modes corresponding to the observation regions is determined. According to the image index features, a cluster of generation characteristics of the reactant corresponding to the phase modes is determined. According to the cluster of generation characteristics, an adjustment of the manufacturing process is performed.Type: ApplicationFiled: June 29, 2022Publication date: May 4, 2023Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Feng-Sheng KAO, Tzu-Yu LIU, Cheng-Hsuan LIN, Chih-Ying YEN
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Publication number: 20220043095Abstract: A first resistivity value and a correlation function relating thickness of a conductive layer having the first resistivity value to a signal from an in-situ monitoring system are stored. A second resistivity value for a conductive layer on a substrate is received. A sequence of signal values that depend on thickness of the conductive layer is received from an in-situ electromagnetic induction monitoring system that monitors the substrate during polishing. A sequence of thickness values is generated based on the sequence of signal values and the correlation function. For at least some thickness values of the sequence of thickness values adjusted thickness values are generated that compensate for variation between the first resistivity value and the second resistivity value to generate a sequence of adjusted thickness values. A polishing endpoint is detected or an adjustment for a polishing parameter is determined based on the sequence of adjusted thickness values.Type: ApplicationFiled: October 22, 2021Publication date: February 10, 2022Inventors: Kun Xu, Ingemar Carlsson, Shih-Haur Shen, Boguslaw A. Swedek, Tzu-Yu Liu
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Patent number: 11199605Abstract: A first resistivity value and a correlation function relating thickness of a conductive layer having the first resistivity value to a signal from an in-situ monitoring system are stored. A second resistivity value for a conductive layer on a substrate is received. A sequence of signal values that depend on thickness of the conductive layer is received from an in-situ electromagnetic induction monitoring system that monitors the substrate during polishing. A sequence of thickness values is generated based on the sequence of signal values and the correlation function. For at least some thickness values of the sequence of thickness values adjusted thickness values are generated that compensate for variation between the first resistivity value and the second resistivity value to generate a sequence of adjusted thickness values. A polishing endpoint is detected or an adjustment for a polishing parameter is determined based on the sequence of adjusted thickness values.Type: GrantFiled: January 10, 2018Date of Patent: December 14, 2021Assignee: Applied Materials, Inc.Inventors: Kun Xu, Ingemar Carlsson, Shih-Haur Shen, Boguslaw A. Swedek, Tzu-Yu Liu
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Patent number: 11079459Abstract: A first resistivity value and a correlation function relating thickness of a conductive layer having the first resistivity value to a signal from an in-situ monitoring system are stored. A second resistivity value for a conductive layer on a substrate is received. A sequence of signal values that depend on thickness of the conductive layer is received from an in-situ electromagnetic induction monitoring system that monitors the substrate during polishing. A sequence of thickness values is generated based on the sequence of signal values and the correlation function. For at least some thickness values of the sequence of thickness values adjusted thickness values are generated that compensate for variation between the first resistivity value and the second resistivity value to generate a sequence of adjusted thickness values. A polishing endpoint is detected or an adjustment for a polishing parameter is determined based on the sequence of adjusted thickness values.Type: GrantFiled: January 10, 2018Date of Patent: August 3, 2021Assignee: Applied Materials, Inc.Inventors: Kun Xu, Ingemar Carlsson, Shih-Haur Shen, Boguslaw A. Swedek, Tzu-Yu Liu
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Publication number: 20210210205Abstract: Systems and methods that analyze blood-based cancer diagnostic tests using multiple classes of molecules are described. The system uses machine learning (ML) to analyze multiple analytes, for example cell-free DNA, cell-free microRNA, and circulating proteins, from a biological sample. The system can use multiple assays, e.g., whole-genome sequencing, whole-genome bisulfite sequencing or EM-seq, small-RNA sequencing, and quantitative immunoassay. This can increase the sensitivity and specificity of diagnostics by exploiting independent information between signals. During operation, the system receives a biological sample, and separates a plurality of molecule classes from the sample. For a plurality of assays, the system identifies feature sets to input to a machine learning model. The system performs an assay on each molecule class and forms a feature vector from the measured values.Type: ApplicationFiled: February 11, 2021Publication date: July 8, 2021Inventors: Adam Drake, Daniel Delubac, Katherine Niehaus, Eric Ariazi, Imran Haque, Tzu-Yu Liu, Nathan Wan, Ajay Kannan, Brandon White
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Publication number: 20210198154Abstract: A method of forming low-k material is provided. The method includes providing a plurality of core-shell particles. The core of the core-shell particles has a first ceramic with a low melting point. The shell of the core-shell particles has a second ceramic with a low melting point and a low dielectric constant. The core-shell particles are sintered and molded to form a low-k material. The shell of the core-shell particles is connected to form a network structure of a microcrystal phase.Type: ApplicationFiled: December 23, 2020Publication date: July 1, 2021Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Kuo-Chuang CHIU, Tzu-Yu LIU, Tien-Heng HUANG, Tzu-Chi CHOU, Cheng-Ting LIN
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Publication number: 20210203003Abstract: A precursor structure is provided. The precursor structure has the following chemical formula: ( La 2 ? Zr 2 - x ? M x ? O 7 ) · 1 2 ? ( La 2 - y ? M y ? ? O 3 ) , wherein M is a trivalent ion or a pentavalent ion, M? is a bivalent ion, x=0-1, y=0-1.5, and the precursor structure includes a pyrochlore phase. Since the pyrochlore phase may be transformed into the garnet phase through a lithiation process and the phase transition temperature is lower (e.g., 500-1000° C.), the precursor structure may be co-fired with the cathode material (e.g., lithium cobalt oxide (LiCoO2)) to form a thin lamination structure. That is, the thickness of the solid electrolyte may be effectively reduced, thereby improving the ionic conductivity of the solid electrolyte ion battery.Type: ApplicationFiled: June 29, 2020Publication date: July 1, 2021Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Sheng-Min YU, Tzu-Yu LIU
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Publication number: 20210174958Abstract: Systems and methods that analyze blood-based cancer diagnostic tests using multiple classes of molecules are described. The system uses machine learning (ML) to analyze multiple analytes, for example cell-free DNA, cell-free microRNA, and circulating proteins, from a biological sample. The system can use multiple assays, e.g., whole-genome sequencing, whole-genome bisulfite sequencing or EM-seq, small-RNA sequencing, and quantitative immunoassay. This can increase the sensitivity and specificity of diagnostics by exploiting independent information between signals. During operation, the system receives a biological sample, and separates a plurality of molecule classes from the sample. For a plurality of assays, the system identifies feature sets to input to a machine learning model. The system performs an assay on each molecule class and forms a feature vector from the measured values.Type: ApplicationFiled: April 15, 2019Publication date: June 10, 2021Inventors: Adam Drake, Daniel Delubac, Katherine Niehaus, Eric Ariazi, Imran Haque, Tzu-Yu Liu, Nathan Wan, Ajay Kannan, Brandon White
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Patent number: 11004708Abstract: An apparatus for chemical mechanical polishing includes a platen having a surface to support a polishing pad and an electromagnetic induction monitoring system to generate a magnetic field to monitor a substrate being polished by the polishing pad. The electromagnetic induction monitoring system includes a core positioned at least partially in the platen and a coil wound around a portion of the core. The core includes a back portion and a multiplicity of posts extending from the back portion in a first direction normal to the surface of the platen. The core and coil are configured such that the multiplicity of posts include a first plurality of posts to provide a first magnetic polarity and a second plurality of posts to provide an opposite second magnetic polarity, and the first plurality of posts and the second plurality of posts are arranged in an alternating pattern.Type: GrantFiled: October 6, 2017Date of Patent: May 11, 2021Assignee: Applied Materials, Inc.Inventors: Hassan G. Iravani, Boguslaw A. Swedek, Tzu-Yu Liu, Kun Xu, Shih-Haur Shen
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Patent number: 10944115Abstract: A cathode layer and a membrane electrode assembly of a solid oxide fuel cell are provided. The cathode layer consists of a plurality of perovskite crystal films, and the average change rate of linear thermal expansion coefficients of these perovskite crystal films is about 5% to 40% along the thickness direction. The membrane electrode assembly includes the above-mentioned cathode layer, and the linear thermal expansion coefficients of these perovskite crystal films are reduced towards the solid electrolyte layer of the membrane electrode assembly.Type: GrantFiled: January 24, 2019Date of Patent: March 9, 2021Assignee: Industrial Technology Research InstituteInventors: Tzu-Chi Chou, Kuo-Chuang Chiu, Tzu-Yu Liu, Yung-Hsiang Juan, Ying-Hao Chu
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Patent number: 10811257Abstract: A method may include depositing a carbon layer on a substrate using physical vapor deposition, wherein the carbon layer exhibits compressive stress, and is characterized by a first stress value; and directing a dose of low-mass species into the carbon layer, wherein, after the directing, the carbon layer exhibits a second stress value, less compressive than the first stress value.Type: GrantFiled: June 4, 2018Date of Patent: October 20, 2020Assignee: Varian Semiconductor Equipment Associates, Inc.Inventors: Rajesh Prasad, Tzu-Yu Liu, Kyu-Ha Shim, Tom Ho Wing Yu, Zhong Qiang Hua, Adolph Miller Allen, Viabhav Soni, Ravi Rajagopalan, Nobuyuki Sasaki
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Patent number: 10562148Abstract: A method of controlling processing of a substrate includes generating, based on a signal from an in-situ monitoring system, first and second sequences of characterizing values indicative of a physical property of a reference zone and a control zone, respectively, on a substrate. A reference zone rate and a control zone rate are determined from the first and sequence of characterizing values, respectively. An error value is determined by comparing characterizing values for the reference zone and control zone. An output parameter value for the control zone is generated based on at least the error value and a dynamic nominal control zone value using a proportional-integral-derivative control algorithm, and the dynamic nominal control zone value is generated in a second control loop based on at least the reference zone rate and the control zone rate. The control zone of the substrate is processed according to the output parameter value.Type: GrantFiled: October 6, 2017Date of Patent: February 18, 2020Assignee: Applied Materials, Inc.Inventors: Shih-Haur Shen, Kun Xu, Tzu-Yu Liu