Abstract: System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

Abstract: System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method includes providing a water tank that connects to at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

Abstract: A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.

Abstract: A method and system involve supplying an immersion fluid to a space between an imaging lens and a substrate to be patterned, generating an electric field in the immersion fluid within the space so that the electric field urges particles away from a surface of the substrate, removing the immersion fluid along with the particles from the space, and thereafter supplying immersion fluid to the space and performing a lithographic exposing process on the surface of the substrate.

Abstract: Aspects of the present disclosure provide a method and a system for closing plate take-over in immersion lithography. A plate holder is provided for a closing plate in a wafer holder of an immersion lithography system. An optical detector is provided below the plate holder for determining whether a light signal passing through the closing plate is aligned with the plate holder using the optical detector. If the light signal is aligned, a fluid containment mechanism is lowered, and the closing plate is placed into the plate holder. Alternatively, the fluid containment mechanism is lowered to surface of the closing plate, the closing plate is affixed to the mechanism, and the mechanism is raised with the closing plate. If the light signal is not aligned, an error is triggered and the scanner is stopped.

Abstract: A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least two of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.

Abstract: The present disclosure provides an immersion lithography system. The system includes an imaging lens having a front surface; a substrate stage positioned underlying the front surface of the imaging lens; an immersion fluid retaining structure having a fluid inlet and a fluid outlet, configured to hold a fluid from the fluid inlet, at least partially filling a space between the front surface and a substrate on the substrate stage, and flowing the fluid out through the fluid outlet; and a particle monitor module integrated with the immersion fluid retaining structure.

Abstract: Aspects of the present disclosure provide a method and a system for closing plate take-over in immersion lithography. A plate holder is provided for a closing plate in a wafer holder of an immersion lithography system. An optical detector is provided below the plate holder for determining whether a light signal passing through the closing plate is aligned with the plate holder using the optical detector. If the light signal is aligned, a fluid containment mechanism is lowered, and the closing plate is placed into the plate holder. Alternatively, the fluid containment mechanism is lowered to surface of the closing plate, the closing plate is affixed to the mechanism, and the mechanism is raised with the closing plate. If the light signal is not aligned, an error is triggered and the scanner is stopped.

Abstract: System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

Abstract: A method and system involve supplying an immersion fluid to a space between an imaging lens and a substrate to be patterned, generating an electric field in the immersion fluid within the space so that the electric field urges particles away from a surface of the substrate, removing the immersion fluid along with the particles from the space, and thereafter supplying immersion fluid to the space and performing a lithographic exposing process on the surface of the substrate.

Abstract: The present disclosure provides an immersion lithography system. The system includes an imaging lens having a front surface; a substrate stage positioned underlying the front surface of the imaging lens; an immersion fluid retaining structure having a fluid inlet and a fluid outlet, configured to hold a fluid from the fluid inlet, at least partially filling a space between the front surface and a substrate on the substrate stage, and flowing the fluid out through the fluid outlet; and a particle monitor module integrated with the immersion fluid retaining structure.

Abstract: A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least one of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.

Abstract: An apparatus for degassing and preventing gelation in a viscous liquid stored in a reservoir tank is provided. For a viscous liquid such as one that has a viscosity higher than 5000 cp, a reservoir tank that has a cavity for holding the liquid is first provided which is equipped with a liquid feed conduit and a liquid output conduit. The liquid feed conduit is configured in J-shape with an inlet end at a top of a first vertical section in fluid communication with a liquid source tank and an outlet end at an opposite end of a second vertical section of the J-shape conduit protruding above a liquid level stored in the tank cavity. A U-section of the liquid feed conduit is generally immersed in the viscous liquid.

Abstract: A method and apparatus for dispensing a resist solution used in a semiconductor device manufacturing process senses the presence of air bubbles in the solution during delivery through a line feeding a dispensing pump. Air bubbles in the line are sensed by an optical photocoupler that senses changes in the intensity of light refracted through the solution caused by air bubbles entrapped in the solution. The sensor produces an air bubble indicating signal that can be used to activate an alarm or to stop the dispensing process.

Abstract: An apparatus for degassing and preventing gelation in a viscous liquid stored in a reservoir tank is provided. For a viscous liquid such as one that has a viscosity higher than 5000 cp, a reservoir tank that has a cavity for holding the liquid is first provided which is equipped with a liquid feed conduit and a liquid output conduit. The liquid feed conduit is configured in J-shape with an inlet end at a top of a first vertical section in fluid communication with a liquid source tank and an outlet end at an opposite end of a second vertical section of the J-shape conduit protruding above a liquid level stored in the tank cavity. A U-section of the liquid feed conduit is generally immersed in the viscous liquid. A liquid output conduit of straight shape is further provided in the reservoir tank which has an inlet end immersed in the liquid at or near a bottom of the cavity and an outlet end in fluid communication with a dispensing nozzle of the liquid through the use of a pumping means.