Patents by Inventor Tzung-Heng TSAI

Tzung-Heng TSAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Spray coater and ring-shaped structure thereof
    Patent number: 9875924
    Abstract: A spray coater is used to spray a photoresist on a front surface of a wafer. The spray coater includes a vacuum chuck, a flow guiding ring, and a positioning ring. The vacuum chuck has a top surface and a side surface adjacent to the top surface. The wafer is located on the top surface and protrudes from the top surface of the vacuum chuck. The flow guiding ring is disposed around the vacuum chuck and has a groove. The wafer protruding from the top surface covers the flow guiding ring, and an opening of the groove faces a back surface of the wafer opposite to the front surface. The positioning ring is disposed around the flow guiding ring, such that the flow guiding ring is between the positioning ring and the side surface of the vacuum chuck.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: January 23, 2018
    Assignee: XINTEC INC.
    Inventors: Tsou-Tso Tsai, Kuo-Ching Wu, Tzung-Heng Tsai
  • SPRAY COATER AND RING-SHAPED STRUCTURE THEREOF
    Publication number: 20160250656
    Abstract: A spray coater is used to spray a photoresist on a front surface of a wafer. The spray coater includes a vacuum chuck, a flow guiding ring, and a positioning ring. The vacuum chuck has a top surface and a side surface adjacent to the top surface. The wafer is located on the top surface and protrudes from the top surface of the vacuum chuck. The flow guiding ring is disposed around the vacuum chuck and has a groove. The wafer protruding from the top surface covers the flow guiding ring, and an opening of the groove faces a back surface of the wafer opposite to the front surface. The positioning ring is disposed around the flow guiding ring, such that the flow guiding ring is between the positioning ring and the side surface of the vacuum chuck.
    Type: Application
    Filed: February 25, 2016
    Publication date: September 1, 2016
    Inventors: Tsou-Tso TSAI, Kuo-Ching WU, Tzung-Heng TSAI