Patents by Inventor Tzung-Luen Li

Tzung-Luen Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a photoresist over a bond pad to mitigate bond pad corrosion
    Patent number: 11222857
    Abstract: In some embodiments, the present disclosure relates to a method including forming an interconnect structure over a substrate. A bond pad may be coupled to the interconnect structure, and a polymeric material may be deposited over the bond pad. In some embodiments, the method further includes performing a patterning process to remove a portion of the polymeric material to form an opening in the polymeric material. The opening directly overlies and exposes the bond pad. Further, the method includes a first cleaning process. The polymeric material is cured to form a polymeric protection layer, and a second cleaning process is performed.
    Type: Grant
    Filed: February 24, 2020
    Date of Patent: January 11, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Fan Huang, Dian-Hau Chen, Mao-Nan Wang, Tzu-Li Lee, Yen-Ming Chen, Tzung-Luen Li
  • METHOD OF FORMING A PHOTORESIST OVER A BOND PAD TO MITIGATE BOND PAD CORROSION
    Publication number: 20210265291
    Abstract: In some embodiments, the present disclosure relates to a method including forming an interconnect structure over a substrate. A bond pad may be coupled to the interconnect structure, and a polymeric material may be deposited over the bond pad. In some embodiments, the method further includes performing a patterning process to remove a portion of the polymeric material to form an opening in the polymeric material. The opening directly overlies and exposes the bond pad. Further, the method includes a first cleaning process. The polymeric material is cured to form a polymeric protection layer, and a second cleaning process is performed.
    Type: Application
    Filed: February 24, 2020
    Publication date: August 26, 2021
    Inventors: Chih-Fan Huang, Dian-Hau Chen, Mao-Nan Wang, Tzu-Li Lee, Yen-Ming Chen, Tzung-Luen Li
  • QUANTUM DOT-SENSITIZED SOLAR CELL HAVING PBS COUNTER ELECTRODE AND MANUFACTURING METHOD THEREOF
    Publication number: 20140182666
    Abstract: Quantum dot-sensitized solar cell and manufacturing method thereof are provided. The proposed quantum dot-sensitized solar cell has a counter electrode with a PbS thin-film layer and a polysulfide electrolyte contacting the PbS thin-film layer.
    Type: Application
    Filed: July 12, 2013
    Publication date: July 3, 2014
    Inventors: Hsisheng Teng, Cheng-Yu Lin, Tzung-Luen Li, Chiao-Yi Teng