Patents by Inventor Tzung Zone Li

Tzung Zone Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100258167
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a p-type semiconductor layer, an n-type semiconductor layer, a high resistivity layer, an assistant electrode layer, and a transparent conductive layer. The metal layer is formed on the substrate, and comprises a plurality of p-type electrode units separated from each other. The p-type semiconductor layer is formed on the metal layer. The n-type semiconductor is formed on the p-type semiconductor layer, thereby forming a p-n junction. The high resistivity layer is formed on the n-type semiconductor layer. The assistant electrode layer is formed on the high resistivity layer and the p-type electrode units. The transparent conductive layer is formed on the assistant electrode layer, the high resistivity layer and the p-type electrode units. Accordingly, at least one cell is formed on each of the p-type electrode units. The assistant electrode layer and the transparent conductive layer are connected to the cells in series.
    Type: Application
    Filed: April 8, 2010
    Publication date: October 14, 2010
    Applicant: PVNEXT CORPORATION
    Inventors: FENG FAN CHANG, HSIN CHIH LIN, HSIN HUNG LIN, CHI HAU HSIEH, TZUNG ZONE LI
  • Publication number: 20100243044
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a p-type semiconductor layer, an n-type semiconductor layer, a transparent conductive layer and a high resistivity layer. The metal layer is formed on the substrate. The p-type semiconductor layer is formed on the metal layer and may include a compound of copper indium gallium selenium sulfur (CIGSS), copper indium gallium selenium (CIGS), copper indium sulfur (CIS), copper indium selenium (CIS) or a compound of at least two of copper, selenium or sulfur. The n-type semiconductor layer exhibits photo catalyst behavior that can increase carrier mobility by receiving light, and is formed on the p-type semiconductor layer, thereby forming a p-n junction. The transparent conductive layer is formed on the n-type semiconductor layer. The high resistivity layer is formed between the metal layer and the transparent conductive layer.
    Type: Application
    Filed: July 23, 2009
    Publication date: September 30, 2010
    Inventors: FENG FAN CHANG, HSIN HUNG LIN, HSIN CHIH LIN, CHI HAU HSIEH, TZUNG ZONE LI
  • Publication number: 20100139757
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a high resistivity layer, a p-type semiconductor layer, an n-type semiconductor layer and a transparent conductive layer. The metal layer may include molybdenum and be formed on the substrate to be a back contact metal layer of the cell. The high resistivity layer (e.g., V2O5) is formed on the metal layer. The p-type semiconductor layer is formed on the high resistivity layer and may include compound of CIGS or CIS. The n-type semiconductor layer (e.g., CdS) is formed on the p-type semiconductor layer, thereby forming a p-n junction. The transparent conductive layer is formed on the n-type semiconductor layer.
    Type: Application
    Filed: February 27, 2009
    Publication date: June 10, 2010
    Applicant: RITDISPLAY CORPORATION
    Inventors: FENG FAN CHANG, HSIN CHIH LIN, HSIN HUNG LIN, CHI HAU HSIEH, TZUNG ZONE LI
  • Publication number: 20100139758
    Abstract: A photovoltaic cell structure includes a substrate, a metal layer, a p-type semiconductor layer, an n-type semiconductor layer and a transparent conductive layer. The substrate has a rough surface. The metal layer may include molybdenum and be formed on the rough surface. The p-type semiconductor layer is formed on the metal layer and may include CIGSS, CIGS, CIS, or compound of two or more of copper, selenium, sulfur. The n-type semiconductor layer is formed on the p-type semiconductor layer thereby forming a rough p-n junction surface. The n-type semiconductor layer may include CdS. The transparent conductive layer is formed on the n-type semiconductor layer. In an embodiment, the roughness Ra of the rough surface is between 0.01 to 100 ?m.
    Type: Application
    Filed: February 27, 2009
    Publication date: June 10, 2010
    Applicant: RITDISPLAY CORPORATION
    Inventors: FENG FAN CHANG, HSIN CHIH LIN, HSIN HUNG LIN, CHI HAU HSIEH, TZUNG ZONE LI
  • Publication number: 20090091241
    Abstract: A full-color OLED display panel comprises a full-color organic light-emitting device and a colored filter device stacked on the light-exit surface of the full-color organic light-emitting device. The full-color organic light-emitting device comprises a first electrode, a plurality of second electrodes, a first light-emitting layer sandwiched between the first electrode and a portion of the second electrodes, and a second light-emitting layer sandwiched between the first electrode and portions of the second electrodes and the first light-emitting layer. The colored filter device comprises a substrate, and a plurality of first color filter portions, a plurality of second color filter portions and a plurality of third color filter portions disposed on the surface of the substrate.
    Type: Application
    Filed: September 26, 2007
    Publication date: April 9, 2009
    Applicant: RITDISPLAY CORPORATION
    Inventors: Chung Che Tsou, Cheng Fan Lin, Tzeng Cheng Luo, Shin Ju Lin, Tzung Zone Li, Hai Tang