Patents by Inventor Uday G. Nayak

Uday G. Nayak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Precision scanning apparatus and method with fixed and movable guide members
    Patent number: 6363809
    Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.
    Type: Grant
    Filed: September 7, 2000
    Date of Patent: April 2, 2002
    Assignee: Nikon Corporation, Japan
    Inventors: W. Thomas Novak, Zahirudeen Premji, Uday G. Nayak, Akimitsu Ebihara
  • Precision scanning apparatus and method with fixed and movable guide members
    Patent number: 6134981
    Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.
    Type: Grant
    Filed: December 3, 1999
    Date of Patent: October 24, 2000
    Assignee: Nikon Research Corporation of America
    Inventors: W. Thomas Novak, Zahirudeen Premji, Uday G. Nayak, Akimitsu Ebihara
  • Precision motion stage with single guide beam and follower stage
    Patent number: 5996437
    Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) difection and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.
    Type: Grant
    Filed: February 11, 1997
    Date of Patent: December 7, 1999
    Assignee: Nikon Corporation
    Inventors: W. Thomas Novak, Zahirudeen Premji, Uday G. Nayak, Akimitsu Ebihara
  • Precision motion stage with single guide beam and follower stage
    Patent number: 5623853
    Abstract: An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in the first linear (X) direction and its motion is electronically synchronized by a control system with the main stage motion in the X direction. Electromagnetic drive motors include magnetic tracks mounted on the follower stage which cooperate with motor coils mounted on the edges of the main stage to move the main stage in a second linear (Y) direction normal to the X direction. Thus the main stage is isolated from mechanical disturbances in the XY plane since there is no mechanical connections and is lightened by removing the weight of the magnetic tracks from the beam.
    Type: Grant
    Filed: October 19, 1994
    Date of Patent: April 29, 1997
    Assignee: Nikon Precision Inc.
    Inventors: W. Thomas Novak, Zahirudeen Premji, Uday G. Nayak, Akimitsu Ebihara