Patents by Inventor Udo Dinger
Udo Dinger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8710471Abstract: A projection illumination installation for EUV microlithography includes an EUV synchrotron light source for producing EUV used light. An object field is illuminated with the used light using illumination optics. The object field is mapped into an image field using projection optics. A scanning device is used to illuminate the object field by deflecting the used light in sync with a projection illumination period. The result is a projection illumination installation in which the output power from an EUV synchrotron light source can be used as efficiently as possible for EUV projection illumination.Type: GrantFiled: September 21, 2010Date of Patent: April 29, 2014Assignee: Carl Zeiss SMT GmbHInventors: Udo Dinger, Markus Hauf
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Patent number: 8587767Abstract: Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.Type: GrantFiled: October 29, 2010Date of Patent: November 19, 2013Assignee: Carl Zeiss SMT GmbHInventors: Damian Fiolka, Berndt Warm, Christian Steigerwald, Martin Endres, Ralf Stuetzle, Jens Ossmann, Ralf Scharnweber, Markus Hauf, Udo Dinger, Severin Waldis, Marc Kirch, Joachim Hartjes
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Publication number: 20130265560Abstract: An EUV lithography system 1 comprises an EUV beam path and a monitor beam path 51. The EUV beam path comprises a mirror system 13, which has a base and a multiplicity of mirror elements 17 having concave mirror surfaces, the orientation of which relative to the base is respectively adjustable. The monitor beam path 51 comprises at least one monitor radiation source 53, a screen 71, the mirror system 13, which is arranged in the monitor beam path 51 between the monitor radiation source 53 and the screen 71, and a spatially resolving detector 77. In this case, each of a plurality of the mirror elements generates an image of the monitor radiation source in an image plane assigned to the respective mirror elements, distances B between the image planes assigned to the mirror elements and the screen have a maximum distance, distances A between each of the plurality of mirror elements and the image plane assigned to it have a minimum distance, and the maximum distance B is less than half of the minimum distance A.Type: ApplicationFiled: June 5, 2013Publication date: October 10, 2013Inventors: Udo Dinger, Lars Wischmeier, Markus Hauf, Stephan Kellner, Igor Gurevich, Markus Deguenther
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Patent number: 8253927Abstract: The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour.Type: GrantFiled: May 21, 2009Date of Patent: August 28, 2012Assignee: Carl Zeiss SMT GmbHInventor: Udo Dinger
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Publication number: 20120050703Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.Type: ApplicationFiled: August 22, 2011Publication date: March 1, 2012Applicant: CARL ZEISS SMT GMBHInventors: Michael Layh, Udo Dinger
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Publication number: 20110235015Abstract: An illumination optics for EUV microlithography illuminates an object field with the aid of an EUV used radiation beam. Preset devices preset illumination parameters. An illumination correction device corrects the intensity distribution and/or the angular distribution of the object field illumination. The latter has an optical component to which the used radiation beam is at least partially applied upstream of the object field and which can be driven in a controlled manner. A detector acquires one of the illumination parameters. An evaluation device evaluates the detector data and converts the latter into control signals. At least one actuator displaces the optical component. During exposures, the actuators are controlled with the aid of the detector signals during the period of a projection exposure. A maximum displacement of below 8 ?m is ensured for edges of the object field towards an object to be exposed.Type: ApplicationFiled: March 31, 2011Publication date: September 29, 2011Applicant: Carl Zeiss GmbHInventors: Guenther Dengel, Gero Wittich, Udo Dinger, Ralf Stuetzle, Martin Endres, Jens Ossmann, Berndt Warm
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Patent number: 7977651Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.Type: GrantFiled: August 25, 2009Date of Patent: July 12, 2011Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
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Patent number: 7910900Abstract: Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of manufacturing microelectronic components with such projection exposure apparatuses, and related systems, components and methods are disclosed.Type: GrantFiled: July 20, 2007Date of Patent: March 22, 2011Assignee: Carl Zeiss SMT GmbHInventors: Ralf Stuetzle, Udo Dinger
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Publication number: 20110063598Abstract: An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet.Type: ApplicationFiled: October 29, 2010Publication date: March 17, 2011Applicant: CARL ZEISS SMT GMBHInventors: Damian Fiolka, Berndt Warm, Christian Steigerwald, Martin Endres, Ralf Stuetzle, Jens Ossmann, Ralf Scharnweber, Markus Hauf, Udo Dinger, Severin Waldis, Marc Kirch, Joachim Hartjes
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Publication number: 20110014799Abstract: A projection illumination installation for EUV microlithography includes an EUV synchrotron light source for producing EUV used light. An object field is illuminated with the used light using illumination optics. The object field is mapped into an image field using projection optics. A scanning device is used to illuminate the object field by deflecting the used light in sync with a projection illumination period. The result is a projection illumination installation in which the output power from an EUV synchrotron light source can be used as efficiently as possible for EUV projection illumination.Type: ApplicationFiled: September 21, 2010Publication date: January 20, 2011Applicant: CARL ZEISS SMT AGInventors: Udo Dinger, Markus Hauf
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Publication number: 20110001947Abstract: A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.Type: ApplicationFiled: August 2, 2010Publication date: January 6, 2011Applicant: CARL ZEISS SMT AGInventors: Udo Dinger, Martin Endres, Armin Werber, Norbert Muehlberger, Florian Bach
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Publication number: 20110001948Abstract: An illumination system for a microlithography projection exposure apparatus generally includes an optical element formed of a plurality of facet elements. The facet elements are arranged such that, for each facet element, a proportion of the side surfaces of the facet element is at a certain distance from the side surfaces of all the other facet elements. This gives rise to interspaces between the facet elements which are not used optically. The interspaces can be used for simpler mounting of the facet elements or for fitting mechanical components, such as actuators. A collector is used to efficiently illuminate such an optical element. The collector includes a plurality of segments that are in part non-continuous. Alternatively, however, continuous segments with a bend are also possible.Type: ApplicationFiled: August 31, 2010Publication date: January 6, 2011Applicant: Carl Zeiss SMT AGInventor: Udo Dinger
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Publication number: 20100231882Abstract: A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector.Type: ApplicationFiled: March 17, 2010Publication date: September 16, 2010Applicant: CARL ZEISS SMT AGInventors: Udo Dinger, Christopher Weth
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Publication number: 20100182710Abstract: A method for producing an optical element or part of an optical element having a base body, including:—providing a mold body (21, 1000, 2000) which has a surface corresponding to the geometry of the optical element;—depositing a layer system (7) including at least one separation layer system (15, 1010, 2010) on the surface of the mold body (21, 1000, 2000);—electroforming a base body (4, 1030, 2030) on the layer system (7); and—detaching at least the base body from the mold body (21, 1000, 2000) at the separation layer system (15, 1010, 2010).Type: ApplicationFiled: November 25, 2009Publication date: July 22, 2010Applicant: Carl Zeiss SMT AGInventors: Udo DINGER, Ulrich Bingel, Jeffrey Erxmeyer, Eral Erzin, Bernhard Weigl, Stephane Bruynooghe
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Publication number: 20100007866Abstract: The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.Type: ApplicationFiled: July 17, 2009Publication date: January 14, 2010Applicant: Carl Zeiss SMT AGInventors: Berndt Warm, Siegfried Rennon, Guenther Dengel, Juergen Baier, Udo Dinger, Stefan Burkart, Christos Kourouklis, Hin Yiu Anthony Chung, Stefan Wiesner, Hartmut Enkisch
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Publication number: 20090316128Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.Type: ApplicationFiled: August 25, 2009Publication date: December 24, 2009Applicant: CARL ZEISS SMT AGInventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
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Patent number: 7623620Abstract: There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength <100 nm, and the reflective X-ray microscope projects the object with magnification into an image plane.Type: GrantFiled: November 8, 2004Date of Patent: November 24, 2009Assignee: Carl Zeiss SMT AGInventors: Hans-Jürgen Mann, Udo Dinger, Wilhelm Ulrich, Wolfgang Reinecke, Thomas Engel, Axel Zibold, Wolfgang Harnisch, Marco Wedowski, Dieter Pauschinger
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Publication number: 20090257040Abstract: The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour.Type: ApplicationFiled: May 21, 2009Publication date: October 15, 2009Applicant: CARL ZEISS SMT AGInventor: Udo Dinger
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Patent number: 7592598Abstract: There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ?193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.Type: GrantFiled: October 24, 2008Date of Patent: September 22, 2009Assignee: Carl Zeiss SMT AGInventors: Hans-Juergen Mann, Wolfgang Singer, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni, Wilhelm Ulrich
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Patent number: RE42118Abstract: An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°.Type: GrantFiled: October 31, 2007Date of Patent: February 8, 2011Assignee: Carl-Zeiss-SMT AGInventors: Russell Hudyma, Hans-Jûrgen Mann, Udo Dinger