Patents by Inventor Udo RADIUS

Udo RADIUS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for the generation of thin inorganic films
    Patent number: 10344381
    Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In detail the present invention relates a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state (Fig.) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1 and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, R2, R3, R5 and R6 are independent of each other hydrogen, an alkyl group, an aryl group or a trialkylsilyl group, n is an integer from 1 to 3, M is Ni or Co, X is a ligand which coordinates M, and m is an integer from 0 to 4.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: July 9, 2019
    Assignee: BASF SE
    Inventors: Julia Strautmann, Rocco Paciello, Thomas Schaub, Felix Eickemeyer, Daniel Loeffler, Hagen Wilmer, Udo Radius, Johannes Berthel, Florian Hering
  • PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS
    Publication number: 20170175267
    Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. In detail the present invention relates a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state (Fig.) and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1 and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, R2, R3, R5 and R6 are independent of each other hydrogen, an alkyl group, an aryl group or a trialkylsilyl group, n is an integer from 1 to 3, M is Ni or Co, X is a ligand which coordinates M, and m is an integer from 0 to 4.
    Type: Application
    Filed: July 22, 2015
    Publication date: June 22, 2017
    Applicant: BASF SE
    Inventors: Julia STRAUTMANN, Rocco PACIELLO, Thomas SCHAUB, Felix EICKEMEYER, Daniel LOEFFLER, Hagen WILMER, Udo RADIUS, Johannes BERTHEL, Florian HERING