Abstract: An inline coating system has an introduction chamber comprising an introduction gate, a first buffer chamber which connects to the introduction chamber and which can be separated from the introduction chamber by means of a first sluice gate and other components. The first buffer chamber has a gap sluice device with at least one slit diaphragm, and when the first insertion gate is opened or closed, a pressure gradient within the first buffer chamber is adjusted between the pressure in the region of the second insertion gate and the pressure in the region of the first insertion gate.

Abstract: The invention relates to a method for operating an inline coating system which has an introduction chamber comprising an introduction gate, a first buffer chamber which connects to the introduction chamber and which can be separated from the introduction chamber by means of a first sluice gate and other components.

Abstract: The invention relates to a silver low-E coating for glass which is temperable and can be applied by means of sputter processes onto the glass. The individual layers of the coating are cost-effective standard materials. One embodiment of the invention for example is comprised of a glass substrate, an Si3N4 layer disposed thereon of a thickness of approximately 15 nm, a TiO2 layer of 15 nm thickness on the Si3N4 layer, a 12.5 nm thick Ag layer on the TiO2 layer, a NiCrOx layer of approximately 5 nm thickness on the Ag layer and a terminating 45 nm thick Si3N4 layer.

Abstract: The present invention concerns a method for the generation of a transparent conductive oxide display coating (TCO display layer), in particular a transparent conductive oxide display coating as a transparent contact for flat panel displays and the like. The TCO display layer is generated by depositing zinc oxide and additionally aluminium, indium, gallium, boron, nitrogen, phosphorous, chlorine, fluorine or antimony or a combination thereof, with the process atmosphere containing hydrogen. These TCO layers can be realized in a particularly simple and cost-effective way compared to ITO. The properties of the inventive TCO layers are nearly as good as those for ITO, regarding high transmittance and low resistance.

Abstract: A method for forming a thin-film transistor gate insulating layer over a substrate disposed in a processing chamber is provided. The method includes: introducing a processing gas for producing a plasma in the processing chamber; heating the substrate to a substrate processing temperature of between 50 and 350° C.; and depositing silicon oxide, silicon oxynitride, or silicon nitride over the heated substrate by sputtering a target assembly at a medium frequency.

Abstract: The present invention concerns a method for the generation of a transparent conductive oxide coating (TCO layer), in particular a transparent conductive oxide coating as a transparent contact for solar cells, flat panel displays and the like. The TCO layer is generated by depositing zinc oxide and additionally aluminium, indium, gallium, boron, nitrogen, phosphorous, chlorine, fluorine or antimony or a combination thereof, with the process atmosphere containing hydrogen. These TCO layers can be realized in a particularly simple and cost-effective way compared to ITO. The properties of the inventive TCO layers are nearly as good as those for ITO, regarding high transmittance and low resistance.

Abstract: The invention relates to an infrared radiation reflecting layer system for panes of glass and similar, the properties of said layer system being maintained even after heat treatment, for example, for bending or hardening the panes of glass. Silver is used as the infrared radiation reflecting layer. A combination of NiCrOx and Zn(Al)Ox is used as a lower-layer blocker for the silver. Also, a stoichiometric layer is also used as a pre-blocker layer. A specific work point is selected for a first dielectric layer of TiOxNy. Harmonisation of the thickness of the layers and the degrees of oxidation of NiCrOx and ZnAlOx as double lower-layer blockers and the work point of the TiOxNy-base layer are important for the temperability of the coating.

Abstract: The invention relates to a silver low-E coating for glass which is temperable and can be applied by means of sputter processes onto the glass. The individual layers of the coating are cost-effective standard materials. One embodiment of the invention for example is comprised of a glass substrate, an Si3N4 layer disposed thereon of a thickness of approximately 15 nm, a TiO2 layer of 15 nm thickness on the Si3N4 layer, a 12.5 nm thick Ag layer on the TiO2 layer, a NiCrOx layer of approximately 5 nm thickness on the Ag layer and a terminating 45 nm thick Si3N4 layer.