Abstract: The present disclosure generally relates to a surface grating in a photodetector device. In an example, a semiconductor device structure includes a photodetector device. The photodetector device includes one or more photodiodes disposed in or over a semiconductor substrate, and includes a surface grating disposed at a respective surface of each photodiode of the one or more photodiodes. The surface grating has one or more periodicities. Each periodicity of the one or more periodicities has a period that is along a direction parallel to a first lateral direction across the semiconductor substrate and that is equal to or less than half of a dimension of at least one photodiode of the one or more photodiodes along a direction parallel to the first lateral direction. The one or more periodicities includes multiple different pitches.

Abstract: An integrated circuit includes a semiconductor substrate with a semiconductor surface layer having a first conductivity type and a top surface, a diode including a buried region within the surface layer, the buried region having an opposite second conductivity type and being spaced apart from the top surface by a portion of the semiconductor surface layer having the first conductivity type, a dielectric layer over the surface layer, and a metal layer located over the dielectric layer and including an aperture extending laterally in a first direction over the semiconductor surface layer and laterally spaced apart from the buried region in a second direction.