Patents by Inventor Uichiro Kimura

Uichiro Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5952355
    Abstract: The present invention relates to propenone derivatives represented by the following formula (I): ##STR1## wherein R.sup.1 represents hydrogen, substituted or unsubstituted lower alkyl, substituted or unsubstituted aryl, or YR.sup.5 (wherein Y represents S or O; and R.sup.5 represents substituted or unsubstituted lower alkyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, or a substituted or unsubstituted cyclic ether residue); R.sup.2 and R.sup.3 independently represent hydrogen, lower alkyl, or substituted or unsubstituted aralkyl, or alternatively R.sup.2 and R.sup.3 are combined to form substituted or unsubstituted methylene or ethylene; R.sup.4 represents hydrogen, hydroxy, lower alkyl, substituted or unsubstituted aralkyl, lower alkoxy, substituted or unsubstituted aralkyloxy, or halogen; and X represents substituted or unsubstituted indolyl; or pharmaceutically acceptable salts thereof.
    Type: Grant
    Filed: November 26, 1996
    Date of Patent: September 14, 1999
    Assignee: Kyowa Hakko Kogyo Co., Ltd.
    Inventors: Shun-Ichi Ikeda, Uichiro Kimura, Tadashi Ashizawa, Katsushige Gomi, Hiromitsu Saito, Masaji Kasai, Junji Kanazawa, Kimihito Sasaki, Etsuko Nukui, Masami Okabe, Soichiro Sato
  • Patent number: 5539112
    Abstract: 5-Aminoflavone derivatives represented by the formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are the same or different and represent hydrogen, substituted or unsubstituted lower alkyl, lower alkenyl, halogen-substituted or unsubstituted lower alkanoyl or lower alkoxycarbonyl, X.sup.1, X.sup.2, Y.sup.1 and Y.sup.2 are the same or different and represent hydrogen, halogen or lower alkyl, at least one of X.sup.1 and X.sup.2 represents halogen or lower alkyl, X.sup.3 represents hydrogen, substituted or unsubstituted lower alkyl, lower alkenyl, lower alkynyl, halogen, hydroxy, substituted or unsubstituted lower alkoxy, NR.sup.5 R.sup.6 (wherein R.sup.5 and R.sup.6 are the same or different and represent hydrogen, or substituted or unsubstituted lower alkyl, or R.sup.5 and R.sup.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: July 23, 1996
    Assignee: Kyowa Hakko Kogyo Co., Ltd.
    Inventors: Tsutomu Akama, Shun-ichi Ikeda, Yasushi Shida, Masaji Kasai, Hiroyuki Ishida, Uichiro Kimura, Katsushige Gomi, Hiromitsu Saito, Kimihisa Ueno