Patents by Inventor Uki IKEDA

Uki IKEDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11749497
    Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: September 5, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda, Makoto Suzuki
  • Patent number: 11694873
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Grant
    Filed: October 10, 2022
    Date of Patent: July 4, 2023
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi Sekiguchi, Shin Imamura, Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda
  • Publication number: 20230030651
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Application
    Filed: October 10, 2022
    Publication date: February 2, 2023
    Applicant: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA
  • Patent number: 11515120
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: November 29, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi Sekiguchi, Shin Imamura, Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda
  • Patent number: 11282671
    Abstract: The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: March 22, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Uki Ikeda, Daisuke Bizen, Makoto Sakakibara, Makoto Suzuki
  • Publication number: 20210375583
    Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.
    Type: Application
    Filed: August 5, 2021
    Publication date: December 2, 2021
    Inventors: Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA, Makoto SUZUKI
  • Patent number: 11139144
    Abstract: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: October 5, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda, Makoto Suzuki
  • Publication number: 20210183614
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Application
    Filed: September 21, 2018
    Publication date: June 17, 2021
    Applicant: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA
  • Patent number: 10903041
    Abstract: The present disclosure relates to a pattern measuring method to appropriately measure a height and a depth of a pattern having a high aspect ratio. The method includes measuring a width between a first pattern and another pattern formed on a wafer; calculating a value regarding an azimuth angle of a signal emitted from the wafer; and calculating height information from a portion between the first pattern and the other pattern to an upper portion of a pattern based on the measured width between the first pattern and the other pattern, the value regarding the azimuth angle, the value regarding an elevation angle, and relationship information thereof.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: January 26, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Uki Ikeda, Shunsuke Mizutani, Makoto Suzuki
  • Publication number: 20200185189
    Abstract: The purpose of the present invention is to provide a charged-particle beam apparatus capable of performing various types of signal discriminations according to the shape and the size of a sample. The present invention proposes a charged-particle beam apparatus for irradiating a sample disposed in a vacuum vessel with a charged particle beam. The charged-particle beam apparatus is provided with: a first light-generating surface for generating light on the basis of the collision of charged particles released from the sample; a light-guiding member for guiding the generated light to the outside of the vacuum vessel while maintaining the generation distribution of the light generated at the first light-generating surface; a photodetector for detecting the light guided by the light-guiding member to the outside of the vacuum vessel; and a light-transmission restricting member for restricting transmission of the light guided by the light-guiding member between the photodetector and the light-guiding member.
    Type: Application
    Filed: July 28, 2016
    Publication date: June 11, 2020
    Inventors: Uki IKEDA, Daisuke BIZEN, Makoto SAKAKIBARA, Makoto SUZUKI
  • Publication number: 20190378679
    Abstract: The present disclosure relates to a pattern measuring method to appropriately measure a height and a depth of a pattern having a high aspect ratio. The method includes measuring a width between a first pattern and another pattern formed on a wafer; calculating a value regarding an azimuth angle of a signal emitted from the wafer; and calculating height information from a portion between the first pattern and the other pattern to an upper portion of a pattern based on the measured width between the first pattern and the other pattern, the value regarding the azimuth angle, the value regarding an elevation angle, and relationship information thereof.
    Type: Application
    Filed: May 29, 2019
    Publication date: December 12, 2019
    Inventors: Uki IKEDA, Shunsuke MIZUTANI, Makoto SUZUKI
  • Publication number: 20190355552
    Abstract: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample.
    Type: Application
    Filed: March 24, 2017
    Publication date: November 21, 2019
    Inventors: Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA, Makoto SUZUKI