Patents by Inventor Ulf-Carsten Kirschstein
Ulf-Carsten Kirschstein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8529130Abstract: A proposed aerostatic bearing arrangement for moving a device on a base structure, particularly in a vacuum environment, has at least one aerostatic bearing element comprising a bearing body having a load-carrying zone and a suction area. An electrostatic preloading unit having at least one electrode is associated with the at least one aerostatic bearing element, and a voltage can be applied to the electrode in such a way that a force component is generated in direction of the surface normal of the bearing body of the aerostatic bearing element.Type: GrantFiled: September 3, 2009Date of Patent: September 10, 2013Assignee: Vistec Electron Beam GmbHInventors: Gerhard Schubert, Christian Jackel, Ulf-Carsten Kirschstein, Michael Boehm, René Bauer, Gerd Harnisch, Thomas Peschel, Stefan Risse, Christoph Schenk
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Patent number: 8496221Abstract: A table system for vacuum application has a base plate and a moving table guided by aerostatic bearing units. The bearing units (10) are connected to supply lines and suction lines for supplying and extracting the gas required for the operation of the bearing units and are provided in each instance with a sealing system having at least one stage and comprising suction channel and sealing gap for sealing relative to the vacuum. The table system is characterized in that the aerostatic bearing units (10) are constructed at least partially as swivel joints, and a push rod (4) which is actuated by a drive (5) for guiding the moving table laterally is connected to the rotating part (21) of each swivel joint, and in that the push rods (4) are hollow and constitute a component part of the suction lines for extracting the operating gas.Type: GrantFiled: November 16, 2009Date of Patent: July 30, 2013Assignee: Vistec Electron Beam GmbHInventors: Gerhard Schubert, Christian Jackel, Ulf-Carsten Kirschstein, Michael Boehm, René Bauer, Gerd Harnisch, Thomas Peschel, Stefan Risse, Christoph Schenk
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Patent number: 8267582Abstract: A table for vacuum application which is guided by aerostatic bearing elements, having a fixedly mounted supporting structure and a tabletop which is displaceable in x-direction and y-direction with respect to the fixedly mounted supporting structure by means of slides. The slides are provided with the aerostatic bearing elements for guiding, these aerostatic bearing elements being connected to feed lines for supplying the gas required for the operation of the gas bearings and suction lines for removing this gas. The suction lines comprise at least one variable-length line arrangement having a first pipe member and a second pipe member which penetrate one inside the other without contacting, at least one sealing gap being provided between the pipe members.Type: GrantFiled: April 10, 2009Date of Patent: September 18, 2012Assignee: Vistec Electron Beam GmbHInventors: Gerhard Schubert, Christian Jackel, Ulf-Carsten Kirschstein, Michael Boehm, René Bauer, Gerd Harnisch, Thomas Peschel, Stefan Risse, Christoph Schenk
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Publication number: 20100122603Abstract: A table system for vacuum application has a base plate and a moving table guided by aerostatic bearing units. The bearing units (10) are connected to supply lines and suction lines for supplying and extracting the gas required for the operation of the bearing units and are provided in each instance with a sealing system having at least one stage and comprising suction channel and sealing gap for sealing relative to the vacuum. The table system is characterized in that the aerostatic bearing units (10) are constructed at least partially as swivel joints, and a push rod (4) which is actuated by a drive (5) for guiding the moving table laterally is connected to the rotating part (21) of each swivel joint, and in that the push rods (4) are hollow and constitute a component part of the suction lines for extracting the operating gas.Type: ApplicationFiled: November 16, 2009Publication date: May 20, 2010Applicant: VISTEC ELECTRON BEAM GMBHInventors: Gerhard Schubert, Christian Jackel, Ulf-Carsten Kirschstein, Michael Boehm, René Bauer, Gerd Harnisch, Thomas Peschel, Stefan Risse, Christoph Schenk
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Publication number: 20100061667Abstract: A proposed aerostatic bearing arrangement for moving a device on a base structure, particularly in a vacuum environment, has at least one aerostatic bearing element comprising a bearing body having a load-carrying zone and a suction area. An electrostatic preloading unit having at least one electrode is associated with the at least one aerostatic bearing element, and a voltage can be applied to the electrode in such a way that a force component is generated in direction of the surface normal of the bearing body of the aerostatic bearing element.Type: ApplicationFiled: September 3, 2009Publication date: March 11, 2010Applicant: VISTEC ELECTRON BEAM GMBHInventors: Gerhard Schubert, Christian Jackel, Ulf-Carsten Kirschstein, Michael Boehm, René Bauer, Gerd Harnisch, Thomas Peschel, Stefan Risse, Christoph Schenk
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Publication number: 20090255447Abstract: The invention is directed to a table for vacuum application which is guided by means of aerostatic bearing elements, having a fixedly mounted supporting structure and a tabletop which is displaceable in x-direction and y-direction with respect to the fixedly mounted supporting structure by means of slides. The slides are provided with the aerostatic bearing elements for guiding, these aerostatic bearing elements being connected to feed lines for supplying the gas required for the operation of the gas bearings and suction lines for removing this gas. The suction lines comprise at least one variable-length line arrangement having a first pipe member and a second pipe member which penetrate one inside the other without contacting, at least one sealing gap being provided between the pipe members.Type: ApplicationFiled: April 10, 2009Publication date: October 15, 2009Applicant: VISTEC ELECTRON BEAM GMBHInventors: Gerhard Schubert, Christian Jackel, Ulf-Carsten Kirschstein, Michael Boehm, Rene Bauer, Gerd Harnisch, Thomas Peschel, Stefan Risse, Christoph Schenk
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Patent number: 6639225Abstract: The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system (4), displaceable on a linear guidance system (3), for receiving the substrate, the guidance direction of the linear guidance system (3) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system (3), including the retention system (4), about the guidance direction; and drives for parallel displacement of the linear guidance system (3), including the retention system (4), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.Type: GrantFiled: September 14, 2001Date of Patent: October 28, 2003Assignee: Leica Microsystems Lithography GmbHInventors: Ulf-Carsten Kirschstein, Erik Beckert, Andrew Hoffmann, Christoph Schaeffel, Eugen Saffert, Johannes Zentner, Torsten Gramsch
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Patent number: 6480369Abstract: The invention refers to a receiving and supporting system for a substrate (17) in an exposure system, which is provided with a handling system for the supply of the substrate (17), with an electrostatic chuck arrangement (1) moveable in X, Y coordinates, for the support of the substrate (17) during the exposure, and with an exposure optic, from which a right angled particle radiation, in Z-direction is directed toward the substrate surface. In regard to the respective supporting system, at least a second electrostatic chuck arrangement (6) is provided, which—similar to the first chuck arrangement (1), for the support of the substrate (17) during the exposure, provides a bearing surface for the substrate, whereby the bearing surface of this second chuck arrangement (6) is positioned movable in Z coordinate.Type: GrantFiled: October 4, 2000Date of Patent: November 12, 2002Assignee: Leica Microststems Lithography GmbHInventors: Ulf-Carsten Kirschstein, Stefan Risse, Christoph Damm, Thomas Peschel
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Patent number: 6426860Abstract: The present invention provides for a device for holding a substrate in an exposure system. In the exposure system, the substrate is positioned on a table movable in the X and Y coordinates of an X, Y plane, and the exposure system provides a metering assembly between a table surface and the substrate to adjust the distance and to align the substrate in relation to an exposure optics, from where a corpuscular radiation is directed right-angled onto a substrate surface, corresponding to the Z coordinate. The device for holding the substrate includes two mounting plates aligned parallel to the X, Y plane, adjusted upon the table in a direction to the exposure optics and with different distances to the table surface, the first mounting plate of which being directly connected to the table.Type: GrantFiled: September 19, 2000Date of Patent: July 30, 2002Assignee: Leica Microsystems Lithography GmbHInventors: Gerhard Schubert, Ulf-Carsten Kirschstein, Stefan Risse, Gerd Harnisch, Gerhard Kalkowski, Volker Guyenot
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Publication number: 20020079461Abstract: The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions.Type: ApplicationFiled: September 14, 2001Publication date: June 27, 2002Inventors: Ulf-Carsten Kirschstein, Erik Beckert, Andrew Hoffmann, Christoph Schaeffel, Eugen Saffert, Johannes Zentner, Torsten Gramsch