Patents by Inventor Ulf Steuer

Ulf Steuer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6749716
    Abstract: An apparatus for assessing a silicon dioxide content of a phosphoric acid bath for etching silicon nitride and a system for etching silicon nitride bath utilize a sensor. In particular, the apparatus for assessing the silicon dioxide content of a phosphoric acid bath for etching silicon nitride of the present invention contains a sensor for measuring the NH3 concentration of the phosphoric acid bath, a storage unit for storing data which define a relationship between the silicon dioxide content and the NH3 concentration, and a device for calculating the silicon dioxide content of the basis of the measured NH3 concentration and the stored data.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: June 15, 2004
    Assignee: Infineon Technologies AG
    Inventors: Stefan Ottow, Ulf Steuer
  • Publication number: 20030075272
    Abstract: An apparatus for assessing a silicon dioxide content of a phosphoric acid bath for etching silicon nitride and a system for etching silicon nitride both utilize a sensor. In particular, the apparatus for assessing the silicon dioxide content of a phosphoric acid bath for etching silicon nitride of the present invention contains a sensor for measuring the NH3 concentration of the phosphoric acid bath, a storage unit for storing data which define a relationship between the silicon dioxide content and the NH3 concentration, and a device for calculating the silicon dioxide content of the basis of the measured NH3 concentration and the stored data.
    Type: Application
    Filed: October 18, 2002
    Publication date: April 24, 2003
    Inventors: Stefan Ottow, Ulf Steuer